Patents by Inventor Roman Malendevich

Roman Malendevich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7586608
    Abstract: This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light from top of the wafer.
    Type: Grant
    Filed: March 28, 2007
    Date of Patent: September 8, 2009
    Assignee: Luxtera, Inc.
    Inventors: Lawrence C. Gunn, III, Roman Malendevich, Thierry J. Pinguet, Maxime Jean Rattier, Myles Sussman, Jeremy Witzens
  • Patent number: 7412138
    Abstract: This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light to/from the top of a wafer. A wafer level test system uses optical and electronic probes to search for and align with an optoelectronic alignment structure. The test system uses a located optoelectronic alignment structure as a reference point to locate other devices on the wafer. The system tests the operation of selected devices disposed on the wafer. The optoelectronic alignment loop is also used as an alignment reference of known performance for an adjacent device of unknown performance.
    Type: Grant
    Filed: February 28, 2007
    Date of Patent: August 12, 2008
    Assignee: Luxtera, Inc.
    Inventors: Roman Malendevich, Myles Sussman, Lawrence C. Gunn, III
  • Patent number: 7378861
    Abstract: This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light to/from the top of the wafer. A wafer level test system uses an optical probe to search for and align with an optical alignment loop. The test system uses a located alignment loop as a reference point to locate other devices on the wafer. The test system tests the operation of selected devices disposed on the wafer. The alignment loop is also used as a reference device for an adjacent device of unknown performance.
    Type: Grant
    Filed: February 26, 2007
    Date of Patent: May 27, 2008
    Assignee: Luxtera, Inc.
    Inventors: Roman Malendevich, Myles Sussman, Lawrence C. Gunn, III
  • Patent number: 7298939
    Abstract: This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light to/from the top of a wafer. A wafer level test system uses optical and electronic probes to search for and align with an optoelectronic alignment structure. The test system uses a located optoelectronic alignment structure as a reference point to locate other devices on the wafer. The system tests the operation of selected devices disposed on the wafer. The optoelectronic alignment loop is also used as an alignment reference of known performance for an adjacent device of unknown performance.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: November 20, 2007
    Assignee: Luxtera, Inc.
    Inventors: Roman Malendevich, Myles Sussman, Lawrence C. Gunn III
  • Patent number: 7262852
    Abstract: This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light from top of the wafer.
    Type: Grant
    Filed: November 14, 2005
    Date of Patent: August 28, 2007
    Assignee: Luxtera, Inc.
    Inventors: Lawrence C. Gunn, III, Roman Malendevich, Thierry J. Pinguet, Maxime Jean Rattier, Myles Sussman, Jeremy Witzens
  • Patent number: 7224174
    Abstract: This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light to/from the top of the wafer. A wafer level test system uses an optical probe to search for and align with an optical alignment loop. The test system uses a located alignment loop as a reference point to locate other devices on the wafer. The test system tests the operation of selected devices disposed on the wafer. The alignment loop is also used as a reference device for an adjacent device of unknown performance.
    Type: Grant
    Filed: December 17, 2004
    Date of Patent: May 29, 2007
    Assignee: Luxtera, Inc.
    Inventors: Roman Malendevich, Myles Sussman, Lawrence C. Gunn, III
  • Patent number: 7184626
    Abstract: This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light from top of the wafer.
    Type: Grant
    Filed: April 7, 2004
    Date of Patent: February 27, 2007
    Assignee: Luxtera, Inc
    Inventors: Lawrence C. Gunn, III, Roman Malendevich, Thierry J. Pinguet, Maxime J. Rattier, Myles Sussman, Jeremy Witzens
  • Patent number: 7183759
    Abstract: This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light to/from the top of the wafer. During the optical testing, the vertical spacing between an optical probe and the wafer is set to a very close distance, to achieve efficient optical coupling. It is beneficial to keep this close distance during optical testing as a constant in testing different optical components at different locations on the wafer. In one implementation, a spacing sensor may be used to measure the height of the optical probe from the wafer surface. This sensor may be a capacitance sensor that is mounted at the optical probe.
    Type: Grant
    Filed: December 17, 2004
    Date of Patent: February 27, 2007
    Assignee: Luxtera, Inc.
    Inventors: Roman Malendevich, Myles Sussman, Lawrence C. Gunn, III
  • Patent number: 7024066
    Abstract: This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical and optoelectronic testing by coupling probe light to/from the top of the wafer. In the described exemplary implementations, wafers are designed with one or more optical alignment features or structures. The alignment structures are alongside the devices to be tested, but are easier to find or locate by optical means, than the devices to be tested. An optical diffraction grating structure such as a Littrow grating may be used as reflective alignment structures. (FIG. 6B and paragraph 56.) A Littrow grating as an alignment structure produces a retro-reflection. A Littrow grating is a one-port optical device, with input and output beams going along the same path. Various exemplary implementations are shown in FIGS. 3C, 5, 6A, 6B, 7A and 7B and described in paragraphs 18–21, 39–40 and 53–64.
    Type: Grant
    Filed: December 17, 2004
    Date of Patent: April 4, 2006
    Assignee: Luxtera, Inc.
    Inventors: Roman Malendevich, Myles Sussman, Lawrence C. Gunn, III