Patents by Inventor Ronald J. Mosso
Ronald J. Mosso has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11695125Abstract: Apparatuses and methods for depositing materials on both sides of a web while it passes a substantially vertical direction are provided. In particular embodiments, a web does not contact any hardware components during the deposition. A web may be supported before and after the deposition chamber but not inside the deposition chamber. At such support points, the web may be exposed to different conditions (e.g., temperature) than during the deposition. Also provided are substrates having materials deposited on both sides that may be fabricated by the methods and apparatuses.Type: GrantFiled: July 17, 2018Date of Patent: July 4, 2023Assignee: AMPRIUS TECHNOLOGIES, INC.Inventors: Ronald J. Mosso, Ghyrn E. Loveness
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Publication number: 20180342740Abstract: Apparatuses and methods for depositing materials on both sides of a web while it passes a substantially vertical direction are provided. In particular embodiments, a web does not contact any hardware components during the deposition. A web may be supported before and after the deposition chamber but not inside the deposition chamber. At such support points, the web may be exposed to different conditions (e.g., temperature) than during the deposition. Also provided are substrates having materials deposited on both sides that may be fabricated by the methods and apparatuses.Type: ApplicationFiled: July 17, 2018Publication date: November 29, 2018Inventors: Ronald J. Mosso, Ghyrn E. Loveness
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Patent number: 10044046Abstract: Apparatuses and methods for depositing materials on both side of a web while it passes a substantially vertical direction are provided. In particular embodiments, a web does not contact any hardware components during the deposition. A web may be supported before and after the deposition chamber but not inside the deposition chamber. At such support points, the web may be exposed to different conditions (e.g., temperature) than during the deposition.Type: GrantFiled: April 14, 2014Date of Patent: August 7, 2018Assignee: Amprius, Inc.Inventors: Ronald J. Mosso, Ghyrn E. Loveness
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Patent number: 9163308Abstract: Light reactive deposition uses an intense light beam to form particles that are directly coated onto a substrate surface. In some embodiments, a coating apparatus comprising a noncircular reactant inlet, optical elements forming a light path, a first substrate, and a motor connected to the apparatus. The reactant inlet defines a reactant stream path. The light path intersects the reactant stream path at a reaction zone with a product stream path continuing from the reaction zone. The substrate intersects the product stream path. Also, operation of the motor moves the first substrate relative to the product stream. Various broad methods are described for using light driven chemical reactions to produce efficiently highly uniform coatings.Type: GrantFiled: July 30, 2009Date of Patent: October 20, 2015Assignee: NanoGram CorporationInventors: Xiangxin Bi, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, James T. Gardner, Seung M. Lim, William E. McGovern
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Publication number: 20150125768Abstract: Embodiments of an electrochemical flow cell stack are disclosed. A plurality of frame layers may each have a peripheral gasket channel configured to receive a gasket material. The gasket channel may surround a recessed area having a size and a structure configured to receive an insert layer. Each of the plurality of frame layers may include at least one void area defining a first half-cell chamber of a flow cell. A plurality of insert layers may each be nested within a corresponding frame layers. Each insert layer may include at least one void area defining a second half-cell chamber of the flow cell. A flow cell may be formed by one of the plurality of frame layers and one of the plurality of insert layers.Type: ApplicationFiled: November 6, 2014Publication date: May 7, 2015Inventors: Ronald J. MOSSO, Jay E. SHA, Kurt RISIC, Bruce LIN, Jeremy P. MEYERS
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Publication number: 20150037513Abstract: High rate deposition methods comprise depositing a powder coating from a product flow. The product flow results from a chemical reaction within the flow. Some of the powder coatings consolidate under appropriate conditions into an optical coating. The substrate can have a first optical coating onto which the powder coating is placed. The resulting optical coating following consolidation can have a large index-of-refraction difference with the underlying first optical coating, high thickness and index-of-refraction uniformity across the substrate and high thickness and index-of-refraction uniformity between coatings formed on different substrates under equivalent conditions. In some embodiments, the deposition can result in a powder coating of at least about 100 nm in no more than about 30 minutes with a substrate having a surface area of at least about 25 square centimeters.Type: ApplicationFiled: September 17, 2014Publication date: February 5, 2015Inventors: Xiangxin Bi, Herman A. Lopez, Prasad Narasimha, Eric Euvrard, Ronald J. Mosso
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Patent number: 8865271Abstract: High rate deposition methods comprise depositing a powder coating from a product flow. The product flow results from a chemical reaction within the flow. Some of the powder coatings consolidate under appropriate conditions into an optical coating. The substrate can have a first optical coating onto which the powder coating is placed. The resulting optical coating following consolidation can have a large index-of-refraction difference with the underlying first optical coating, high thickness and index-of-refraction uniformity across the substrate and high thickness and index-of-refraction uniformity between coatings formed on different substrates under equivalent conditions. In some embodiments, the deposition can result in a powder coating of at least about 100 nm in no more than about 30 minutes with a substrate having a surface area of at least about 25 square centimeters.Type: GrantFiled: May 26, 2004Date of Patent: October 21, 2014Assignee: NeoPhotonics CorporationInventors: Xiangxin Bi, Herman A. Lopez, Prasad Narasimha, Eric Euvrard, Ronald J. Mosso
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Publication number: 20140302232Abstract: Apparatuses and methods for depositing materials on both side of a web while it passes a substantially vertical direction are provided. In particular embodiments, a web does not contact any hardware components during the deposition. A web may be supported before and after the deposition chamber but not inside the deposition chamber. At such support points, the web may be exposed to different conditions (e.g., temperature) than during the deposition.Type: ApplicationFiled: April 14, 2014Publication date: October 9, 2014Applicant: Amprius,Inc.Inventors: Ronald J. Mosso, Ghyrn E. Loveness
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Patent number: 8673407Abstract: Three dimensional optical structures are described that can have various integrations between optical devices within and between layers of the optical structure. Optical turning elements can provide optical pathways between layers of optical devices. Methods are described that provide for great versatility on contouring optical materials throughout the optical structure. Various new optical devices are enabled by the improved optical processing approaches.Type: GrantFiled: July 28, 2005Date of Patent: March 18, 2014Assignee: NeoPhotonics CorporationInventors: Xiangxin Bi, Elizabeth Anne Nevis, Ronald J. Mosso, Michael Edward Chapin, Shivkumar Chiruvolu, Sardar Hyat Khan, Sujeet Kumar, Herman Adrian Lopez, Nguyen Tran The Huy, Craig Richard Horne, Michael A. Bryan, Eric Euvrard
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Patent number: 8568684Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: GrantFiled: January 13, 2010Date of Patent: October 29, 2013Assignee: NanoGram CorporationInventors: Xiangxin Bi, Nobuyuki Kambe, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern
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Publication number: 20120308856Abstract: Shunt currents in electrochemical systems with liquid electrolytes are reduced by placing shunt resistors in electrolyte flow paths. Shunt resistors substantially increase electrical resistance in electrolyte flow channels by interrupting the physical continuity of liquid through their length. Some shunt resistors also provide a flow metering, pumping or flow-resisting functions for improved electrolyte flow control.Type: ApplicationFiled: December 6, 2011Publication date: December 6, 2012Applicant: Enervault CorporationInventors: Craig R. Horne, Jay E. Sha, Ronald J. Mosso, William D. Lyle
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Publication number: 20120244060Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: ApplicationFiled: January 13, 2010Publication date: September 27, 2012Inventors: Xiangxin Bi, Nobuyuki Kambe, Craig R. Horne, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern, Pierre J. DeMascarel, Robert B. Lynch
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Publication number: 20120012032Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: ApplicationFiled: September 22, 2011Publication date: January 19, 2012Inventors: Xiangxin Bi, Nobuyuki Kambe, Craig R. Horne, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern, Pierre J. DeMascarel, Robert B. Lynch
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Publication number: 20110143019Abstract: Apparatuses and methods for depositing materials on both side of a web while it passes a substantially vertical direction are provided. In particular embodiments, a web does not contact any hardware components during the deposition. A web may be supported before and after the deposition chamber but not inside the deposition chamber. At such support points, the web may be exposed to different conditions (e.g., temperature) than during the deposition.Type: ApplicationFiled: December 14, 2009Publication date: June 16, 2011Applicant: AMPRIUS, INC.Inventors: Ronald J. Mosso, Ghyrn E. Loveness
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Patent number: 7905114Abstract: Optical fiber preforms can comprise a glass preform structure with an inner cavity. A powder can be placed within the inner cavity having an average primary particle size of less than about one micron. The powder can be in the form of an unagglomerated particles or a powder coating with a degree of agglomeration or hard fusing ranging from none to significant amounts as long as the primary particles are visible in a micrograph. Powders can be placed within a preform structure by forming a slurry with a dispersion of submicron/nanoscale particles within a cavity within the preform. In other embodiments, a powder coating is formed within a preform structure by depositing the powder coating directly from a reaction product stream. The formation of the powder coating can be formed within the reaction chamber or outside of the reaction chamber by flowing the product particle stream through a conduit leading to the preform structure. In additional embodiments, a powder coating is placed on an insert, e.g.Type: GrantFiled: April 12, 2004Date of Patent: March 15, 2011Assignee: NeoPhotonics CorporationInventors: Craig R. Horne, Jesse S. Jur, Ronald J. Mosso, Eric H. Euvrard, Xiangxin Bi
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Patent number: 7781060Abstract: Hollow silica nanoparticles can have well defined non-porous shells with low shell fragmentation and good dispersability. These well defined hollow particles can be formed through the controlled oxidation of silicon nanoparticles in an organic solvent. The hollow nanoparticles can have a submicron secondary particle sizes. The hollow silica nanoparticles can be incorporated into polymer composites, such as low index-of-refraction composites, for appropriate applications.Type: GrantFiled: December 18, 2007Date of Patent: August 24, 2010Assignee: NanoGram CorporationInventors: Weidong Li, Shivkumar Chiruvolu, Hui Du, Igor Altman, Ronald J. Mosso, Nobuyuki Kambe
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Publication number: 20100209328Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: ApplicationFiled: January 13, 2010Publication date: August 19, 2010Inventors: Xiangxin Bi, Nobuyuki Kambe, Craig R. Horne, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern, Pierre J. DeMascarel, Robert B. Lynch
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Patent number: 7776406Abstract: Nanoscale particles, particle coatings/particle arrays and corresponding consolidated materials are described based on an ability to vary the composition involving a wide range of metal and/or metalloid elements and corresponding compositions. In particular, metalloid oxides and metal-metalloid compositions are described in the form of improved nanoscale particles and coatings formed from the nanoscale particles. Compositions comprising rare earth metals and dopants/additives with rare earth metals are described. Complex compositions with a range of host compositions and dopants/additives can be formed using the approaches described herein. The particle coating can take the form of particle arrays that range from collections of disbursable primary particles to fused networks of primary particles forming channels that reflect the nanoscale of the primary particles. Suitable materials for optical applications are described along with some optical devices of interest.Type: GrantFiled: October 19, 2007Date of Patent: August 17, 2010Assignee: NeoPhotonics CorporationInventors: Craig R. Horne, Pierre J. DeMascarel, Christian C. Honeker, Benjamin Chaloner-Gill, Herman A. Lopez, Xiangxin Bi, Ronald J. Mosso, William E. McGovern, James T. Gardner, Sujeet Kumar, James A. Gilliam, Vince Pham, Eric Euvrard, Shivkumar Chiruvolu, Jesse Jur
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Publication number: 20100190288Abstract: Thin semiconductor foils can be formed using light reactive deposition. These foils can have an average thickness of less than 100 microns. In some embodiments, the semiconductor foils can have a large surface area, such as greater than about 900 square centimeters. The foil can be free standing or releasably held on one surface. The semiconductor foil can comprise elemental silicon, elemental germanium, silicon carbide, doped forms thereof, alloys thereof or mixtures thereof. The foils can be formed using a release layer that can release the foil after its deposition. The foils can be patterned, cut and processed in other ways for the formation of devices. Suitable devices that can be formed form the foils include, for example, photovoltaic modules and display control circuits.Type: ApplicationFiled: March 31, 2010Publication date: July 29, 2010Inventors: Henry Hieslmair, Ronald J. Mosso, Robert B. Lynch, Shivkumar Chiruvolu, William E. McGovern, Craig R. Horne, Narayan Solayappan, Ronald M. Cornell
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Publication number: 20090288601Abstract: Light reactive deposition uses an intense light beam to form particles that are directly coated onto a substrate surface. In some embodiments, a coating apparatus comprising a noncircular reactant inlet, optical elements forming a light path, a first substrate, and a motor connected to the apparatus. The reactant inlet defines a reactant stream path. The light path intersects the reactant stream path at a reaction zone with a product stream path continuing from the reaction zone. The substrate intersects the product stream path. Also, operation of the motor moves the first substrate relative to the product stream. Various broad methods are described for using light driven chemical reactions to produce efficiently highly uniform coatings.Type: ApplicationFiled: July 30, 2009Publication date: November 26, 2009Inventors: Xiangxin Bi, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, James T. Gardner, Seung M. Lim, William E. McGovern