Patents by Inventor Ronald E. Remba

Ronald E. Remba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of fabricating Group III-V compound semiconductor devices using selective etching
    Patent number: RE36185
    Abstract: A solution of hydrogen peroxide ?H.sub.2 O.sub.2 !, citric acid ?HOC(CH.sub.2 COOH).sub.2 COOH.H.sub.2 O!, and a salt of citric acid such as potassium citrate ?HOC(CH.sub.2 COOK).sub.2 COOK.H.sub.2 O!, and hydrogen peroxide ?H.sub.2 O.sub.2 !, in a proper pH range, selectively etches GaAs-containing Group III-V compounds in the presence of other Group III-V compounds. As an illustration, Al.sub.y Ga.sub.1-y As is selectively etched in the presence of Al.sub.x Ga.sub.1-x As (0.ltoreq.y<0.2 & x>0.2) when the pH range of the etchant solution is between approximately 3 and 6. The etchant solution described herein may be utilized in the fabrication of, for example, high-frequency transistors exhibiting improved saturated current (I.sub.dss) and threshold voltage (V.sub.th) uniformity.
    Type: Grant
    Filed: December 5, 1996
    Date of Patent: April 6, 1999
    Assignee: Watkins Johnson Company
    Inventors: Ronald E. Remba, Paul E. Brunemeier, Bruce C. Schmukler, Walter A. Strifler, Daniel H. Rosenblatt