Abstract: A process for the deposition of a catalyst in an exchanger-reactor including an inlet, an outlet, and microchannels, the microchannels including an internal surface, the process including positioning the exchanger-reactor in a vertical position, wherein the inlet and the outlet are in a plane perpendicular to a horizontal plane and, wherein the inlet and outlet are below the microchannels, introducing a catalyst in suspension into the exchanger-reactor via the inlet by means of a pump, filling the exchanger-reactor with the catalyst in suspension at a rate of between 5 and 20 ml/min, and emptying the exchanger-reactor, thereby depositing at least a portion of the catalyst on the internal surface.