Patents by Inventor Roland Jaeger

Roland Jaeger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8585877
    Abstract: For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
    Type: Grant
    Filed: March 9, 2012
    Date of Patent: November 19, 2013
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Roland Jaeger, Frank Wagenbreth, Frank Koschinsky
  • Publication number: 20120160415
    Abstract: For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
    Type: Application
    Filed: March 9, 2012
    Publication date: June 28, 2012
    Inventors: Roland JAEGER, Frank WAGENBRETH, Frank KOSCHINSKY
  • Patent number: 8163571
    Abstract: For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
    Type: Grant
    Filed: January 29, 2008
    Date of Patent: April 24, 2012
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Roland Jaeger, Frank Wagenbreth, Frank Koschinsky
  • Publication number: 20080299681
    Abstract: For providing control of two-step or a multi-step deposition process, a method and a corresponding deposition system is provided comprising providing a deposition process having at least two sub-processes employing different sets of process parameters, wherein each set of process parameters comprises at least one process parameter. The method comprises controllably generating an actual value for at least one first process parameter by taking into account at least one previous value of the respective first process parameter, wherein each first process parameter is a process parameter of said at least two sets of process parameters.
    Type: Application
    Filed: January 29, 2008
    Publication date: December 4, 2008
    Inventors: Roland Jaeger, Frank Wagenbreth, Frank Koschinsky
  • Patent number: 6560268
    Abstract: A resonator mirror with a saturable absorber for a laser wavelength &lgr;L formed of a series of layers of a plurality of semiconductor layers on a substrate, wherein a Bragg reflector formed of a plurality of alternately arranged layers comprising a first material with an index of refraction nH and a second material with a lower index of refraction NL compared with the latter is grown on a surface of the substrate. It is characterized in that a threefold layer is grown on the Bragg reflector, wherein a single quantum layer is embedded within two layers outside an intensity minimum for the laser radiation &lgr;L and the threefold layer has a combined optical thickness of λ L 2 .
    Type: Grant
    Filed: July 24, 2000
    Date of Patent: May 6, 2003
    Assignee: LDT GmbH & Co. Laser-Display-Technologie KG
    Inventors: Eckard Deichsel, Roland Jaeger, Peter Unger
  • Patent number: 4223166
    Abstract: A process for the production of 4-bromo-2-chloro-phenols of the formula ##STR1## wherein X represents hydrogen or chlorine is disclosed which process comprises the bromination of a 2-chlorphenol of the formula ##STR2## wherein X has the meaning given above in the presence of a compound of the formula ##STR3## in which R.sub.1 represents an alkyl group having 1 to 8 carbon atoms, or the phenyl or benzyl group,R.sub.2 and R.sub.3 independently of one another represent an alkyl group having 1 to 8 carbon atoms,R.sub.4 represents hydrogen, or an alkyl group having 1 to 8 carbon atoms, andX represents chlorine, bromine, or iodine or the hydrogen sulfate anion.The new process substantially avoids the undesired formation of the 2,6-isomers and the 4-bromo-2-chlorophenols are obtained in excellent purity.
    Type: Grant
    Filed: February 23, 1979
    Date of Patent: September 16, 1980
    Assignees: Societe Anonyme pour l'Industrie Chimique, Ciba-Geigy Corporation
    Inventors: Roland Jaeger, Kurt Huber