Abstract: A mirror (1a; 1a?; 1b; 1b?; 1c; 1c?) for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P??) consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include two individual layers composed of different materials for a high refractive index layer (H??) and a low refractive index layer (L??), wherein the layer arrangement includes at least one surface protecting layer (SPL, Lp) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.

Abstract: A micromirror arrangement (1) having: at least one micromirror (3) having a reflective surface (11) formed at a mirror substrate (2), and an antireflective coating (7) formed at the mirror substrate (2) outside the reflective surface (11). A reflective coating (8) is formed within the reflective surface (11) and has at least two layer subsystems, wherein the first layer subsystem has layers (8e, 8f) composed of a periodic sequence of alternate high and low refractive index layers composed of a nonmetallic material and is optimized with regard to the reflectivity in respect of a used wavelength of the micromirror arrangement, and wherein the second layer subsystem is optimized with regard to the reflectivity in respect of a measurement wavelength of the micromirror arrangement, said measurement wavelength deviating from the used wavelength.

Abstract: A mirror (1a; 1a?; 1b; 1b?; 1c; 1c?) for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P??) consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include two individual layers composed of different materials for a high refractive index layer (H??) and a low refractive index layer (L??), wherein the layer arrangement includes at least one surface protecting layer (SPL, Lp) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.

Abstract: A micromirror arrangement (1)having: at least one micromirror (3) having a reflective surface (11) formed at a mirror substrate (2), and an antireflective coating (7) formed at the mirror substrate (2) outside the reflective surface (11). A reflective coating (8) is formed within the reflective surface (11) and has at least two layer subsystems, wherein the first layer subsystem has layers (8e, 8f) composed of a periodic sequence of alternate high and low refractive index layers composed of a nonmetallic material and is optimized with regard to the reflectivity in respect of a used wavelength of the micromirror arrangement, and wherein the second layer subsystem is optimized with regard to the reflectivity in respect of a measurement wavelength of the micromirror arrangement, said measurement wavelength deviating from the used wavelength.