Patents by Inventor Ronald L. Wang

Ronald L. Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11994522
    Abstract: The subject invention provides a robust, quantitative, and reproducible process and assay for diagnosis of a neurological condition in a subject. The invention provides measurement of two or more biomarkers in a biological fluid such as CSF or serum resulting in a synergistic mechanism for determining the extent of neurological damage in a subject with an abnormal neurological condition and for discerning subtypes thereof or tissue types subjected to damage.
    Type: Grant
    Filed: June 2, 2020
    Date of Patent: May 28, 2024
    Assignee: BANYAN BIOMARKERS, INC.
    Inventors: Kevin Ka-Wang Wang, Ronald L. Hayes, Uwe R. Mueller, Zhiqun Zhang
  • Publication number: 20240143057
    Abstract: A voltage regulator system of an information handling system includes a Smart Power Stage (SPS) and a voltage regulator controller. The SPS includes a high-side transistor and a low-side transistor. The voltage regulator controller detects a normal power down of the information handling system and sets bleed state for the SPS to a first state. Based on the bleed state being set to the first state, the voltage regulator controller provides a first control voltage to the low-side transistor and a second control voltage to the high-side transistor. The first control voltage causes the low-side transistor to be fully turned on, and the second control voltage causes the high-side transistor to be in a linear region. In response to a predetermined amount of time expiring, the voltage regulator controller enters the SPS in an idle mode.
    Type: Application
    Filed: October 26, 2022
    Publication date: May 2, 2024
    Inventors: James L. Petivan, III, Yun Guo, Isaac Q. Wang, Hang Li, Ronald Paul Rudiak, Justin Whittenberg
  • Publication number: 20030209326
    Abstract: A process and system for heating semiconductor substrates in a processing chamber on a susceptor as disclosed. In accordance with the present invention, the susceptor includes a support structure made from a material having a relatively low thermal conductivity for suspending the wafer over the susceptor. The support structure has a particular height that inhibits or prevents radial temperature gradients from forming in the wafer during high temperature processing. If needed, recesses can be formed in the susceptor for locating and positioning a support structure. The susceptor can include a wafer supporting surface defining a pocket that has a shape configured to conform to the shape of a wafer during a heat cycle.
    Type: Application
    Filed: May 7, 2002
    Publication date: November 13, 2003
    Applicant: Mattson Technology, Inc.
    Inventors: Young Jai Lee, Ronald L. Wang, Steven Ly, Daniel J. Devine