Abstract: Methods of film deposition using metals and metal oxides. A thin film of germanium oxide and an oxide of a non-germanium metal is deposited by ALD by alternating deposition of first and second precursor compounds, wherein the first precursor compound includes a metal other than germanium, and the second precursor compound includes germanium.

Abstract: A method of forming an aluminum containing film on a substrate includes providing a precursor having the chemical structure: Al(NR1R2)(NR3R4)(NR5R6); where each of R1, R2, R3, R4, R5 and R6 is independently selected from the group consisting of hydrogen and an alkyl group including at least two carbon atoms. The precursor is utilized to form a film on the substrate including at least one of aluminum oxide, aluminum nitride and aluminum oxy-nitride. Each of the R1-R6 groups can be the same or different and can by straight or branched chain alkyls. An exemplary precursor that has is useful in forming aluminum containing films is tris diethylamino aluminum.

Abstract: Provided are novel methods of preventing deposition on an optical component in an absorption spectroscopy measurement cell. The methods involve performing an absorption spectroscopy measurement of a sample gas introduced into the cell, and introducing a flow of purge gas from a purge gas inlet pipe across a critical surface of the optical element at a velocity effective to prevent deposition on the critical surface. The gas inlet is disposed adjacent said critical surface. Also provided are devices for practicing the inventive method, measurement cells useful in absorption spectroscopy measurements, apparatuses for performing an absorption spectroscopy measurement and semiconductor processing apparatuses. The invention allows for the performance of accurate spectroscopic measurements. Because deposits are prevented from forming on the surface of an optical element, interference therefrom can effectively be avoided.

Abstract: The spectrographic sample cell for the analysis of trace impurities in sample gases. The cell is provided with a gas inlet, a gas outlet and a volume for confining the sample gases for analysis. Two mirrors are provided, a first mirror proximate the gas inlet the second mirror proximate the gas outlet, the first mirror having a hole at its radial center. A conically-shaped cell profile is further provided such that the formation of vortices of sample gas is prevented in the cell upstream of or in the region where the analysis of trace impurities is to take place.