Patents by Inventor Ronald P. Albright

Ronald P. Albright has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data
    Patent number: 8259285
    Abstract: An iterative method of producing optimized setpoint data for controlling the actuation of elements of an array of individually controllable elements in a maskless system and systems therefore. The optimization is based on estimation of a device structure that can utilizes one or more of the following factors: the low-pass characteristics of the projection system, the configuration of the illumination system, and the process window properties.
    Type: Grant
    Filed: December 14, 2006
    Date of Patent: September 4, 2012
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Kars Zeger Troost, Jason Douglas Hintersteiner, Patricius Aloysius Jacobus Tinnemans, Wenceslao A. Cebuhar, Ronald P. Albright, Bernardo Kastrup
  • Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data
    Publication number: 20080143982
    Abstract: An iterative method of producing optimized setpoint data for controlling the actuation of elements of an array of individually controllable elements in a maskless system and systems therefore. The optimization is based on estimation of a device structure that can utilizes one or more of the following factors: the low-pass characteristics of the projection system, the configuration of the illumination system, and the process window properties.
    Type: Application
    Filed: December 14, 2006
    Publication date: June 19, 2008
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Kars Zeger Troost, Jason Douglas Hintersteiner, Patricius Aloysius Jacobus Tinnemans, Wenceslao A. Cebuhar, Ronald P. Albright, Bernardo Kastrup
  • Method to etch chrome deposited on calcium fluoride object
    Patent number: 7018556
    Abstract: A method for maintaining a micro-roughness finish after etching chrome from a surface of a calcium fluoride (CaF2) object. Etching the chrome a first amount in a first chrome etchant. Etching the chrome a second amount beyond the first predetermined amount in second chrome etchant, such that the CaF2 object maintains a low micro-roughness.
    Type: Grant
    Filed: October 10, 2003
    Date of Patent: March 28, 2006
    Assignee: ASML Holding N.V.
    Inventors: Nicholas A. DeLuca, Ronald P. Albright