Abstract: A method and apparatus for forming an image that is larger than the photoprinting plate by on-the-go formation of web alignment holes in a resist covered web and using the on-the-go web alignment holes to position the photoprinting plates so that a sequence of images can be formed from a single photoprinting plate with the sequence of images laterally positioned so that the images are in lateral registration so that the sequential formed images can appear as a single continuous image.

Abstract: A method and apparatus for precisely aligning two photo printing plates with each other by placing a light emitting laser diode on one side of one of the photoprinting plates and a photo diode that provides coordinate information on the other photoprinting plate so that when the laser beam from the laser emitting diode is directed through the photoprinting plates to the photo diode, the coordinate information on excited point on the photo diode can be compared to a reference signal to generate a control signal to activate motors that position the photoprinting plates in the proper position with respect to each other.

Abstract: Apparatus for temporarily hinging the lower portion of oppositely disposed photoprinting plates to enable decoupling the hinged top portions of the photoprinting frames so that the photoprinting frames can be pivoted toward a horizontal position to easily facilitate replacement of the photoprinting glass plates in the photoprinting frames.

Abstract: A composite shadow mask for a cathode ray tube or the like having a first shadow mask and a second support shadow mask shiftably positioned with respect to each other, with the first shadow mask made of a first material of a first thickness with the first shadow mask having a first set of openings therein, and a second shadow mask made of a second material of a second thickness, with the second shadow mask having a second set of openings so that when the first shadow mask is placed in surface-to-surface contact with the second shadow mask, the first set of openings and the second set of openings are in register with one another to thereby permit passage of an electron beam to be defined by openings in the first shadow mask even though the masks can shift with respect to each other during use.

Abstract: A method for manufacturing a shadow mask for use in a cathode ray tube includes providing a thin metal web having a first and second major surfaces. Photosensitive layers are formed on the first and second major surfaces. The first photosensitive layer is exposed to a first patterned light and the second photosensitive layer is exposed to a second patterned light. The exposure is continued until respective accumulated exposure of the photosensitive layers reaches a predetermined value. Next, a first protective film is applied to the second photosensitive layer to prevent etching of the second surface. The first surface is then etched to form a first cavity. The first cavity has a depth that is less than a distance from the first surface to the second surface. A second protective film is applied to the first surface to prevent additional etching of the first surface. Then the first protective film is removed and the second surface is etched to form a second cavity.

Abstract: An etching system for etching openings in a metal web including multiple etching station for etching a metal web from opposite sides, with each of the etching stations including a set of first bank of oscillatable nozzles located in a first chamber in the etching station, with the first bank of oscillatable nozzles having predetermined spacings from one another and operable for directing etchant at a first side of a metal web and a second bank of oscillatable nozzles located in a second chamber in the etching station, with the second bank of oscillatable nozzles having a predetermined spacing substantially identical to the first bank of oscillatable nozzles, with the second set of oscillatable nozzles laterally offset from the first set of nozzles, so they do not spray on directly opposite regions located on the metal web, with the banks of the nozzles in adjacent etching stations offset from each other with the oscillation axis of the nozzles at an angle off normal, so that etchant is sprayed in elliptical p

Abstract: An aperture mask having a grade side and a cone side with a plurality of openings of substantially the same size with the plurality of openings having a grade side partially etched region and a cone side partially etched region surrounding the plurality of openings, the grade side partially etched region surrounding the plurality of openings decreasing from the center of the mask to the periphery of the mask.

Abstract: The process of forming a plurality of openings in an aperture mask by applying a layer of etchant resist to opposite surfaces of an aperture mask material, determining an overetch factor for the aperture mask, laying out a pattern of openings in the etchant resist on one side of the aperture mask, laying out a pattern of openings in the etchant resist on the opposite side of the aperture mask wherein the size of the openings on one side of the mask in the etchant resist increase while the size of the openings in the etchant resist on the opposite side decrease, and etching the aperture mask material through the openings in the etchant resist.

Abstract: A television tube having an electron gun and an aperture mask with a plurality of line of sight openings in the aperture mask wherein the line of sight openings in the aperture mask are partially defined by material on the cone side surface of the aperture mask and partially defined by material on the grade side surface of the aperture mask with the aperture opening size and shape varying in accordance with the position of the opening in the aperture mask. Two techniques known as the capital I and capital H resist layout techniques are taught to illustrate the formation of the aperture mask.

Abstract: A television tube having an electron gun and an aperture mask with a plurality of line of sight openings in the aperture mask wherein the line of sight openings in the aperture mask are partially defined by material on the cone side surface of the aperture mask and partially defined by material on the grade side surface of the aperture mask with the aperture opening size and shape varying in accordance with the position of the opening in the aperture mask. Two techniques known as the capital I and capital H resist layout techniques are taught to illustrate the formation of the aperture mask.

Abstract: A television tube having an electron gun and an aperture mask with a plurality of line of sight openings in the aperture mask wherein the line of sight openings in the aperture mask are partially defined by material on the cone side surface of the aperture mask and partially defined by material on the grade side surface of the aperture mask with the aperture mask located in the television tube with the cone side of the aperture mask facing the electron guns.

Abstract: A method of making a line of sight opening in an article wherein the line of sight opening in the article is partially defined by material on one surface of the article and partially defined by material on the opposite surface of the article.

Abstract: A process for forming openings of varying sizes in an aperture mask by determining an over-etch factor wherein the over-etch factor is determined by the time of etching through an etchant resist pattern located on opposite sides of an aperture mask material to produce an opening of predetermined size and shape followed by individually sizing the opening in the etchant resist so that etching from both sides of the aperture mask material produces etched openings of various sizes throughout the aperture with the sizing of the opening in the etchant resist characterized by having substantially constant over-etch factor even though the final openings in the aperture masks are of various sizes.