Patents by Inventor Ron Davidescu

Ron Davidescu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Adaptive geometry for optimal focused ion beam etching
    Patent number: 11315754
    Abstract: A method of evaluating a region of a sample that includes alternating layers of different material. The method includes milling, with a focused ion beam, a portion of the sample that includes the alternating layers of different material; reducing the milling area; and repeating the milling and reducing steps multiple times during the delayering process until the process is complete.
    Type: Grant
    Filed: April 27, 2020
    Date of Patent: April 26, 2022
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Ilya Blayvas, Gal Bruner, Yehuda Zur, Alexander Mairov, Ron Davidescu, Kfir Dotan, Alon Litman
  • ADAPTIVE GEOMETRY FOR OPTIMAL FOCUSED ION BEAM ETCHING
    Publication number: 20210335571
    Abstract: A method of evaluating a region of a sample that includes alternating layers of different material. The method includes milling, with a focused ion beam, a portion of the sample that includes the alternating layers of different material; reducing the milling area; and repeating the milling and reducing steps multiple times during the delayering process until the process is complete.
    Type: Application
    Filed: April 27, 2020
    Publication date: October 28, 2021
    Applicant: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Ilya Blayvas, Gal Bruner, Yehuda Zur, Alexander Mairov, Ron Davidescu, Kfir Dotan, Alon Litman
  • Generating milled structural elements with a flat upper surface
    Patent number: 10971618
    Abstract: A miller, a non-transitory computer-readable medium, and a method for milling a multi-layered object. The method may include milling each structural element of an array of structural elements that are spaced apart from each other by gaps to provide the milled structural elements, wherein each milled structural element has a flat upper surface, wherein prior the milling each one of the structural elements of the array has a flat upper surface of a certain width, wherein the certain width is of a nanometric scale. The milling of each structural element of the array may include scanning a defocused ion beam of the certain width along a longitudinal axis of the structural element. A current intensity of the defocused ion beam decreases with a distance from a middle of the defocused ion beam.
    Type: Grant
    Filed: August 2, 2019
    Date of Patent: April 6, 2021
    Assignee: Applied Materials Israel Ltd.
    Inventors: Ron Davidescu, Yehuda Zur
  • GENERATING MILLED STRUCTURAL ELEMENTS WITH A FLAT UPPER SURFACE
    Publication number: 20210036142
    Abstract: A miller, a non-transitory computer-readable medium, and a method for milling a multi-layered object. The method may include milling each structural element of an array of structural elements that are spaced apart from each other by gaps to provide the milled structural elements, wherein each milled structural element has a flat upper surface, wherein prior the milling each one of the structural elements of the array has a flat upper surface of a certain width, wherein the certain width is of a nanometric scale. The milling of each structural element of the array may include scanning a defocused ion beam of the certain width along a longitudinal axis of the structural element. A current intensity of the defocused ion beam decreases with a distance from a middle of the defocused ion beam.
    Type: Application
    Filed: August 2, 2019
    Publication date: February 4, 2021
    Inventors: Ron Davidescu, Yehuda Zur