Patents by Inventor Ronald J. Gutmann

Ronald J. Gutmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems for performing chemical mechanical planarization and process for conducting same
    Patent number: 5637185
    Abstract: A system for performing chemical mechanical planarization for a semiconductor wafer includes a chemical mechanical polishing system including a chemical mechanical polishing slurry. The system also includes a device for measuring the electrochemical potential of the slurry during processing which is electrically connected to the slurry, and a device for detecting the end point of the process, based upon the electrochemical potential of the slurry, which is responsive to the electrochemical potential measuring device. Accurate in situ control of a chemical mechanical polishing process is thereby provided.
    Type: Grant
    Filed: March 30, 1995
    Date of Patent: June 10, 1997
    Assignee: Rensselaer Polytechnic Institute
    Inventors: Shyam P. Murarka, Ronald J. Gutmann, David J. Duquette, Joseph M. Steigerwald
  • Control component for a three-electrode device
    Patent number: 5107152
    Abstract: A gate biasing circuit including a Schottky barrier diode in series with an ion implanted resistor for use with a baseband MMIC control components such as an MESFET. The diode gate biasing scheme improves the low frequency distortion characteristics of GaAs MESFET control components significantly, allowing microwave power handling and distortion characteristics to be maintained below 100 Hz.
    Type: Grant
    Filed: September 8, 1989
    Date of Patent: April 21, 1992
    Assignee: MIA-COM, Inc.
    Inventors: Nitin Jain, Ronald J. Gutmann, David Fryklund