Abstract: A method and apparatus operable for displacing an image, which is transmitted by electromagnetic radiation, perpendicular to the direction of radiation by use of a rotatably disposed radiation-refracting body, located in the path of an imaging beam, having a refractive index that differs from the surrounding medium with regard to the radiation used. The method allows for precise image displacement. The rotation of the radiation-refracting body causing the displacement is measured, and the change of the optical path length caused by the angular change in a further electromagnetic beam utilized for the measurement is determined by evaluating the superimposition of the radiation reflected by a planar reflecting surface with the incident electromagnetic radiation. Part of the electromagnetic measurement beam, which is reflected on the surface of the radiation-refracting body, strikes a measurement unit, which supplies an electrical signal as a function of the incident position of the electromagnetic radiation.

Abstract: A method and apparatus for imaging a radiation-sensitive substrate, wherein a programmable template is projected onto the radiation-sensitive substrate using coherent radiation having a wavelength at which the substrate is radiation sensitive. An overall image of the programmable template having an image grid is displaced simultaneously by an acoustic-optical or electro-optical deflection unit such that multiple projections impinge on the substrate at different positions such that a fine partial grid is created in the image grid on the substrate.

Abstract: A pattern, is imaged by means of a programmable mask, on a substrate that has a photosensitive layer, illumination spots being produced on the mask by means of an illumination unit and individual pixels being produced, via an optical unit, forming a grid of pixels on the substrate corresponding to the pattern. Structure edges that are to be reproduced on the substrate are positioned optimally. To this end at least two exposure processes for the photosensitive layer are performed, the illumination spots or exposure points of which are offset from one another. Thereby, spaces in the grid of pixels of the first exposure process, which spaces are proportionate to the number of exposure processes to be effected, are filled with pixels by the subsequent exposure processes.

Abstract: A method and apparatus for imaging a radiation-sensitive substrate, wherein a programmable template is projected onto the radiation-sensitive substrate using coherent radiation having a wavelength at which the substrate is radiation sensitive. An overall image of the programmable template having an image grid is displaced simultaneously by an acoustic-optical or electro-optical deflection unit such that multiple projections impinge on the substrate at different positions such that a fine partial grid is created in the image grid on the substrate.

Abstract: A method and apparatus operable for displacing an image, which is transmitted by electromagnetic radiation, perpendicular to the direction of radiation by use of a rotatably disposed radiation-refracting body, located in the path of an imaging beam, having a refractive index that differs from the surrounding medium with regard to the radiation used. The method allows for precise image displacement. The rotation of the radiation-refracting body causing the displacement is measured, and the change of the optical path length caused by the angular change in a further electromagnetic beam utilized for the measurement is determined by evaluating the superimposition of the radiation reflected by a planar reflecting surface with the incident electromagnetic radiation. Part of the electromagnetic measurement beam, which is reflected on the surface of the radiation-refracting body, strikes a measurement unit, which supplies an electrical signal as a function of the incident position of the electromagnetic radiation.

Abstract: A pattern, is imaged by means of a programmable mask, on a substrate that has a photosensitive layer, illumination spots being produced on the mask by means of an illumination unit and individual pixels being produced, via an optical unit, forming a grid of pixels on the substrate corresponding to the pattern. Structure edges that are to be reproduced on the substrate are positioned optimally. To this end at least two exposure processes for the photosensitive layer are performed, the illumination spots or exposure points of which are offset from one another. Thereby, spaces in the grid of pixels of the first exposure process, which spaces are proportionate to the number of exposure processes to be effected, are filled with pixels by the subsequent exposure processes.

Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focused onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focused measuring spot is determined based on the measured values obtained by the light detector (12).

Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focused onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focused measuring spot is determined based on the measured values obtained by the light detector (12).

Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).

Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).

Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).

Abstract: The invention relates to a method for imaging a mask (1) onto a substrate (2) by means of an illuminating unit (8) and an optical unit (9). The invention also relates to a device for carrying out the method. The aim of the invention is to create a method and a device which enable the mask (1) and the smaller structures thereof to be imaged onto the substrate (2) in a precise manner, with high functional reliability, and which enable the distortions of the substrate (2) to be corrected. To this end, the illuminating unit (8) and the optical unit (9) are displaced in relation to the mask (1) and the substrate (2), distortions of the substrate (2) are detected, and the imaging of the mask (1) is distorted according to the detected distortions by means of the optical unit (9) and is adapted to the distortions of the substrate (2).

Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (10) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).

Abstract: A method of producing microbore holes in a multi-layer substrate (5), preferably a printed circuit board substrate, that is displaced below writing optics (4) by an XY stage (6), using the optics to generate a spot from a light source (1), preferably a laser. The method reduces the treatment time and preferably compensates for distortions in the substrate material. To this end, the position of the spot within a working field is changed simultaneously with the treatment positions by electronically controlled, movable mirrors. The position of the substrate is determined by an interferometer (9, 11), and the signals corresponding to the substrate position are processed by a suitable computer system (16) to obtain an actual position of the table system. The computer system (16) is preferably provided with all bore hole coordinates and additional information such as bore hole diameter, especially in tabular form.

Abstract: A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).

Abstract: A method of producing microbore holes in a multi-layer substrate (5), preferably a printed circuit board substrate, that is displaced below writing optics (4) by an XY stage (6), using the optics to generate a spot from a light source (1), preferably a laser. The method reduces the treatment time and preferably compensates for distortions in the substrate material. To this end, the position of the spot within a working field is changed simultaneously with the treatment positions by electronically controlled, movable mirrors. The position of the substrate is determined by an interferometer (9, 11), and the signals corresponding to the substrate position are processed by a suitable computer system (16) to obtain an actual position of the table system. The computer system (16) is preferably provided with all bore hole coordinates and additional information such as bore hole diameter, especially in tabular form.