Patents by Inventor Ron Bertram

Ron Bertram has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • APPARATUS AND METHODS FOR ISOLATING CHEMICAL VAPOR REACTIONS AT A SUBSTRATE SURFACE
    Publication number: 20080248200
    Abstract: An apparatus and method for processing a substrate is provided. The apparatus comprises a reaction chamber, a substrate holder within the chamber, and first and second injector components. The reaction chamber has an upstream end and a downstream end, between which the substrate holder is positioned. The substrate holder is configured to support a substrate so that the substrate is within a plane extending generally toward the upstream and downstream ends. The first injector component is at the upstream end of the chamber and is configured to inject a first thin gas curtain toward a substrate supported by the substrate holder. The first injector component is configured to inject the first curtain generally along a first plane that is parallel to a first side of the substrate. The second injector component is configured to inject a second thin gas curtain toward the first side of the substrate.
    Type: Application
    Filed: June 6, 2008
    Publication date: October 9, 2008
    Applicant: ASM AMERICA, INC.
    Inventors: Chantal J. Arena, Chris Werkhoven, Ron Bertram
  • Apparatus and methods for isolating chemical vapor reactions at a substrate surface
    Patent number: 7396415
    Abstract: An apparatus and method for processing a substrate is provided. The apparatus comprises a reaction chamber, a substrate holder within the chamber, and first and second injector components. The reaction chamber has an upstream end and a downstream end, between which the substrate holder is positioned. The substrate holder is configured to support a substrate so that the substrate is within a plane extending generally toward the upstream and downstream ends. The first injector component is at the upstream end of the chamber and is configured to inject a first thin gas curtain toward a substrate supported by the substrate holder. The first injector component is configured to inject the first curtain generally along a first plane that is parallel to a first side of the substrate. The second injector component is configured to inject a second thin gas curtain toward the first side of the substrate.
    Type: Grant
    Filed: June 2, 2005
    Date of Patent: July 8, 2008
    Assignee: ASM America, Inc.
    Inventors: Chantal J. Arena, Chris Werkhoven, Ron Bertram
  • Apparatus and methods for isolating chemical vapor reactions at a substrate surface
    Publication number: 20060275546
    Abstract: An apparatus and method for processing a substrate is provided. The apparatus comprises a reaction chamber, a substrate holder within the chamber, and first and second injector components. The reaction chamber has an upstream end and a downstream end, between which the substrate holder is positioned. The substrate holder is configured to support a substrate so that the substrate is within a plane extending generally toward the upstream and downstream ends. The first injector component is at the upstream end of the chamber and is configured to inject a first thin gas curtain toward a substrate supported by the substrate holder. The first injector component is configured to inject the first curtain generally along a first plane that is parallel to a first side of the substrate. The second injector component is configured to inject a second thin gas curtain toward the first side of the substrate.
    Type: Application
    Filed: June 2, 2005
    Publication date: December 7, 2006
    Inventors: Chantal Arena, Chris Werkhoven, Ron Bertram