Patents by Inventor Ronald E. Collier

Ronald E. Collier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for cleaning a polishing pad
    Patent number: 7014552
    Abstract: A method and a system are provided for removing matter adhered to such a polishing pad. In particular, a polishing system is provided which is adapted to remove matter adhered to a polishing pad during a polishing process of a semiconductor topography. The polishing system may include a polishing pad and a spray element, which is preferably adapted to spray a pressurized fluid upon the polishing pad to remove matter adhered to the pad. In addition, a spray element is provided which may be adapted to be positioned within a polishing system. Such a spray element may be adapted to remove matter adhered to a polishing pad within the system by spraying a pressurized fluid upon the polishing pad. In addition, methods for cleaning a polishing pad during a polishing process and polishing multiple semiconductor topographies using the systems described herein are provided.
    Type: Grant
    Filed: July 6, 2001
    Date of Patent: March 21, 2006
    Assignee: Cypress Semiconductor Corp.
    Inventors: Ronald E. Collier, Andrey Zagrebelny