Abstract: In one embodiment, the present disclosure may be directed to a matching network coupled to an RF source and a plasma chamber and including an electronically variable capacitor (EVC) and a control circuit. The control circuit receives parameter signals and determines corresponding parameter values. For each parameter value, the control circuit determines whether the parameter value is relevant to the matching activity and whether the parameter value is relevant to a second activity of the matching network. The matching network carries out the matching activity based on the parameter values determined to be relevant to the matching activity, and carries out the second activity based on the parameter values determined to be relevant to the second activity.

Abstract: In one embodiment, the present disclosure is directed to a method for impedance matching. The RF source provides at least two repeating, non-zero pulse levels, including a high-priority pulse level and a low-priority pulse level. The matching network comprises at least one EVC, which comprises discrete capacitors configured to switch in and out to provide a plurality of match configurations. Each EVC has a switching limit comprising a predetermined number of switches in or out of the EVC's discrete capacitors in a prior time interval. Upon determining that switching to a new match configuration would cause an EVC to reach the switching limit, the method determines whether the new match configuration is for the low- or high-priority pulse level. If for the low-priority pulse level, the method prevents the switching of the EVC. If for the high-priority pulse level, the method switches the EVC to the new match configuration.

Abstract: In one embodiment, the present disclosure may be directed to a matching network coupled to an RF source and a plasma chamber and including an electronically variable capacitor (EVC) and a control circuit. The control circuit receives parameter signals and determines corresponding parameter values. For each parameter value, the control circuit determines whether the parameter value is relevant to the matching activity and whether the parameter value is relevant to a second activity of the matching network. The matching network carries out the matching activity based on the parameter values determined to be relevant to the matching activity, and carries out the second activity based on the parameter values determined to be relevant to the second activity.

Abstract: In one embodiment, the present disclosure is directed to a method for impedance matching. The RF source provides at least two repeating, non-zero pulse levels, including a high-priority pulse level and a low-priority pulse level. The matching network comprises at least one EVC, which comprises discrete capacitors configured to switch in and out to provide a plurality of match configurations. Each EVC has a switching limit comprising a predetermined number of switches in or out of the EVC's discrete capacitors in a prior time interval. Upon determining that switching to a new match configuration would cause an EVC to reach the switching limit, the method determines whether the new match configuration is for the low- or high-priority pulse level. If for the low-priority pulse level, the method prevents the switching of the EVC. If for the high-priority pulse level, the method switches the EVC to the new match configuration.

Abstract: In one embodiment, the present disclosure is directed to a method for impedance matching including a) positioning a matching network between a radio frequency (RF) source and a plasma chamber; b) determining, from among the plurality of match configurations, a new match configuration to be used when there is an expected pulse level change from a first of the pulse levels to a second of the pulse levels; and c) sending a control signal to alter the at least one EVC to provide the new match configuration. The control signal is sent a predetermined time period before a time for the expected pulse level change, the predetermined time period being substantially similar to a time period for the EVC to switch between two match configurations of the plurality of match configurations.

Abstract: In one embodiment, the present disclosure is directed to a method for impedance matching including a) positioning a matching network between a radio frequency (RF) source and a plasma chamber; b) determining, from among the plurality of match configurations, a new match configuration to be used when there is an expected pulse level change from a first of the pulse levels to a second of the pulse levels; and c) sending a control signal to alter the at least one EVC to provide the new match configuration. The control signal is sent a predetermined time period before a time for the expected pulse level change, the predetermined time period being substantially similar to a time period for the EVC to switch between two match configurations of the plurality of match configurations.

Abstract: A system and device for detecting and/or deactivating a security tag when passing through an electronic article surveillance (EAS) portal. The portal may be oriented by the arrangement of one or more antennas to generate an electromagnetic field at or within the portal to detect and/or deactivate the security tag. The electromagnetic field may detect and/or deactivate a security tag located at any orientation on merchandise as the security tag passes through the portal. The portal may be mounted on a counter at a point-of-sale station in which merchandise having security tags attached thereto are passed through the portal. The portal may also be mounted to a floor in which a shopping cart having merchandise is passed through the portal so that security tags attached to the merchandise in the cart are detected and/or deactivated.

Abstract: A system and device for detecting and/or deactivating a security tag when passing through an electronic article surveillance (EAS) portal. The portal may be oriented by the arrangement of one or more antennas to generate an electromagnetic field at or within the portal to detect and/or deactivate the security tag. The electromagnetic field may detect and/or deactivate a security tag located at any orientation on merchandise as the security tag passes through the portal. The portal may be mounted on a counter at a point-of-sale station in which merchandise having security tags attached thereto are passed through the portal. The portal may also be mounted to a floor in which a shopping cart having merchandise is passed through the portal so that security tags attached to the merchandise in the cart are detected and/or deactivated.

Abstract: A rotatable assembly for supporting a fixture from a structure may be provided. The rotatable assembly may comprise a mounting bracket and a support arm rotatably attached to the mounting bracket. The support arm may have a connection point for receiving the fixture.

Abstract: A tandem tricycle having a front frame portion and a detachable rear frame portion, which is configured to accommodate two riders. A drivetrain allows the riders to independently power the tricycle. A full suspension assembly provides a smoother ride.

Abstract: The present invention proposes a method and a system for generating a bidirectional power flow between a DC component and an AC grid for a distributed power generation system using solar panels. The system includes an inverter that further includes a DC component for generating DC power and a single-stage DC-AC converter for converting the DC power into AC power by operating in one or more pre-defined modes. The AC power includes a reactive power component and an active power component.

Abstract: There is provided by this invention an improved rf power control device for plasma applications for optimization of the feedback control voltage in the presence of harmonic and non-harmonic spurious frequencies. In this system, an oscillator and mixer, similar to those normally used in radio receiver applications are placed at the sampled output of the solid state rf signal source used for plasma ignition. The sampled output is mixed to a low frequency and filtered to remove the spurious frequencies that is created in the non-linear plasma. In this way, the feedback power control essentially ignores the spurious frequencies. In this application, the oscillator and mixer do not interfere with other desirable system characteristics and effectively isolate the feedback control voltage from changes in plasma spurious content. This allows rf power to be delivered to the plasma with greater accuracy than would otherwise be possible with conventional power control device and methods.