Patents by Inventor Roland Malischke

Roland Malischke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for vapor depositing a material utilizing an electron beam
    Patent number: 7544399
    Abstract: An arrangement for controlling the deflection of an electron beam in a vapor deposition system includes a control unit to which are assigned deflection modules (23, 27) which can be driven in accordance with respective selected functions. By driving these deflection modules, the electron beam can be deflected in two coordinate directions. At least one of the selected functions has a time-changing term via which the periodicity of the deflection of the electron beam (14) changes with respect to this coordinate direction. The term can be pregiven manually or automatically. The invention also relates to a method for controlling the deflection of the electron beam in a vapor deposition system.
    Type: Grant
    Filed: November 9, 2006
    Date of Patent: June 9, 2009
    Assignee: Carl Zeiss Vision GmbH
    Inventor: Roland Malischke
  • Vapor deposition system
    Publication number: 20070054063
    Abstract: An arrangement for controlling the deflection of an electron beam in a vapor deposition system includes a control unit to which are assigned deflection modules (23, 27) which can be driven in accordance with respective selected functions. By driving these deflection modules, the electron beam can be deflected in two coordinate directions. At least one of the selected functions has a time-changing term via which the periodicity of the deflection of the electron beam (14) changes with respect to this coordinate direction. The term can be pregiven manually or automatically. The invention also relates to a method for controlling the deflection of the electron beam in a vapor deposition system.
    Type: Application
    Filed: November 9, 2006
    Publication date: March 8, 2007
    Inventor: Roland Malischke
  • Vapor deposition system
    Patent number: 7152549
    Abstract: An arrangement for controlling the deflection of an electron beam in a vapor deposition system includes a control unit to which are assigned deflection modules (23, 27) which can be driven in accordance with respective selected functions. By driving these deflection modules, the electron beam can be deflected in two coordinate directions. At least one of the selected functions has a time-changing term via which the periodicity of the deflection of the electron beam (14) changes with respect to this coordinate direction. The term can be pregiven manually or automatically. The invention also relates to a method for controlling the deflection of the electron beam in a vapor deposition system.
    Type: Grant
    Filed: July 11, 2002
    Date of Patent: December 26, 2006
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Roland Malischke
  • Vapor deposition system
    Publication number: 20030019430
    Abstract: An arrangement for controlling the deflection of an electron beam in a vapor deposition system includes a control unit to which are assigned deflection modules (23, 27) which can be driven in accordance with respective selected functions. By driving these deflection modules, the electron beam can be deflected in two coordinate directions. At least one of the selected functions has a time-changing term via which the periodicity of the deflection of the electron beam (14) changes with respect to this coordinate direction. The term can be pregiven manually or automatically. The invention also relates to a method for controlling the deflection of the electron beam in a vapor deposition system.
    Type: Application
    Filed: July 11, 2002
    Publication date: January 30, 2003
    Inventor: Roland Malischke