Patents by Inventor Ronald Peter Albright
Ronald Peter Albright has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230063156Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.Type: ApplicationFiled: December 24, 2020Publication date: March 2, 2023Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Ronald Peter ALBRIGHT, Kursat BAL, Vadim Yevgenyevich BANINE, Richard Joseph BRULS, Sjoerd Frans DE VRIES, Olav Waldemar Vladimir FRIJNS, Yang-Shan HUANG, Zhuangxiong HUANG, Johannes Henricus Wilhelmus JACOBS, Johannes Hubertus Josephina MOORS, Georgi Nanchev NENCHEV, Andrey NIKIPELOV, Thomas Maarten RAASVELD, Manish RANJAN, Edwin TE SLIGTE, Karl Robert UMSTADTER, Eray UZGÖREN, Marcus Adrianus VAN DE KERKHOF, Parham YAGHOOBI
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Patent number: 11550231Abstract: Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.Type: GrantFiled: December 12, 2019Date of Patent: January 10, 2023Assignee: ASML Holding N.V.Inventors: Jeffrey John Lombardo, Ronald Peter Albright, Daniel Leslie Hall, Victor Antonio Perez-Falcon, Andrew Judge
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Patent number: 11333984Abstract: Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.Type: GrantFiled: February 4, 2019Date of Patent: May 17, 2022Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Richard Joseph Bruls, Ronald Peter Albright, Peter Conrad Kochersperger, Victor Antonio Perez-Falcon
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Publication number: 20220075277Abstract: Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.Type: ApplicationFiled: December 12, 2019Publication date: March 10, 2022Applicant: ASML Holding N.V.Inventors: Jeffrey John LOMBARDO, Ronald Peter ALBRIGHT, Daniel Leslie HALL, Victor Antonio PEREZ-FALCON, Andrew JUDGE
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Patent number: 11175596Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.Type: GrantFiled: July 18, 2018Date of Patent: November 16, 2021Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Han-Kwang Nienhuys, Ronald Peter Albright, Jacob Brinkert, Yang-Shan Huang, Hendrikus Gijsbertus Schimmel, Antonie Hendrik Verweij
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Publication number: 20210041795Abstract: Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.Type: ApplicationFiled: February 4, 2019Publication date: February 11, 2021Applicants: ASML Netherlands B..V., ASML Holding N.V.Inventors: Richard Joseph BRULS, Ronald Peter ALBRIGHT, Peter Conrad KOCHERSPERGER, Victor Antonio PEREZ-FALCON
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Publication number: 20200225591Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.Type: ApplicationFiled: July 18, 2018Publication date: July 16, 2020Applicants: ASML Netherlands B,V., ASML Holding N.V.Inventors: Han-Kwang NIENHUYS, Ronald Peter ALBRIGHT, Jacob BRINKERT, Yang-Shan HUANG, Hendrikus Gijsbertus SCHIMMEL, Antonie Hendrik VERWEIJ
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Patent number: 10585359Abstract: Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.Type: GrantFiled: July 17, 2017Date of Patent: March 10, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Ronald Peter Albright, Lowell Lane Baker, Daniel Nathan Burbank
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Publication number: 20190171119Abstract: Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.Type: ApplicationFiled: July 17, 2017Publication date: June 6, 2019Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Ronald Peter ALBRIGHT, Lowell Lane BAKER, Daniel Nathan BURBANK
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Publication number: 20150241797Abstract: Methods and systems are described for cleaning contamination from the surface of an object within a lithographic apparatus. A lithographic apparatus is provided that includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device (302), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes a cleaning system (500) for cleaning particles off of a surface of either the support or the patterning device. The cleaning system includes a cleaning surface (502) designed to contact the surface of either the support or the patterning device.Type: ApplicationFiled: July 30, 2013Publication date: August 27, 2015Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Johannes Onvlee, Christopher J. Mason, Peter A. Delmastro, Sanjeev Kumar Singh, Ronald Peter Albright