Patents by Inventor Ronald Pierce

Ronald Pierce has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200318395
    Abstract: A method of restraining a person with a handcuff assembly comprises providing a handcuff assembly comprising a pair of handcuffs and a securing cord, the securing cord comprising a connector at each opposing end. The method further comprises applying the pair of handcuffs on the wrists of a person, looping the cord through an opening positioned proximal to the waist of the person and releasably connecting each connector of the securing cord to each handcuff to prevent or limit the handcuffs from being moved from the back side of the person to the front side of the person.
    Type: Application
    Filed: April 2, 2019
    Publication date: October 8, 2020
    Inventors: John Lee, Robert Cutter, Ronald Pierce, Shawn Teets
  • Patent number: 9365764
    Abstract: Described is a slickwater fracturing fluid containing base water having up to 300,000 ppm total dissolved solids; a viscosifier; a scale inhibitor; and a surfactant composition. The surfactant composition contains at least one dibasic ester, at least one non-ionic surfactant, at least one terpene or terpene derivative and optionally at least one polyalkylene glycol.
    Type: Grant
    Filed: December 11, 2012
    Date of Patent: June 14, 2016
    Assignee: CALFRAC WELL SERVICES LTD.
    Inventors: Dwight Bobier, Ronald Pierce
  • Publication number: 20060178277
    Abstract: An improved method and fracturing fluid for hydraulic fracturing of a subterranean formation, the fracturing fluid including a surfactant, a water soluble or dispersible anionic organic salt, an acid and a low molecular weight organic solvent.
    Type: Application
    Filed: December 19, 2003
    Publication date: August 10, 2006
    Inventors: Travis Allan, Junad Amin, Alan Olson, Ronald Pierce
  • Patent number: 6974653
    Abstract: Methods for using critical dimension test marks (test marks) for the rapid determination of the best focus position of lithographic processing equipment and critical dimension measurement analysis across a wafer's surface are described. In a first embodiment, a plurality of test mark arrays are distributed across the surface of a wafer, a different plurality being created at a plurality of focus positions. Measurement of the length or area of the resultant test marks allows for the determination of the best focus position of the processing equipment. Critical dimension measurements at multiple points on a wafer with test marks allow for the determination of process accuracy and repeatability and further allows for the real-time detection of process degradation. Using test marks which require only a relatively simple optical scanner and sensor to measure their length or area, it is possible to measure hundreds of measurement values across a wafer in thirty minutes.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: December 13, 2005
    Assignee: Nikon Precision Inc.
    Inventors: Frank C. Leung, Etsuya Morita, Christopher Howard Putnam, Holly H. Magoon, Ronald A. Pierce, Norman E. Roberts
  • Publication number: 20050103662
    Abstract: A sharps disposal system for safely collecting and disposing of medical sharps includes a cabinet defining an enclosure for receiving a removable used sharps receptacle therein. The cabinet includes a passageway through which sharps may be deposited in the sharps receptacle. A single lock, double door design facilitates safe removal and disposal of sharps deposited in the sharps receptacle.
    Type: Application
    Filed: November 14, 2003
    Publication date: May 19, 2005
    Inventors: Mark Iske, Ronald Pierce
  • Publication number: 20030211700
    Abstract: Methods for using critical dimension test marks (test marks) for the rapid determination of the best focus position of lithographic processing equipment and critical dimension measurement analysis across a wafer's surface are described. In a first embodiment, a plurality of test mark arrays are distributed across the surface of a wafer, a different plurality being created at a plurality of focus positions. Measurement of the length or area of the resultant test marks allows for the determination of the best focus position of the processing equipment. Critical dimension measurements at multiple points on a wafer with test marks allow for the determination of process accuracy and repeatability and further allows for the real-time detection of process degradation. Using test marks which require only a relatively simple optical scanner and sensor to measure their length or area, it is possible to measure hundreds of measurement values across a wafer in thirty minutes.
    Type: Application
    Filed: December 4, 2002
    Publication date: November 13, 2003
    Applicant: Nikon Precision Inc.
    Inventors: Frank C. Leung, Etsuya Morita, Christopher Howard Putnam, Holly H. Magoon, Ronald A. Pierce, Norman E. Roberts
  • Patent number: D678443
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: March 19, 2013
    Inventor: Ronald Pierce Jordan