Patents by Inventor Ronald M. Gluck

Ronald M. Gluck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of making backside illuminated image sensors
    Patent number: 5244817
    Abstract: A method of making a backside illuminated image includes forming a device on the frontside of thin device layer provided on an oxide layer which is mounted on a sacrificial substrate and bonding the front side of the device layer to a permanent silicon support substrate. Thereafter, the oxide layer and sacrificial layer are removed by chemical etching to expose the backside of the thin device layer.
    Type: Grant
    Filed: August 3, 1992
    Date of Patent: September 14, 1993
    Assignee: Eastman Kodak Company
    Inventors: Gilbert A. Hawkins, Ronald M. Gluck
  • Thinning of imaging device processed wafers
    Patent number: 5234860
    Abstract: A process for supporting an image sensor wafer includes providing a support oxide layer on one surface of a support wafer and an etch resistant layer on the opposite surface. The support oxide layer is bonded to the image sensor oxide layer.
    Type: Grant
    Filed: March 19, 1992
    Date of Patent: August 10, 1993
    Assignee: Eastman Kodak Company
    Inventor: Ronald M. Gluck
  • Process for making backside illuminated image sensors
    Patent number: 5227313
    Abstract: A process for making a backside illuminated image sensor fabricated upon a thinned silicon layer bonded to a quartz wafer is described. A borosilicate glass (BSG) layer interposed between the thinned silicon device layer and quartz support serves as a doping source for the back-surface accumulating electrostatic potential and serves to minimize stress associated with the thermal expansion differences associated with quartz and silicon.
    Type: Grant
    Filed: July 24, 1992
    Date of Patent: July 13, 1993
    Assignee: Eastman Kodak Company
    Inventors: Ronald M. Gluck, Edmund K. Banghart, Madhav Mehra
  • Method for use in the manufacture of semiconductor devices
    Patent number: 4159917
    Abstract: A procedure for cleaning a semiconductor material of impurities which reside on the surface of the material is disclosed. The procedure is indicated for use prior to one or more thermal processing steps for the material, and involves the exposure of the material to a cleaning gas comprised of nitric oxide and, in a presently preferred form, of anhydrous hydrochloric acid as well.
    Type: Grant
    Filed: May 27, 1977
    Date of Patent: July 3, 1979
    Assignee: Eastman Kodak Company
    Inventor: Ronald M. Gluck