Patents by Inventor Ronald Wong

Ronald Wong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240097879
    Abstract: A method of blockchain-based data management of distributed binary objects. The method includes identifying a binary object associated with a blockchain. The method includes storing the binary object in a first data store responsive to identifying the binary object. The method includes storing a reference to the binary object on the blockchain. The method includes generating, responsive to an interaction with the reference to the binary object and based on the binary object and a different binary object from a different data store, an additional binary object having a data size that exceeds a maximum data size associated with each block of the blockchain.
    Type: Application
    Filed: November 30, 2023
    Publication date: March 21, 2024
    Inventors: Irene Wong Woerner, Ronald Chi King Kong
  • Publication number: 20220347135
    Abstract: Spontaneous preterm birth (sPTB) is premature delivery prior to 37 weeks of pregnancy and is a leading cause of infant mortality worldwide. sPTB is associated with a unique gene expression profile. Identified herein are numerous safe and proven therapeutic compositions used for unrelated indications that have the biological effect of reversing, in part, the gene expression profile of sPTB and which can be used in preventative or interventional treatments to prevent, delay, or ameliorate sPTB. The repurposed drugs include several Class A and Class B therapeutics that are regarded as safe or low risk in pregnant subjects.
    Type: Application
    Filed: March 20, 2020
    Publication date: November 3, 2022
    Applicants: The Regents of the University of California, The Leland Stanford Junior University
    Inventors: Marina Sirota, Brian Le, Ronald Wong, David Stevenson
  • Patent number: 10032901
    Abstract: A semiconductor device (e.g., a flip chip) includes a substrate layer that is separated from a drain contact by an intervening layer. Trench-like feed-through elements that pass through the intervening layer are used to electrically connect the drain contact and the substrate layer when the device is operated.
    Type: Grant
    Filed: April 5, 2016
    Date of Patent: July 24, 2018
    Assignee: Vishay-Siliconix
    Inventors: Deva Pattanayak, King Owyang, Mohammed Kasem, Kyle Terrill, Reuven Katraro, Kuo-In Chen, Calvin Choi, Qufei Chen, Ronald Wong, Kam Hong Lui, Robert Xu
  • Publication number: 20170025527
    Abstract: A semiconductor device (e.g., a flip chip) includes a substrate layer that is separated from a drain contact by an intervening layer. Trench-like feed-through elements that pass through the intervening layer are used to electrically connect the drain contact and the substrate layer when the device is operated.
    Type: Application
    Filed: April 5, 2016
    Publication date: January 26, 2017
    Inventors: Deva Pattanayak, King Owyang, Mohammed Kasem, Kyle Terrill, Reuven Katraro, Kuo-In Chen, Calvin Choi, Qufei Chen, Ronald Wong, Kam Hong Lui, Robert Xu
  • Patent number: 9306056
    Abstract: A semiconductor device (e.g., a flip chip) includes a substrate layer that is separated from a drain contact by an intervening layer. Trench-like feed-through elements that pass through the intervening layer are used to electrically connect the drain contact and the substrate layer when the device is operated.
    Type: Grant
    Filed: October 30, 2009
    Date of Patent: April 5, 2016
    Assignee: Vishay-Siliconix
    Inventors: Deva Pattanayak, King Owyang, Mohammed Kasem, Kyle Terrill, Reuven Katraro, Kuo-In Chen, Calvin Choi, Qufei Chen, Ronald Wong, Kam Hong Lui, Robert Xu
  • Patent number: 8697571
    Abstract: A structure includes a semiconductor device formed in a substrate; an insulator adjacent to the semiconductor device; an electrical contact electrically coupled to the semiconductor device, wherein the electrical contact includes tungsten; and an electrical connector coupled to the electrical contact, wherein the electrical connector includes aluminum. A surface of the insulator and a surface of the electrical contact form a substantially even surface.
    Type: Grant
    Filed: October 17, 2012
    Date of Patent: April 15, 2014
    Assignee: Vishay-Siliconix
    Inventors: Ronald Wong, Jason Qi, Kyle Terrill, Kuo-In Chen
  • Patent number: 8471390
    Abstract: A structure includes a semiconductor device formed in a substrate; an insulator adjacent to the semiconductor device; an electrical contact electrically coupled to the semiconductor device, wherein the electrical contact includes tungsten; and an electrical connector coupled to the electrical contact, wherein the electrical connector includes aluminum. A surface of the insulator and a surface of the electrical contact form a substantially even surface.
    Type: Grant
    Filed: May 2, 2007
    Date of Patent: June 25, 2013
    Assignee: Vishay-Siliconix
    Inventors: Ronald Wong, Jason Qi, Kyle Terrill, Kuo-In Chen
  • Patent number: 8183629
    Abstract: Embodiments of the present invention are directed toward a trench metal-oxide-semiconductor field effect transistor (TMOSFET) device. The TMOSFET device includes a source-side-gate TMOSFET coupled to a drain-side-gate TMOSFET 1203. A switching node metal layer couples the drain of the source-side-gate TMOSFET to the source of the drain-side-gate TMOSFET so that the TMOSFETs are packaged as a stacked or lateral device.
    Type: Grant
    Filed: March 18, 2008
    Date of Patent: May 22, 2012
    Assignee: Vishay-Siliconix
    Inventors: Deva Pattanayak, Jason (Jianhai) Qi, Yuming Bai, Kam-Hong Lui, Ronald Wong
  • Publication number: 20110101525
    Abstract: A semiconductor device (e.g., a flip chip) includes a substrate layer that is separated from a drain contact by an intervening layer. Trench-like feed-through elements that pass through the intervening layer are used to electrically connect the drain contact and the substrate layer when the device is operated.
    Type: Application
    Filed: October 30, 2009
    Publication date: May 5, 2011
    Applicant: VISHAY-SILICONIX
    Inventors: Deva Pattanayak, King Owyang, Mohammed Kasem, Kyle Terrill, Reuven Katraro, Kuo-In Chen, Calvin Choi, Qufei Chen, Ronald Wong, Kam Hong Lui, Robert Xu
  • Publication number: 20090050960
    Abstract: Embodiments of the present invention are directed toward a trench metal-oxide-semiconductor field effect transistor (TMOSFET) device. The TMOSFET device includes a source-side-gate TMOSFET coupled to a drain-side-gate TMOSFET 1203. A switching node metal layer couples the drain of the source-side-gate TMOSFET to the source of the drain-side-gate TMOSFET so that the TMOSFETs are packaged as a stacked or lateral device.
    Type: Application
    Filed: March 18, 2008
    Publication date: February 26, 2009
    Applicant: VISHAY-SILICONIX
    Inventors: Deva Pattanayak, Jason (Jianhai) Qi, Yuming Bai, Kam-Hong Lui, Ronald Wong
  • Patent number: 7344945
    Abstract: Embodiments of the present invention provide a striped or closed cell trench metal-oxide-semiconductor field effect transistor (TMOSFET). The striped or closed cell TMOSFET comprises a source region, a body region disposed above the source region, a drift region disposed above the body region, a drain region disposed above the drift region. A gate region is disposed above the source region and adjacent the body region. A gate insulator region electrically isolates the gate region from the source region, body region, drift region and drain region. The body region is electrically coupled to the source region.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: March 18, 2008
    Assignee: Vishay-Siliconix
    Inventors: Deva Pattanayak, Jason (Jianhai) Qi, Yuming Bai, Kam-Hong Lui, Ronald Wong
  • Publication number: 20070284754
    Abstract: A structure includes a semiconductor device formed in a substrate; an insulator adjacent to the semiconductor device; an electrical contact electrically coupled to the semiconductor device, wherein the electrical contact includes tungsten; and an electrical connector coupled to the electrical contact, wherein the electrical connector includes aluminum. A surface of the insulator and a surface of the electrical contact form a substantially even surface.
    Type: Application
    Filed: May 2, 2007
    Publication date: December 13, 2007
    Inventors: Ronald Wong, Jason Qi, Kyle Terrill, Kuo-In Chen
  • Patent number: 7126708
    Abstract: A system and business method for enabling photolabs to provide digital image processing services, and at the same time, to provide the photolabs with the ability to use their own branding in connection with their services and to the control of all business aspects of the service, including the creation of a customized website, digital image product offerings, branding, pricing, promotions, advertisements, and film prints and related image imprinted product fulfillment.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: October 24, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Christopher E. McConn, Ronald Wong, John C. Marshall, Alvin Wang
  • Publication number: 20060236303
    Abstract: Technology that enables users to download to their local computing environment a simulation application and input data corresponding to a system having two or more interconnected components is described. The technology allows the user to perform a simulation in the user's local computing environment of the system of interconnected components described by the input data where the functionality of the simulation application is defined by instructions contained within the input data. In some examples, the invention enables a user to access a modified or relaxed set of features when simulating a system of interconnected components. The invention provides users with the ability to rapidly evaluate the performance of a manufacturer's product before purchase.
    Type: Application
    Filed: March 29, 2006
    Publication date: October 19, 2006
    Inventors: Thomas Wilson, Ronald Wong
  • Patent number: 6906380
    Abstract: Embodiments of the present invention provide a striped or closed cell trench metal-oxide-semiconductor field effect transistor (TMOSFET). The striped or closed cell TMOSFET comprises a source region, a body region disposed above the source region, a drift region disposed above the body region, a drain region disposed above the drift region. A gate region is disposed above the source region and adjacent the body region. A gate insulator region electrically isolates the gate region from the source region, body region, drift region and drain region. The body region is electrically coupled to the source region.
    Type: Grant
    Filed: May 13, 2004
    Date of Patent: June 14, 2005
    Assignee: Vishay-Siliconix
    Inventors: Deva Pattanayak, Jason (Jianhai) Qi, Yuming Bai, Kam-Hong Lui, Ronald Wong
  • Patent number: 6709930
    Abstract: A trench MOSFET is formed by creating a trench in a semiconductor substrate, then forming a barrier layer over a portion of the side wall of the trench. A thick insulating layer is deposited in the bottom of the trench. The barrier layer is selected such that the thick insulating layer deposits in the bottom of the trench at a faster rate than the thick insulating layer deposits on the barrier layer. Embodiments of the present invention avoid stress and reliability problems associated with thermal growth of insulating layers, and avoid problems with control of the shape and thickness of the thick insulating layer encountered when a thick insulating layer is deposited, then etched to the proper shape and thickness.
    Type: Grant
    Filed: June 21, 2002
    Date of Patent: March 23, 2004
    Assignee: Siliconix Incorporated
    Inventors: Ben Chan, Kam Hong Lui, Christiana Yue, Ronald Wong, David Chang, Frederick P. Giles, Kyle Terrill, Mohamed N. Darwish, Deva Pattanayak, Robert Q. Xu, Kuo-in Chen
  • Publication number: 20030235958
    Abstract: A trench MOSFET is formed by creating a trench in a semiconductor substrate, then forming a barrier layer over a portion of the side wall of the trench. A thick insulating layer is deposited in the bottom of the trench. The barrier layer is selected such that the thick insulating layer deposits in the bottom of the trench at a faster rate than the thick insulating layer deposits on the barrier layer. Embodiments of the present invention avoid stress and reliability problems associated with thermal growth of insulating layers, and avoid problems with control of the shape and thickness of the thick insulating layer encountered when a thick insulating layer is deposited, then etched to the proper shape and thickness.
    Type: Application
    Filed: June 21, 2002
    Publication date: December 25, 2003
    Applicant: Siliconix Incorporated
    Inventors: Ben Chan, Kam Hong Lui, Christiana Yue, Ronald Wong, David Chang, Frederick P. Giles, Kyle Terrill, Mohamed N. Darwish, Deva Pattanayak, Robert Q. Xu, Kuo-in Chen
  • Publication number: 20030216978
    Abstract: A method includes receiving information identifying financial withholdings associated with an organization. The method also includes identifying a due date associated with the financial withholdings. In addition, the method includes facilitating a payment associated with the withholdings by the identified due date.
    Type: Application
    Filed: March 18, 2003
    Publication date: November 20, 2003
    Inventors: Steven L. Sweeney, Frances L. Bartlett, Ronald Wong, Connie L. Davis