Patents by Inventor Ronald Walther
Ronald Walther has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190324374Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: July 2, 2019Publication date: October 24, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Richard Joseph BRULS, Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Ronald Walther Jeanne SEVERIJNS, Sergei SHULEPOV, Herman BOOM, Timotheus Franciscus SENGERS
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Patent number: 10345712Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: March 12, 2018Date of Patent: July 9, 2019Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Publication number: 20180203364Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: March 12, 2018Publication date: July 19, 2018Applicant: ASMLNETHERLANDS B.V.Inventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sofia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Patent number: 9952515Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: August 28, 2015Date of Patent: April 24, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Publication number: 20160004171Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: August 28, 2015Publication date: January 7, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Richard Joseph BRULS, Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Ronald Walther Jeanne SEVERIJNS, Sergei SHULEPOV, Herman BOOM, Timotheus Franciscus SENGERS
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Patent number: 9134622Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: December 16, 2013Date of Patent: September 15, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Patent number: 9134623Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: April 30, 2014Date of Patent: September 15, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Publication number: 20140233004Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: April 30, 2014Publication date: August 21, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Publication number: 20140098357Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: December 16, 2013Publication date: April 10, 2014Applicant: ASML NETHERLAND B.V.Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Richard Joseph BRULS, Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Ronald Walther Jeanne SEVERIJNS, Sergei SHULEPOV, Herman BOOM, Timotheus Franciscus SENGERS
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Patent number: 8634056Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: July 20, 2011Date of Patent: January 21, 2014Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Patent number: 8547519Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: March 26, 2009Date of Patent: October 1, 2013Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Publication number: 20110273677Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: July 20, 2011Publication date: November 10, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Richard Joseph BRULS, Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Erick Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Ronald Walther Jeanne SEVERIJNS, Sergei SHULEPOV, Herman BOOM, Timotheus Franciscus SENGERS
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Publication number: 20090207397Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: March 26, 2009Publication date: August 20, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Patent number: 7528929Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: November 12, 2004Date of Patent: May 5, 2009Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Patent number: 7342237Abstract: A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; a gas pressure controlled article clamp for clamping an article to be placed in a beam path of the projection beam of radiation; and a pressure circuit for controlling the article clamp, comprising a supply line for connection with the article clamp. According to the invention, a buffer volume is provided for providing a buffered gas pressure pulse in the supply line. In this way, faster clamp response times can be realized.Type: GrantFiled: February 22, 2005Date of Patent: March 11, 2008Assignee: ASML Netherlands B.V.Inventors: Ronald Walther Jeanne Severijns, Marcel Johannus Elisabeth Hubertus Muitjens, Sonia Margart Skelly, Theodorus Petrus Maria Cadee
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Publication number: 20070260823Abstract: A computer implemented method, data processing system, and computer usable code are provided for testing multi-core microprocessors. A test process initiates testing on communication bus interfaces associated with a set of processor cores on the multiprocessor in which the communication bus interfaces are disabled and wherein the testing uses a set of isolation test sequences to obtain results. The process identifies a set of functional processor cores in the set of processor cores based upon the results. The process also initiates a ramp logic built-in self-test to test a ramp associated with a functional processor core in the set of functional processor cores, wherein the ramp logic built-in self-test determines if the communication bus interface associated with functional processor core in the set of functional processor cores is functional.Type: ApplicationFiled: April 4, 2006Publication date: November 8, 2007Inventors: Dan Dickinson, Robert Kenney, Christina Newman-LaBounty, Ronald Walther
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Publication number: 20060266051Abstract: A gas turbine engine includes a compressor section, a combustion section communicating with and disposed downstream of the compressor section relative to a direction of airflow, and a gas turbine section communicating with and disposed downstream of the combustion section relative to a direction of airflow. One of the sections has a wall defining an opening to access an airflow through the sections. A bleed diffuser assembly is disposed over the opening, and includes a housing including inlet and outlet ends. A diffuser having inlet and outlet ends is movably disposed within the housing. An actuator is coupled to the diffuser for moving the diffuser generally toward the inlet end of the housing and into an operative position when the actuator is energized. A biasing member is provided for urging the diffuser generally toward the outlet end of the housing and into a retracted position when the actuator is de-energized.Type: ApplicationFiled: May 31, 2005Publication date: November 30, 2006Applicant: United Technologies CorporationInventors: Robert Gukeisen, Peter Smith, Ronald Walther
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Publication number: 20060197036Abstract: A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; a gas pressure controlled article clamp for clamping an article to be placed in a beam path of the projection beam of radiation; and a pressure circuit for controlling the article clamp, comprising a supply line for connection with the article clamp. According to the invention, a buffer volume is provided for providing a buffered gas pressure pulse in the supply line. In this way, faster clamp response times can be realized.Type: ApplicationFiled: February 22, 2005Publication date: September 7, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Ronald Walther Severijns, Marcel Johannus Hubertus Muitjens, Sonia Skelly, Theodorus Cadee
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Publication number: 20050103931Abstract: A system for generating accessory power from a gas turbine engine is provided by the present invention. The system includes an electronic control device for monitoring at least one parameter which provides information about an incipient change in power demand, a control valve operated by the control device for supplying bleed air from the engine during a transient state in response to the at least one monitored parameter, and a pneumatically operated device for receiving the bleed air and for generating power to operate equipment onboard an aircraft. The pneumatically operated device may be an air turbine or a pneumatically integrated generator.Type: ApplicationFiled: October 27, 2003Publication date: May 19, 2005Inventors: Timothy Morris, Wayne Spock, Peter Smith, Matthew Schryver, Ronald Walther, Robert Gukeisen, Edward Hagaman
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Patent number: 6175975Abstract: A fitting arrangement for a folding bed, preferably a wall folding bed, includes a first fitting part on the corpus or body of the bed; a second fitting part on the folding bed, supported pivotally on the first fitting part; and a first holder on the corpus of the bed and a second holder on the folding bed to hold devices, especially spring devices, which exert force on the folding bed to push it into its up position. The first holder is provided on the first fitting part and the second holder is provided on the second fitting part.Type: GrantFiled: September 17, 1998Date of Patent: January 23, 2001Assignee: H{umlaut over (a)}fele GmbH & Co.Inventors: Wolfram-Dietrich Böttcher, Jochen Krauter, Ronald Walther