Patents by Inventor Rolf Bazlen
Rolf Bazlen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11143416Abstract: An electrical radiation heater arrangement for a vacuum enclosure includes at least two sets of linear heating sources, arranged in a corresponding number of concentric heating zones. The heating sources are arranged directly on the vacuum side of the vacuum enclosure and electrically connected to current rails arranged on the vacuum side with each of the current rails being connected to one electrical feedthrough from vacuum to ambient. Preferably, the heating sources are arranged in a polygon approaching a circle, essentially radially or a combination of both.Type: GrantFiled: July 29, 2014Date of Patent: October 12, 2021Assignee: EVATEC AGInventors: Juergen Weichart, Rolf Bazlen
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Patent number: 10590538Abstract: To reduce pumping time of a vacuum treatment chamber served by a transport arrangement in a transport chamber. The vacuum treatment chamber is split in a workpiece treatment compartment and in a pumping compartment in mutual free flow communication and arranged opposite each other with respect to a movement path of the transport arrangement serving the vacuum treatment chamber. The pumping compartment allows providing a pumping port of a flow cross-section area freely selectable independently from the geometry of the treatment compartment.Type: GrantFiled: November 26, 2018Date of Patent: March 17, 2020Assignee: EVATEC AGInventors: Bart Scholte Von Mast, Wolfgang Rietzler, Rogier Lodder, Rolf Bazlen, Daniel Rohrer
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Publication number: 20190093223Abstract: To reduce pumping time of a vacuum treatment chamber served by a transport arrangement in a transport chamber. The vacuum treatment chamber is split in a workpiece treatment compartment and in a pumping compartment in mutual free flow communication and arranged opposite each other with respect to a movement path of the transport arrangement serving the vacuum treatment chamber. The pumping compartment allows providing a pumping port of a flow cross-section area freely selectable independently from the geometry of the treatment compartment.Type: ApplicationFiled: November 26, 2018Publication date: March 28, 2019Applicant: EVATEC AGInventors: Bart Scholte Von Mast, Wolfgang Rietzler, Rogier Lodder, Rolf Bazlen, Daniel Rohrer
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Patent number: 10138553Abstract: To reduce pumping time of a vacuum treatment chamber served by a transport arrangement in a transport chamber. The vacuum treatment chamber is split in a workpiece treatment compartment and in a pumping compartment in mutual free flow communication and arranged opposite each other with respect to a movement path of the transport arrangement serving the vacuum treatment chamber. The pumping compartment allows providing a pumping port of a flow cross-section area freely selectable independently from the geometry of the treatment compartment.Type: GrantFiled: May 25, 2016Date of Patent: November 27, 2018Assignee: EVATEC AGInventors: Bart Scholte Von Mast, Wolfgang Rietzler, Rogier Lodder, Rolf Bazlen, Daniel Rohrer
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Publication number: 20160265109Abstract: To reduce pumping time of a vacuum treatment chamber served by a transport arrangement in a transport chamber. The vacuum treatment chamber is split in a workpiece treatment compartment and in a pumping compartment in mutual free flow communication and arranged opposite each other with respect to a movement path of the transport arrangement serving the vacuum treatment chamber. The pumping compartment allows providing a pumping port of a flow cross-section area freely selectable independently from the geometry of the treatment compartment.Type: ApplicationFiled: May 25, 2016Publication date: September 15, 2016Applicant: EVATEC AGInventors: Bart Scholte Von Mast, Wolfgang Rietzler, Rogier Lodder, Rolf Bazlen, Daniel Rohrer
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Patent number: 9396981Abstract: To reduce pumping time of a vacuum treatment chamber served by a transport arrangement in a transport chamber the vacuum treatment chamber is split into a workpiece treatment compartment and a pumping compartment in mutual free flow communication and arranged opposite each other with respect to a movement path of the transport arrangement serving the vacuum treatment chamber. The pumping compartment allows a pumping port to have a flow cross-section area that is freely selectable independently from the geometry of the treatment compartment.Type: GrantFiled: December 27, 2011Date of Patent: July 19, 2016Assignee: EVATEC AGInventors: Bart Scholte Von Mast, Wolfgang Rietzler, Rogier Lodder, Rolf Bazlen, Daniel Rohrer
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Publication number: 20160169536Abstract: An electrical radiation heater arrangement for a vacuum enclosure includes at least two sets of linear heating sources, arranged in a corresponding number of concentric heating zones. The heating sources are arranged directly on the vacuum side of the vacuum enclosure and electrically connected to current rails arranged on the vacuum side with each of the current rails being connected to one electrical feedthrough from vacuum to ambient. Preferably, the heating sources are arranged in a polygon approaching a circle, essentially radially or a combination of both.Type: ApplicationFiled: July 29, 2014Publication date: June 16, 2016Inventors: Juergen Weichart, Rolf Bazlen
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Patent number: 9252037Abstract: A vacuum treatment apparatus and method for manufacturing has a plurality of treatment chambers for treating workpieces, in particular silicon wafers, a transfer chamber attached to the treatment chambers communicating via respective openings and having handling zones located adjacent to each of the treatment chambers. A workpiece carrier is arranged within the transfer chamber and configured to transfer the workpieces between the handling zones, and one or more handlers for moving the workpieces between the handling zones and the treatment chambers. The transfer chamber is ring-shaped about an axis and the openings have opening substantially parallel thereto. This way, forces on the transfer chamber are redirected to a large support structure and thus, a cost-effective, light and still rigid mechanical construction can be achieved.Type: GrantFiled: December 27, 2011Date of Patent: February 2, 2016Assignee: Oerlikon Advanced Technologies AGInventors: Bart Scholte Von Mast, Wolfgang Rietzler, Rogier Lodder, Rolf Bazlen, Daniel Rohrer
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Patent number: 9222173Abstract: An exhaust opening of a process chamber (12) contained in a vacuum chamber (11) is connected to an exhaust line (13) by a connector comprising a bellows (03) with one end which is connected to the exhaust line (13) fixed to a housing and its opposite end carrying a coupling tube (02) for connecting to a coupling ring (01) which surrounds the exhaust opening, the coupling tube (02) being elastically biased towards the same. The coupling tube (02) can be moved between a connected state where it is in contact with the coupling ring (01) and a disconnected state by an actuator reciprocatable in an axial direction perpendicular to the exhaust opening. To enable a gas-tight connection with the process chamber (12) the coupling tube (02) has lateral play such that it can align with the coupling ring (01) when a conical surface of the coupling tube (02) contacts a complementary conical surface on the coupling ring (01) in the connected state.Type: GrantFiled: May 28, 2011Date of Patent: December 29, 2015Assignee: EVATEC ADVANCED TECHNOLOGIES AGInventor: Rolf Bazlen
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Publication number: 20140086711Abstract: To reduce pumping time of a vacuum treatment chamber served by a transport arrangement in a transport chamber the vacuum treatment chamber is split into a workpiece treatment compartment and a pumping compartment in mutual free flow communication and arranged opposite each other with respect to a movement path of the transport arrangement serving the vacuum treatment chamber. The pumping compartment allows a pumping port to have a flow cross-section area that is freely selectable independently from the geometry of the treatment compartment.Type: ApplicationFiled: December 27, 2011Publication date: March 27, 2014Applicant: OC OERLIKON BALZERS AGInventors: Bart Scholte Von Mast, Wolfgang Rietzler, Rogier Lodder, Rolf Bazlen, Daniel Rohrer
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Publication number: 20130287527Abstract: A vacuum treatment apparatus and method for manufacturing has a plurality of treatment chambers for treating workpieces, in particular silicon wafers, a transfer chamber attached to the treatment chambers communicating via respective openings and having handling zones located adjacent to each of the treatment chambers. A workpiece carrier is arranged within the transfer chamber and configured to transfer the workpieces between the handling zones, and one or more handlers for moving the workpieces between the handling zones and the treatment chambers. The transfer chamber is ring-shaped about an axis and the openings have opening substantially parallel thereto. This way, forces on the transfer chamber are redirected to a large support structure and thus, a cost-effective, light and still rigid mechanical construction can be achieved.Type: ApplicationFiled: December 27, 2011Publication date: October 31, 2013Applicant: OC OERLIKON BALZERS AGInventors: Bart Scholte Von Mast, Wolfgang Rietzler, Rogier Lodder, Rolf Bazlen, Daniel Rohrer
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Publication number: 20130133576Abstract: An exhaust opening of a process chamber (12) contained in a vacuum chamber (11) is connected to an exhaust line (13) by a connector comprising a bellows (03) with one end which is connected to the exhaust line (13) fixed to a housing and its opposite end carrying a coupling tube (02) for connecting to a coupling ring (01) which surrounds the exhaust opening, the coupling tube (02) being elastically biased towards the same. The coupling tube (02) can be moved between a connected state where it is in contact with the coupling ring (01) and a disconnected state by an actuator reciprocatable in an axial direction perpendicular to the exhaust opening. To enable a gas-tight connection with the process chamber (12) the coupling tube (02) has lateral play such that it can align with the coupling ring (01) when a conical surface of the coupling tube (02) contacts a complementary conical surface on the coupling ring (01) in the connected state.Type: ApplicationFiled: May 28, 2011Publication date: May 30, 2013Applicant: OC Oerlikon Balzers AGInventor: Rolf Bazlen
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Publication number: 20070187040Abstract: A centering pin arrangement for clamping a substrate with a hole with radius rmax comprises two bolts (2, 3) with an essentially semicircular cross section K, said bolts having radii r2 and r3 respectively. Said radii r2 and r3 are different and at least one of the bolts (2, 3) has a radius bigger or equal to the radius rmax of the hole. In another embodiment both radii r2 and r3 are bigger than the radius rmax of the hole.Type: ApplicationFiled: January 29, 2007Publication date: August 16, 2007Applicant: OC OERLIKON BALZERS AGInventors: Georg Edenhofer, Rolf Bazlen