Patents by Inventor Roland Edward Van Vliet

Roland Edward Van Vliet has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Removal of deposition on an element of a lithographic apparatus
    Publication number: 20080218709
    Abstract: The invention provides a cleaning process for the removal of deposition on an element of a lithographic apparatus. The method includes (ex situ) treating the element with an alkaline cleaning liquid. In this way, Sn may be removed from a contaminant barrier or a collector mirror. Especially beneficial is the application of a voltages to the element to be cleaned and/or by using complexing agents for improving the dissolution of Sn in the cleaning liquid.
    Type: Application
    Filed: March 7, 2007
    Publication date: September 11, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Roland Edward Van Vliet, Harm-Jan Voorma, Antonius Theodorus Wilhelmus Kempen, Arjan Hovestad