Abstract: Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyl diphenylalkanes Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×104 and an Mz/Mw ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×104 and a polydispersity index Mw/Mn of less than 1.60.

Abstract: A composition useful to provide oil repellency, water repellency, and stain resistance to substrates comprising a polymer prepared by contacting a polyfluoroalkyl sulfonyl halide with a compound of Formula II, III or IV (E-(O)q)3Si—O—(Si(R2)2—O)m—[Si(R3—NHR4)(R2)O]n—Si—((O)q-E)3 ??formula II HR4N—R3—Si(R2)2—O—[Si(R2)2—O—[Si(R3—NHR4)(R2)O]n—Si(R2)2—R3—NHR4 ??Formula III HR4N—R3—Si(R2)2—O—[Si(R2)2—O]m—Si—((O)q-E)3 ??Formula IV wherein each R2 is independently a C1 to C8 alkyl, each R3 is independently a divalent group containing carbon, oxygen, and optionally at least one of nitrogen oxygen and sulfur, each R4 is independently H or C1 to C8 alkyl, each E is independently a C1 to C8 branched or linear alkyl, each q is independently zero or 1, m is a positive integer, and n is independently zero or a positive integer, such that n/(m+n) is zero or a positive fraction having a value up to about 0.7, and the polymer viscosity is less than or equal to 10000 mPa·s under a shear rate of 0.

Abstract: Radical polymerization process for the preparation of halogenated polymers and block copolymers. Halogenated polymers and block copolymers.

Abstract: Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyldiphenylalkanes. Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×104 and an Mz/Mw, ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×104 and a polydispersity index Mw/Mn, of less than 1.60.

Abstract: The present invention relates to a multilayer structure comprising: