Patents by Inventor Ron Couture

Ron Couture has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist laminate including photoimageable adhesive layer
    Patent number: 5415971
    Abstract: A photosensitive mask laminate having a photoimageable, pressure sensitive adhesive layer and a photoimageable masking layer is disclosed. The laminate also includes a support layer, and it can include a removable carrier layer and a release layer. The laminate can be imaged by selective exposure to light or other radiation, and developing the laminate produces a mask having void and mask areas. The mask can then be used to protect selected portions of a target surface during a sandblast decorative process.
    Type: Grant
    Filed: April 2, 1993
    Date of Patent: May 16, 1995
    Assignee: The Chromaline Corporation
    Inventors: Ron Couture, Todd R. Murphy, Toshifumi Komatsu