Patents by Inventor Ronald Nunes

Ronald Nunes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8081280
    Abstract: In a liquid crystal display device, a method for creating desirable pretilt angle by means of topography of the substrates, such as a surface that is sloped with respect to the surface of the electrodes. In combination with a low pretilt but highly photo-stable alignment layer, which may be very resistant to high levels of ultraviolet radiation, a high pretilt and photo-stable alignment structure is generated, by essentially combining two incompatible technical approaches. The ever more stringent requirements for projection displays are met. The methods for producing such sloped surfaces and the considerations related to design of the sloped surfaces are disclosed.
    Type: Grant
    Filed: April 30, 2007
    Date of Patent: December 20, 2011
    Assignee: International Business Machines Corporation
    Inventors: George Liang-Tai Chiu, Steven Alan Cordes, James Patrick Doyle, Matthew J. Farinelli, Minhua Lu, Hiroki Nakano, Ronald Nunes, James Vichiconti
  • Publication number: 20080266502
    Abstract: In a liquid crystal display device, a method for creating desirable pretilt angle by means of topography of the substrates, such as a surface that is sloped with respect to the surface of the electrodes. In combination with a low pretilt but highly photo-stable alignment layer, which may be very resistant to high levels of ultraviolet radiation, a high pretilt and photo-stable alignment structure is generated, by essentially combining two incompatible technical approaches. The ever more stringent requirements for projection displays are met. The methods for producing such sloped surfaces and the considerations related to design of the sloped surfaces are disclosed.
    Type: Application
    Filed: April 30, 2007
    Publication date: October 30, 2008
    Inventors: George Liang-Tai Chiu, Steven Alan Cordes, James Prtrick Doyle, Matthew J. Farinelli, Minhua Lu, Hiroki Nakano, Ronald Nunes, James Vichiconti
  • Patent number: 6881366
    Abstract: A process of making a microcontact printing stamp useful in the microcontact printing of a microcircuit. In this process an elastomeric microcontact printing stamp is formed by curing a degassed liquid elastomeric monomer or oligomer, optionally saturated with helium, a mixture of helium and an inert gas or a mixture of hydrogen and an inert gas, in a mold in which a photoresist master, defining a microcircuit in negative relief, is predisposed above a backplane.
    Type: Grant
    Filed: April 22, 2002
    Date of Patent: April 19, 2005
    Assignee: International Business Machines Corporation
    Inventors: Gareth Hougham, Peter Fryer, Ronald Nunes, Mary Beth Rothwell
  • Patent number: 6783717
    Abstract: A process of making a high precision microcontact printing stamp in which an elastomeric monomer or oligomer is introduced into a mold wherein a photoresist master imprinted with a microcircuit design in negative relief is predisposed. The monomer or oligomer is cured at a temperature no higher than about ambient temperature whereby a distortion-free microcontact printing stamp having the microcircuit design of the photoresist master in positive relief is formed.
    Type: Grant
    Filed: April 22, 2002
    Date of Patent: August 31, 2004
    Assignee: International Business Machines Corporation
    Inventors: Gareth Hougham, Peter Fryer, Ronald Nunes, Mary Beth Rothwell
  • Publication number: 20040150129
    Abstract: A process of making a microcontact printing stamp useful in the microcontact printing of a microcircuit. In this process an elastomeric microcontact printing stamp is formed by curing a degassed liquid elastomeric monomer or oligomer, optionally saturated with helium, a mixture of helium and an inert gas or a mixture of hydrogen and an inert gas, in a mold in which a photoresist master, defining a microcircuit in negative relief, is predisposed above a backplane.
    Type: Application
    Filed: April 22, 2002
    Publication date: August 5, 2004
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Gareth Hougham, Peter Fryer, Ronald Nunes, Mary Beth Rothwell
  • Patent number: 6656308
    Abstract: A process of making a microcontact printing stamp useful in microcontact printing of microcircuits. In this process an elastomeric microcontact printing stamp is formed by curing an elastomeric monomer or oligomer in a mold in which a photoresist master, defining a microcircuit in negative relief, is predisposed above a flat and rigid backplane laminate. The flat and rigid plane member of the backplane laminate is delaminated from the backplane after the printing stamp is removed from the mold.
    Type: Grant
    Filed: April 22, 2002
    Date of Patent: December 2, 2003
    Assignee: International Business Machines Corporation
    Inventors: Gareth Hougham, Peter Fryer, Ronald Nunes
  • Publication number: 20030196748
    Abstract: A process of making a microcontact printing stamp useful in microcontact printing of microcircuits. In this process an elastomeric microcontact printing stamp is formed by curing an elastomeric monomer or oligomer in a mold in which a photoresist master, defining a microcircuit in negative relief, is predisposed above a flat and rigid backplane laminate. The flat and rigid plane member of the backplane laminate is delaminated from the backplane after the printing stamp is removed from the mold.
    Type: Application
    Filed: April 22, 2002
    Publication date: October 23, 2003
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Gareth Hougham, Peter Fryer, Ronald Nunes, Mary Beth Rothwell
  • Publication number: 20030197312
    Abstract: A process of making a high precision microcontact printing stamp in which an elastomeric monomer or oligomer is introduced into a mold wherein a photoresist master imprinted with a microcircuit design in negative relief is predisposed. The monomer or oligomer is cured at a temperature no higher than about ambient temperature whereby a distortion-free microcontact printing stamp having the microcircuit design of the photoresist master in positive relief is formed.
    Type: Application
    Filed: April 22, 2002
    Publication date: October 23, 2003
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Gareth Hougham, Peter Fryer, Ronald Nunes, Mary Beth Rothwell