Abstract: Quartz crystal blanks are chemically polished by thoroughly cleaning the nks, treating the quartz crystal blanks with an etching solution at high pressures in a high pressure vessel while agitating to circulate the etchant and maintaining a uniform temperature throughout the etching solution, cooling the vessel, removing the quartz crystal blanks, rinsing thoroughly with water and spinning dry.

Abstract: At least one side of a doubly rotated quartz plate whose theta (.theta.) angle is between about 33.degree. and 36.degree. and whose phi (.phi.) angle is between about 10.degree. and 26.degree. is chemically polished by lapping the quartz plate with an abrasive and etching the lapped quartz plate in a fluoride type etchant selected from the group consisting of a 5 percent to 25 percent solution of hydrofluoric acid, a 5 percent to 50 percent solution of ammonium bifluoride, and a mixture of 40 percent ammonium fluoride with 49 percent hydrofluoric acid in the ratio ranging from about 1:3 to 10:1, the etching being carried out until a thickness is removed from the plate that is at least twice the average abrasive particle diameter in the final lapping abrasive.

Abstract: Fused Quartz is chemically polished by lapping the fused quartz surface to bout 3 microns, thoroughly cleaning the lapped fused quartz, treating the lapped fused quartz with an etchant at high pressure in a high pressure vessel while agitating to circulate the etchant and maintaining a uniform temperature throughout the etchant, cooling the vessel, removing the fused quartz, rinsing thoroughly with water and spinning dry.