Patents by Inventor Ronald Gottzein

Ronald Gottzein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7413993
    Abstract: The invention is concerned with a process for removing residue comprising a polymeric resist and metal oxide from a metal structure on a semiconductor substrate, the process comprising the steps of: (a) heating up the substrate with the metal structure in the presence of molecular nitrogen gas (N2); (b) a stabilization step in the presence of pure molecular nitrogen gas (N2); (c) a passivation step employing a plasma containing at least one of the group of water, nitrogen and oxygen; and (d) a stripping step containing oxygen to remove the residue, comprising resist.
    Type: Grant
    Filed: November 22, 2004
    Date of Patent: August 19, 2008
    Assignees: Infineon Technologies AG, Nanya Technology Corporation
    Inventors: Ronald Gottzein, Jens Bachmann, Dirk Efferenn, Uwe Kahler, Chung-Hsin Lin, Wen-Bin Lin, Lee Donohue
  • Publication number: 20060108324
    Abstract: The invention is concerned with a process for removing residue comprising a polymeric resist and metal oxide from a metal structure on a semiconductor substrate, the process comprising the steps of: (a) heating up the substrate with the metal structure in the presence of molecular nitrogen gas (N2); (b) a stabilization step in the presence of pure molecular nitrogen gas (N2); (c) a passivation step employing a plasma containing at least one of the group of water, nitrogen and oxygen; and (d) a stripping step containing oxygen to remove the residue, comprising resist.
    Type: Application
    Filed: November 22, 2004
    Publication date: May 25, 2006
    Inventors: Ronald Gottzein, Jens Bachmann, Dirk Efferenn, Uwe Kahler, Chung-Hsin Lin, Wen-Bin Lin, Lee Donohue