Abstract: Device for collecting a flux of electromagnetic radiation in the extreme ultraviolet (EUV) emitted by a source, including a main, first collector stage, with a concave collector mirror placed in front of the source at a distance of greater than 250 mm and pierced by a central hole, and a convex mirror placed behind the concave mirror level with the source and pierced by a central hole, and at least a second collector stage with a concave collector mirror placed in front of the stage and pierced by a central hole and a convex mirror placed behind the concave mirror.

Abstract: The invention relates to a radiation collector (10) designed to concentrate part of the radiation produced by a source on a spot (100). The collector includes a primary concave mirror (1) and a secondary convex mirror (2), each being rotationally symmetrical about an optical axis (X-X) of the collector. The primary mirror is configured to reflect the radiation collected with an angle of incidence (i) that is substantially constant between different points on said main mirror. Such a collector is particularly suitable for use with a discharge produced plasma source.

Abstract: Device for collecting a flux of electromagnetic radiation in the extreme ultraviolet (EUV) emitted by a source (S), comprising a main, first collector stage (E1), with a concave collector mirror (2) placed in front of the source (S) at a distance of greater than 250 mm and pierced by a central hole (3) and a convex mirror (4) placed behind the concave mirror level with the source and pierced by a central hole (5), and at least a second collector stage (E2) with a concave collector mirror (7) placed in front of the stage (E1) and pierced by a central hole (8) and a convex mirror (9) placed behind the concave mirror.

Abstract: The imaging or exposure device comprises a radiation source (1), a reticle (3) mounted between the radiation source and an optical projection system (4) for shaping the radiation downstream from the reticle (3), the optical projection system (4) comprising a series of mirrors (7, 8, 10, 11) including at least two mirrors (10, 11) that are deformable, having deformer members (12, 13) connected to a control unit (14) associated with an image analyzer (15) to deform the two deformable mirrors in separate manner, firstly as a function of differences relative to an image quality setpoint, and second as a function of differences relative to an image distortion setpoint.

Abstract: The imaging or exposure device comprises a radiation source (1), a reticle (3) mounted between the radiation source and an optical projection system (4) for shaping the radiation downstream from the reticle (3), the optical projection system (4) comprising a series of mirrors (7, 8, 10, 11) including at least two mirrors (10, 11) that are deformable, having deformer members (12, 13) connected to a control unit (14) associated with an image analyzer (15) to deform the two deformable mirrors in separate manner, firstly as a function of differences relative to an image quality setpoint, and second as a function of differences relative to an image distortion setpoint.

Abstract: The invention relates to a wide-angle catoptric system. The system comprises a convex primary mirror (M1), a secondary mirror (M2), a tertiary mirror (M3), and a quaternary mirror (M4), and it is characterized in that the secondary mirror (M2) is convex. The invention is particularly applicable to astronomical or space observation over a broad spectral range.