Patents by Inventor Ronald Wilklow
Ronald Wilklow has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20200278295Abstract: An optical system for beam pointing monitoring and compensation is provided. According to an embodiment, a beam pointing monitor and compensation system includes a surface plasmon resonance (SPR) optical element (800). The SPR optical element includes an optical element (801) that includes first (806) and second (802) surfaces. The first and second surfaces of the optical element are substantially parallel to each other. The SPR optical element further includes a first metal layer (803) provided on the second surface of the optical element, a dielectric layer (805) provided on the first metal layer, and a second metal layer (807) provided on the dielectric layer.Type: ApplicationFiled: September 4, 2018Publication date: September 3, 2020Applicant: ASML Holding N.V.Inventors: Matthew E. HANSEN, Ronald A. WILKLOW
-
Patent number: 9348236Abstract: An electrostatic clamp for use in a lithographic apparatus includes burls and an electrode surrounded by an insulator and/or a dielectric material between adjacent burls. In an embodiment, two or more layers of dielectric material are provided between adjacent burls and surround an electrode provided between adjacent burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.Type: GrantFiled: September 21, 2011Date of Patent: May 24, 2016Assignee: ASML HOLDING N.V.Inventors: Peter Richard Helmus, Matthew Lipson, Ronald A. Wilklow, James Kennon, Kennard White, Wilbur Jordan Reichmann, II
-
Patent number: 8902562Abstract: An electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The clamp comprises a first layer of material, an electrode disposed over the first layer, an isolating, dielectric or semi-dielectric material deposited between portions of the electrode, and a second layer disposed over the electrode. Further, a method of manufacturing of the electrostatic clamp is described.Type: GrantFiled: August 1, 2012Date of Patent: December 2, 2014Assignee: ASML Holdings N.V.Inventors: Peter Richard Helmus, Ronald A. Wilklow
-
Patent number: 8755027Abstract: A fluid system to provide a fluid including liquid in a part of a lithographic apparatus, the fluid system including a manifold to mix a first liquid component and a second component to form the fluid in the part of the lithographic apparatus, a controller to control a physical property of the fluid by controlling the amount of the first and/or second component used to form the fluid, and a measuring device to measure a property of the fluid and to make feedback available to the controller, wherein the controller is configured to control the physical property of the fluid based on the measured property.Type: GrantFiled: September 6, 2011Date of Patent: June 17, 2014Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthew Lipson, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
-
Patent number: 8736810Abstract: A reflective reticle substantially reduces or eliminates pattern distortion that results from the absorption of EUV radiation while maintaining a reticle thickness consistent with industry standards. The reflective reticle includes a layer of ultra-low expansion (ULE) glass and a substrate of Cordierite having a thermal conductivity substantially larger than that of ULE glass. An aluminum layer is disposed onto a first surface of the ULE glass and a second surface of the ULE glass is polished to be substantially flat and defect-free. The Cordierite substrate can be directly bonded to the aluminum layer using anodic bonding to form the reflective reticle. Alternatively, a first surface of an intermediate Zerodur layer can be bonded to the aluminum layer, and a second aluminum layer can be used to anodically bond the Cordierite substrate to a second surface of the Zerodur layer, thereby forming the reflective reticle.Type: GrantFiled: July 29, 2009Date of Patent: May 27, 2014Assignee: ASML Holding N.V.Inventors: Ronald A. Wilklow, Michael L. Nelson, Michael Perry
-
Publication number: 20130308116Abstract: An electrostatic clamp for use in a lithographic apparatus includes burls and an electrode surrounded by an insulator and/or a dielectric material between adjacent burls. In an embodiment, two or more layers of dielectric material are provided between adjacent burls and surround an electrode provided between adjacent burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.Type: ApplicationFiled: September 21, 2011Publication date: November 21, 2013Applicant: ASML Holding N.V.Inventors: Peter Richard Helmus, Matthew Lipson, Ronald A. Wilklow, James Kennon, Kennard White, Wilbur Jordan Reichmann, II
-
Patent number: 8558988Abstract: A system and method for use of a lithography apparatus having a substrate and an absorbing film formed on the substrate. A thickness of the absorbing film is spatially modulated across at least a part of the substrate to reduce a non-uniform intensity of a radiation beam transmitted through the substrate.Type: GrantFiled: November 5, 2008Date of Patent: October 15, 2013Assignee: ASML Holding N.V.Inventors: Yuli Vladimirsky, Lev Ryzhikov, Ronald A. Wilklow
-
Publication number: 20130033690Abstract: An electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The clamp comprises a first layer of material, an electrode disposed over the first layer, an isolating, dielectric or semi-dielectric material deposited between portions of the electrode, and a second layer disposed over the electrode. Further, a method of manufacturing of the electrostatic clamp is described.Type: ApplicationFiled: August 1, 2012Publication date: February 7, 2013Applicant: ASML Holding N.V.Inventors: Peter Richard HELMUS, Ronald A. Wilklow
-
Publication number: 20110317138Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.Type: ApplicationFiled: September 6, 2011Publication date: December 29, 2011Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Matthew LIPSON, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
-
Patent number: 8027026Abstract: A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to a controller, based on the feedback, controlling with the controller a physical property of the liquid by controlling the amount of the first and/or second component used to form the liquid, supplying the liquid to the space between the projection system and the substrate, and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.Type: GrantFiled: January 28, 2011Date of Patent: September 27, 2011Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthew Lipson, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
-
Patent number: 8013999Abstract: The divergence of an optical beam is determined. An optic is configured to provide internal reflection of at least a part of a beam of radiation scanned over varying angles of incidence on the optic. The optic has a film configured to provide a surface plasmon resonance (SPR) effect. A detector is arranged relative to the optic and configured to electronically detect radiation reflected from the optic. The divergence angle of the beam of radiation is calculated based on a change in reflectance relative to angle of incidence.Type: GrantFiled: December 19, 2008Date of Patent: September 6, 2011Assignee: ASML Holding N.V.Inventors: Matthew E. Hansen, Ronald A. Wilklow
-
Publication number: 20110134402Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.Type: ApplicationFiled: January 28, 2011Publication date: June 9, 2011Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Matthew LIPSON, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
-
Publication number: 20110116068Abstract: A reflective reticle substantially reduces or eliminates pattern distortion that results from the absorption of EUV radiation while maintaining a reticle thickness consistent with industry standards. The reflective reticle includes a layer of ultra-low expansion (ULE) glass and a substrate of Cordierite having a thermal conductivity substantially larger than that of ULE glass. An aluminum layer is disposed onto a first surface of the ULE glass and a second surface of the ULE glass is polished to be substantially flat and defect-free. The Cordierite substrate can be directly bonded to the aluminum layer using anodic bonding to form the reflective reticle. Alternatively, a first surface of an intermediate Zerodur layer can be bonded to the aluminum layer, and a second aluminum layer can be used to anodically bond the Cordierite substrate to a second surface of the Zerodur layer, thereby forming the reflective reticle.Type: ApplicationFiled: July 29, 2009Publication date: May 19, 2011Inventors: Ronald A. Wilklow, Michael L. Nelson, Michael Perry
-
Patent number: 7894040Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.Type: GrantFiled: October 5, 2004Date of Patent: February 22, 2011Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthew Lipson, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
-
Publication number: 20090161088Abstract: The divergence of an optical beam is determined. An optic is configured to provide internal reflection of at least a part of a beam of radiation scanned over varying angles of incidence on the optic. The optic has a film configured to provide a surface plasmon resonance (SPR) effect. A detector is arranged relative to the optic and configured to electronically detect radiation reflected from the optic. The divergence angle of the beam of radiation is calculated based on a change in reflectance relative to angle of incidence.Type: ApplicationFiled: December 19, 2008Publication date: June 25, 2009Applicant: ASML HOLDING N.V.Inventors: Matthew E. Hansen, Ronald A. Wilklow
-
Patent number: 7548370Abstract: The present invention relates to an apparatus for polarizing an incident light beam. In embodiments, a tile wave plate assembly is provided. The tile wave plate includes a layered structure having a substrate plate and two layers of mosaic tiles. The layers of the apparatus are mechanically separated to form a controlled gap spacing. The mosaic tiles can be configured to form a pseudo or true zero order wave plate.Type: GrantFiled: June 29, 2004Date of Patent: June 16, 2009Assignee: ASML Holding N.V.Inventors: Michael M. Albert, Justin Kreuzer, Ronald A. Wilklow
-
Publication number: 20090122289Abstract: A system and method for use of a lithography apparatus having a substrate and an absorbing film formed on the substrate. A thickness of the absorbing film is spatially modulated across at least a part of the substrate to reduce a non-uniform intensity of a radiation beam transmitted through the substrate.Type: ApplicationFiled: November 5, 2008Publication date: May 14, 2009Applicant: ASML Holding N.V.Inventors: Yuli VLADIMIRSKY, Lev Ryzhikov, Ronald A. Wilklow
-
Publication number: 20080278813Abstract: A beamsplitter includes a first fluoride prism and a second fluoride prism. A coating interface is between the first and second fluoride prisms, wherein an overall R(s)*T(p) function of the beamsplitter varies no more than ±2.74% in the range of 40-50 degrees of incidence.Type: ApplicationFiled: July 23, 2008Publication date: November 13, 2008Applicant: ASML Holding N.V.Inventor: Ronald A. Wilklow
-
Patent number: 7414785Abstract: A beamsplitter includes a first fluoride prism and a second fluoride prism. A coating interface is between the first and second fluoride prisms, wherein an overall R(s)*T(p) function of the beamsplitter varies no more than ±2.74% in the range of 40-50 degrees of incidence.Type: GrantFiled: June 11, 2003Date of Patent: August 19, 2008Assignee: ASML Holding N.V.Inventor: Ronald A Wilklow
-
Patent number: 7335398Abstract: Systems and methods are used to modify a layer on a substrate that is used to form a pattern generator, so that light reflecting from the modified substrate has a trapezoidal or other custom profile. The layer is modified using various vapor deposition techniques in conjunction with moving or positioning the substrate a desired distance from a blocking device and/or at a desired rate or speed.Type: GrantFiled: July 26, 2004Date of Patent: February 26, 2008Assignee: ASML Holding N.V.Inventors: Matthew Lipson, Ronald A. Wilklow