Abstract: A nanopost glass array contains up to 1012/cm2 of magnetizable nanoposts having diameter of 10-1000 nm that are straight and parallel to each other and are typically of a uniform diameter relative to each other and along the post length. The array is made using a reference electrode and a nanochannel glass template structure connected to each other electrically through an electrical source and both disposed in a plating solution. A magnetizable material is electroplated from the plating solution into the channels of the template structure.

Abstract: The present invention is a process for making complex structures with nanoscale resolution in parallel by placing an NCG replica-based mask (or other suitable mask) in close proximity to a substrate and controlling, with nanoscale accuracy and precision, the relative movement of the mask and substrate while sequentially or concurrently carrying out a patterning process or processes. Another aspect of the invention is a diamond film with submicron and/or nanoscale features, that can be made by the method of the invention.

Abstract: Structured materials for photonic devices, at wavelengths of X-ray, ultraviolet, visible, infrared and microwave radiation, can be made using layer growth techniques. Such a structure can be made layer by layer, by homogeneous deposition followed by localized modification for refractive index differentiation. Alternatively, the structure can be made by simultaneous growth of regions whose refractive index differs. The structures can be used as selective bandpass filters, and in photovoltaic solar cells, for example.

Abstract: The present invention is a process for making a nanochannel glass (NCG) rica, having the steps of: coating a face of an etched NCG with a replica material (with or without an intervening buffer layer), where the etched NCG face has a plurality of channels arranged in a desired pattern, to form a replica coating on the NCG conforming to the pattern; and removing the replica coating from the etched NCG. The present invention is also the replica made by this process.

Abstract: The present invention is a method for modifying a substrate in a predetermined pattern, comprising the steps of: (a) applying a material to the face of an etched nanochannel glass (NCG), where this face has a pattern of channels corresponding to the predetermined pattern, and (b) contacting the substrate with the etched NCG face having applied material, under conditions for transferring the material to the substrate.

Abstract: The present invention provides a method for depositing a pattern of deposd material on or within a substrate, comprising the steps of: interposing a glass mask between a source and a substrate, the mask having channels therethrough which are arranged in a pattern and which have an average diameter of less than 1 micron; and depositing a material selected from the group of sources consisting of ions, electrons, photons, metals and semiconductor materials through the glass mask into or onto the substrate. The present invention also provides semiconductor devices made by this method.

Abstract: The present invention provides a method of forming a semiconductor device mprising the steps of:forming a glass block of an acid inert glass having acid etchable glass rods extending therethrough, the acid etchable glass rods having an average diameter of less than 1 micron;partially etching one end of the acid etchable rods surface of the glass block to form cavities in the glass block on one surface thereof having an average diameter of less than 1 micron;depositing material(s) in the cavities to form a semiconductor device.The present invention also provides a method for forming a semiconductor device in which the acid etchable glass rods are completely etched and the deposition material(s) is deposited to fill the nanochannels formed by the etching.The present invention also provides semiconductor devices made by these methods.

Abstract: The present invention provides a method of forming a semiconductor device mprising the steps of:forming a glass block of an acid inert glass having acid etchable glass rods extending therethrough, the acid etchable glass rods having an average diameter of less than 1 micron;partially etching one end of the acid etchable rods surface of the glass block to form cavities in the glass block on one surface thereof having an average diameter of less than 1 micron;depositing material(s) in the cavities to form a semiconductor device.The present invention also provides a method for forming a semiconductor device in which the acid etchable glass rods are completely etched and the deposition material(s) is deposited to fill the nanochannels formed by the etching.The present invention also provides semiconductor devices made by these methods.

Abstract: The present invention provides a wafer-like glass filter having channels therethrough having an average diameter of less than 1 micron, and further provides methods of making the filter.