Patents by Inventor Roland Trassl

Roland Trassl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11888143
    Abstract: A method of manufacturing an anode structure (10) for a lithium battery is described. The method includes a first deposition of lithium on a first flexible support (21) to provide a lithium anode-first sublayer (12-1) with a first lithium surface (31); a second deposition of lithium on a second flexible support (22) to provide a lithium anode-second sublayer (12-2) with a second lithium surface (32); and combining the lithium anode-first sublayer (12-1) and the lithium anode-second sublayer (12-2) by pressing the first lithium surface and the second lithium surface together to form a lithium metal anode layer (12). Further described are a lithium battery layer stack with an anode structure manufactured according to the described method, and a vacuum deposition system for manufacturing an anode structure as described herein.
    Type: Grant
    Filed: December 2, 2021
    Date of Patent: January 30, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventor: Roland Trassl
  • Publication number: 20240021776
    Abstract: A method of manufacturing an anode structure (10) for a lithium battery is described. The method includes a first deposition of lithium on a first flexible support (21) to provide a lithium anode-first sublayer (12-1) with a first lithium surface (31); a second deposition of lithium on a second flexible support (22) to provide a lithium anode-second sublayer (12-2) with a second lithium surface (32); and combining the lithium anode-first sublayer (12-1) and the lithium anode-second sublayer (12-2) by pressing the first lithium surface and the second lithium surface together to form a lithium metal anode layer (12). Further described are a lithium battery layer stack with an anode structure manufactured according to the described method, and a vacuum deposition system for manufacturing an anode structure as described herein.
    Type: Application
    Filed: September 27, 2023
    Publication date: January 18, 2024
    Inventor: Roland TRASSL
  • Publication number: 20230170580
    Abstract: Implementations of the present disclosure generally relate to separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, systems and methods for fabricating the same. In one implementation, a separator is provided. The separator comprises a polymer substrate, capable of conducting ions, having a first surface and a second surface opposing the first surface. The separator further comprises a first ceramic-containing layer, capable of conducting ions, formed on the first surface. The first ceramic-containing layer has a thickness in a range from about 1,000 nanometers to about 5,000 nanometers. The separator further comprises a second ceramic-containing layer, capable of conducting ions, formed on the second surface. The second ceramic-containing layer is a binder-free ceramic-containing layer and has a thickness in a range from about 1 nanometer to about 1,000 nanometers.
    Type: Application
    Filed: January 25, 2023
    Publication date: June 1, 2023
    Inventors: Connie P. WANG, Wen SI, Yin Let SIM, Torsten DIETER, Roland TRASSL, Subramanya P. HERLE, Christoph DAUBE, Jian ZHU, James CUSHING
  • Publication number: 20230170581
    Abstract: Implementations of the present disclosure generally relate to separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, systems and methods for fabricating the same. In one implementation, a separator is provided. The separator comprises a polymer substrate, capable of conducting ions, having a first surface and a second surface opposing the first surface. The separator further comprises a first ceramic-containing layer, capable of conducting ions, formed on the first surface. The first ceramic-containing layer has a thickness in a range from about 1,000 nanometers to about 5,000 nanometers. The separator further comprises a second ceramic-containing layer, capable of conducting ions, formed on the second surface. The second ceramic-containing layer is a binder-free ceramic-containing layer and has a thickness in a range from about 1 nanometer to about 1,000 nanometers.
    Type: Application
    Filed: January 25, 2023
    Publication date: June 1, 2023
    Inventors: Connie P. WANG, Wen SI, Yin Let SIM, Torsten DIETER, Roland TRASSL, Subramanya P. HERLE, Christoph DAUBE, Jian ZHU, James CUSHING
  • Publication number: 20230113276
    Abstract: Methods and apparatuses for processing lithium batteries with a laser source having a wide process window, high efficiency, and low cost are provided. The laser source is adapted to achieve high average power and a high frequency of picosecond pulses. The laser source can produce a line-shaped beam either in a fixed position or in scanning mode. The system can be operated in a dry room or vacuum environment. The system can include a debris removal mechanism, for example, inert gas flow, to the processing site to remove debris produced during the patterning process.
    Type: Application
    Filed: September 16, 2022
    Publication date: April 13, 2023
    Inventors: Wei-Sheng LEI, Girish Kumar GOPALAKRISHNAN NAIR, Kent Qiujing ZHAO, Daniel STOCK, Tobias STOLLEY, Thomas DEPPISCH, Jean DELMAS, Kenneth S. LEDFORD, Subramanya P. HERLE, Kiran VACHHANI, Mahendran CHIDAMBARAM, Roland TRASSL, Neil MORRISON, Frank SCHNAPPENBERGER, Kevin Laughton CUNNINGHAM, Stefan BANGERT, James CUSHING, Visweswaren SIVARAMAKRISHNAN
  • Patent number: 11588209
    Abstract: Separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, systems and methods for fabricating the same. In one implementation, a separator is provided. The separator comprises a polymer substrate (131), capable of conducting ions, having a first surface and a second surface opposing the first surface. The separator further comprises a first ceramic-containing layer (136), capable of conducting ions, formed on the first surface. The first ceramic-containing layer (136) has a thickness in arrange from about 1,000 nanometers to about 5000 nanometers. The separator further comprises a second ceramic-containing layer (138), capable of conducting ions, formed on the second surface. The second ceramic-containing layer (138) is a binder-free ceramic-containing layer and has a thickness in arrange from about 1 nanometer to about 1,000 nanometers.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: February 21, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Connie P. Wang, Wen Si, Yin Let Sim, Torsten Dieter, Roland Trassl, Subramanya P. Herle, Christoph Daube, Jian Zhu, James Cushing
  • Publication number: 20220190308
    Abstract: A method of manufacturing an anode structure (10) for a lithium battery is described. The method includes a first deposition of lithium on a first flexible support (21) to provide a lithium anode-first sublayer (12-1) with a first lithium surface (31); a second deposition of lithium on a second flexible support (22) to provide a lithium anode-second sublayer (12-2) with a second lithium surface (32); and combining the lithium anode-first sublayer (12-1) and the lithium anode-second sublayer (12-2) by pressing the first lithium surface and the second lithium surface together to form a lithium metal anode layer (12). Further described are a lithium battery layer stack with an anode structure manufactured according to the described method, and a vacuum deposition system for manufacturing an anode structure as described herein.
    Type: Application
    Filed: December 2, 2021
    Publication date: June 16, 2022
    Inventor: Roland TRASSL
  • Publication number: 20220059814
    Abstract: An anode electrode structure (10) is described. The anode electrode structure (10) includes a substrate (11) having a first surface (111) and an opposite second surface (112), a first lithium film (12) provided on the first surface (111), and a second lithium film (13) provided on the second surface (112). Further, the anode electrode structure (10) includes a first interface film (14) provided on the first lithium film (12) and a second interface film (15) provided on the second lithium film (13). The first interface film (14) and the second interface film (15) are lithium-ion conducting. Further, a lithium-ion battery having an anode electrode structure according to the present disclosure, methods of making an anode electrode structure and a lithium-ion battery, as well as a substrate processing system for producing an anode electrode structure are described.
    Type: Application
    Filed: August 9, 2021
    Publication date: February 24, 2022
    Inventor: Roland TRASSL
  • Publication number: 20210328308
    Abstract: Separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, systems and methods for fabricating the same. In one implementation, a separator is provided. The separator comprises a polymer substrate (131), capable of conducting ions, having a first surface and a second surface opposing the first surface. The separator further comprises a first ceramic-containing layer (136), capable of conducting ions, formed on the first surface. The first ceramic-containing layer (136) has a thickness in arrange from about 1,000 nanometers to about 5000 nanometers. The separator further comprises a second ceramic-containing layer (138), capable of conducting ions, formed on the second surface. The second ceramic-containing layer (138) is a binder-free ceramic-containing layer and has a thickness in arrange from about 1 nanometer to about 1,000 nanometers.
    Type: Application
    Filed: August 21, 2018
    Publication date: October 21, 2021
    Inventors: Connie P. WANG, Wen SI, Yin Let SIM, Torsten DIETER, Roland TRASSL, Subramanya P. HERLE, Christoph DAUBE, Jian ZHU, James CUSHING
  • Patent number: 11058010
    Abstract: An evaporation apparatus (100) for depositing material on a flexible substrate (160) supported by a processing drum (170) is provided. The evaporation apparatus includes: a first set (110) of evaporation crucibles aligned in a first line (120) along a first direction for generating a cloud (151) of evaporated material to be deposited on the flexible substrate (160); and a gas supply pipe (130) extending in the first direction and being arranged between an evaporation crucible of the first set (110) of evaporation crucibles and the processing drum (170), wherein the gas supply pipe (130) includes a plurality of outlets (133) for providing a gas supply directed into the cloud of evaporated material, and wherein a position of the plurality of outlets is adjustable for changing a position of the gas supply directed into the cloud of evaporated material.
    Type: Grant
    Filed: August 1, 2016
    Date of Patent: July 6, 2021
    Assignee: Applied Materials, Inc.
    Inventor: Roland Trassl
  • Publication number: 20190246504
    Abstract: An evaporation apparatus (100) for depositing material on a flexible substrate (160) supported by a processing drum (170) is provided. The evaporation apparatus includes: a first set (110) of evaporation crucibles aligned in a first line (120) along a first direction for generating a cloud (151) of evaporated material to be deposited on the flexible substrate (160); and a gas supply pipe (130) extending in the first direction and being arranged between an evaporation crucible of the first set (110) of evaporation crucibles and the processing drum (170), wherein the gas supply pipe (130) includes a plurality of outlets (133) for providing a gas supply directed into the cloud of evaporated material, and wherein a position of the plurality of outlets is adjustable for changing a position of the gas supply directed into the cloud of evaporated material.
    Type: Application
    Filed: August 1, 2016
    Publication date: August 8, 2019
    Applicant: Applied Materials, Inc.
    Inventor: Roland TRASSL
  • Patent number: 10081866
    Abstract: An evaporation apparatus for depositing material on a substrate by a drum is described. The evaporation apparatus includes a first set of evaporation crucibles aligned in a first line a first direction for depositing evaporated material on the substrate; a first gas supply pipe extending in the first direction being arranged between at least one of the evaporation crucibles of the first set of evaporation crucibles and the drum; and a second gas supply pipe extending in the first direction for providing a gas between the first set of evaporation crucibles and the drum with openings shaped and positioned to improve the uniformity of the deposition of the material.
    Type: Grant
    Filed: July 12, 2013
    Date of Patent: September 25, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Gerd Hoffmann, Sven Schramm, Roland Trassl
  • Publication number: 20150000598
    Abstract: An evaporation apparatus for depositing material on a substrate by a drum is described. The evaporation apparatus includes a first set of evaporation crucibles aligned in a first line a first direction for depositing evaporated material on the substrate; a first gas supply pipe extending in the first direction being arranged between at least one of the evaporation crucibles of the first set of evaporation crucibles and the drum; and a second gas supply pipe extending in the first direction for providing a gas between the first set of evaporation crucibles and the drum with openings shaped and positioned to improve the uniformity of the deposition of the material.
    Type: Application
    Filed: July 12, 2013
    Publication date: January 1, 2015
    Inventors: Gerd HOFFMANN, Sven SCHRAMM, Roland TRASSL
  • Patent number: 8157975
    Abstract: A sputter target for sputtering a silicon-containing film is provided. The target includes a silicon-containing sputter material layer, and a carrier for carrying the sputter material layer, wherein the sputter material layer contains less than 200 ppm iron.
    Type: Grant
    Filed: February 18, 2009
    Date of Patent: April 17, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Roland Trassl, Wolf-Eckart Fritsche
  • Publication number: 20120028449
    Abstract: A method of producing an anti-reflection and/or passivation coating for semiconductor devices is provided. The method includes: providing a semiconductor device precursor 30 having a surface to be provided with the anti-reflection and/or passivation coating; treating the surface with ions; and depositing a hydrogen containing anti-reflection and/or passivation coating onto the treated surface.
    Type: Application
    Filed: October 17, 2011
    Publication date: February 2, 2012
    Inventors: Nicolas Auriac, Roland Trassl
  • Publication number: 20110146770
    Abstract: A solar cell module layer stack is described. The layer stack includes a doped silicon wafer substrate, a further layer of the substrate or deposited on the substrate, wherein the further layer is doped for generation of a p-n-junction with the doped silicon wafer substrate; and a first sputtered passivation layer deposited on the doped silicon wafer substrate or the further layer, wherein the passivation layer is selected from the group consisting of: an aluminum-containing oxide layer, an aluminum-containing oxynitride layer, and mixtures thereof; and wherein the passivation layer being plasma treated under a hydrogen-containing atmosphere and/or wherein the layer stack further comprises a hydrogen-containing cap layer on the passivation layer.
    Type: Application
    Filed: December 29, 2009
    Publication date: June 23, 2011
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Torsten Bruno DIETER, Roland TRASSL, Carsten GOERGENS
  • Publication number: 20110092079
    Abstract: A method of producing an anti-reflection and/or passivation coating for semiconductor devices is provided. The method includes: providing a semiconductor device precursor 30 having a surface to be provided with the anti-reflection and/or passivation coating; treating the surface with ions; and depositing a hydrogen containing anti-reflection and/or passivation coating onto the treated surface.
    Type: Application
    Filed: October 22, 2009
    Publication date: April 21, 2011
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Nicolas AURIAC, Roland TRASSL
  • Publication number: 20110048515
    Abstract: A solar cell module layer stack is described. The layer stack includes a doped silicon wafer substrate, a back contact layer for the solar cell module, and a first sputtered and annealed passivation layer between the wafer substrate and the back contact layer, wherein the passivation layer is selected from the group consisting of: an aluminum containing oxide layer, an aluminum containing nitride layer, an aluminum containing oxynitride layer, and mixtures thereof.
    Type: Application
    Filed: September 8, 2009
    Publication date: March 3, 2011
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Manfred ENGLERT, Sven SCHRAMM, Roland TRASSL
  • Publication number: 20100236920
    Abstract: A deposition apparatus and a method for sputtering material on a substrate is provided with a substrate holder for holding the substrate, a rotatable target adapted for being sputtered, and a heating system including a back side heating for heating the substrate from the back and a front side heating for heating the substrate from the front. The rotatable target acts as the front side heating and is adapted for heating the substrate to a temperature of at least 100° C. A method for performing this method is disclosed.
    Type: Application
    Filed: March 20, 2009
    Publication date: September 23, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Joachim Mueller, Roland Trassl, Jian Liu
  • Patent number: 7763535
    Abstract: The present invention relates to a method for manufacturing a backside contact of a semiconductor component, in particular, of a solar cell, comprising a metallic layer on the backside of a substrate in a vacuum treatment chamber, and the use of a vacuum treatment system for performing said method. Through this method and its use, in particular silicon based solar cells, can be provided with a back contact in a simple manner in a continuous process sequence, wherein the process sequence can be provided particularly efficient and economical, since no handling systems for rotating the substrate are required, and in particular silk screening steps can be dispensed with.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: July 27, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Roland Trassl, Jian Liu, Stephan Wieder, Jürgen Henrich, Gerhard Rist