Patents by Inventor Rong-Chen Richard Wu

Rong-Chen Richard Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COATING PROCESS FOR MANUFACTURE OR REPROCESSING OF SPUTTER TARGETS AND X-RAY ANODES
    Publication number: 20080216602
    Abstract: Disclosed is a process for the reprocessing or production of a sputter target or an X-ray anode wherein a gas flow forms a gas/powder mixture with a powder of a material chosen from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, mixtures of two or more thereof and alloys thereof with at least two thereof or with other metals, the powder has a particle size of 0.5 to 150 ?m, wherein a supersonic speed is imparted to the gas flow and the jet of supersonic speed is directed on to the surface of the object to be reprocessed or produced.
    Type: Application
    Filed: November 5, 2007
    Publication date: September 11, 2008
    Applicant: H. C. Starck GmbH
    Inventors: Stefan Zimmermann, Uwe Papp, Hans Keller, Steven A. Miller, Prabhat Kumar, Mark Gaydos, Rong-Chen Richard Wu