Abstract: A high-resolution phase detection method and system based on a plane grating laser interferometer. The method uses a dual-frequency interferometer to measure the displacement, and the measurement signal processing comprises an integral part and a decimal portion, a phase equation set of a displacement measurement signal is constructed according to a measurement optical path principle of a heterodyne plane grating laser interferometer; a non-linear equation set for which the unknowns are instantaneous phase, interval phase and signal amplitude is established; and the equation sets above are solved by using the least squares method, so as to realize phase discrimination, thereby realizing precise displacement measurement. The method can solve the problems in the traditional time measurement-based phase detection technology, such as low measurement accuracy, and failing to satisfy small measuring range measurement.

Abstract: A communication apparatus includes a radio transceiver, configured to transmit or receive wireless signals with a network device; and a processing circuit, coupled to the radio transceiver and configured to perform operations including: reporting a first capability of the communication apparatus to the network device; determining whether at least one first event occurs, after reporting the first capability; releasing a connection between the communication apparatus and the network device, in response to the at least one first event occurring; establishing the connection to indicate a capability update; updating the first capability to generate a second capability of the communication apparatus; reporting the second capability to the network device.

Abstract: Disclosed is a scanning interference photolithography system, comprising a heterodyne optical path, a first interference optical path, a second interference optical path, a motion platform and a control subsystem, wherein a substrate is carried on the motion platform, a displacement measurement interferometer is used to measure the displacement of the motion platform, a first light beam and a second light beam are focused on the substrate for interference exposure; the control subsystem generates instructions according to various measurement information, adjusts angles of corresponding devices or the phase of a light beam, and locks the phase shift of interference exposure fringes of the first light beam and the second light beam. The system has a high precision of fringe pattern locking and a high laser utilization rate, and can be used for producing a large-area high-precision dense grating line gradient periodic grating.

Abstract: Disclosed are a vertical motion protection method and device based on a dual-stage motion system of a photolithography machine. The method comprises: according to a distance between measured points and reference points of the eddy current sensor and coordinates of the reference points of the eddy current sensor, calculating coordinates of the measured points on a lower surface of the micro-motion stage respectively; calculating a point normal form equation of the micro-motion stage at the current time using measured coordinates of the measured points on the micro-motion stage, then substituting X and Y coordinates of the measured points on the translated micro-motion stage to determine a maximum height of the micro-motion stage at the current time; and comparing the maximum height with a height threshold, if the maximum height exceeds the height threshold, shutting down for protection, or else continuing to operate the system.

Abstract: Disclosed is a phase measurement device, comprising: a first wave plate, a first polarization splitting prism, a fourth wave plate, a retroreflector, a third wave plate, a reflector, a second wave plate, a polarizer, a second polarization splitting prism, a third polarization splitting prism, a first photoelectric detector, a second photoelectric detector, and a base, wherein the first to third polarization splitting prisms and the first and second photoelectric detectors are fixed on the base; the first to fourth wave plates are respectively arranged around the periphery of the first polarization splitting prism; the polarizer is arranged on an emitting surface of the third polarization splitting prism; the retroreflector is arranged on an outer side of the fourth wave plate; and the reflector is arranged on an outer side of the third wave plate. An interferometric signal is resolved to obtain a measurement light beam phase.

Abstract: Disclosed is a scanning interference photolithography system, comprising a heterodyne optical path, a first interference optical path, a second interference optical path, a motion platform and a control subsystem, wherein a substrate is carried on the motion platform, a displacement measurement interferometer is used to measure the displacement of the motion platform, a first light beam and a second light beam are focused on the substrate for interference exposure; the control subsystem generates instructions according to various measurement information, adjusts angles of corresponding devices or the phase of a light beam, and locks the phase shift of interference exposure fringes of the first light beam and the second light beam. The system has a high precision of fringe pattern locking and a high laser utilization rate, and can be used for producing a large-area high-precision dense grating line gradient periodic grating.

Abstract: A laser interference photolithography system, comprising a laser device, a first reflector, a grating beam-splitter, a second reflector, a first universal reflector, a first lens, a second universal reflector, a second lens, a beam splitting prism, a control module, an angle measurement module, a third lens and a substrate. The control module comprises a signal processing terminal, a controller, and a driver. The signal processing terminal is connected to the angle measurement module, the controller is connected to both the signal processing terminal and the driver, and the driver is connected to both the first universal reflector and the second universal reflector. The laser emits a laser light that is split into two beams of light by the system, and the two beams of light are focused on the substrate for exposure.

Abstract: Disclosed is a plane grating calibration system, comprising an optical subsystem, a frame, first vibration isolator, a vacuum chuck, a workpiece stage, second vibration isolator, a base platform and a controller; the optical subsystem is mounted on the frame, and the frame is isolated from vibration by the first vibration isolator; the vacuum chuck is rotatably mounted on the workpiece stage, the workpiece stage is positioned on the base platform, and the base platform is isolated from vibration by the second vibration isolator. A displacement interferometer is integrated into the optical subsystem, and the entire optical subsystem adopts a method of sharing a light source, thereby avoiding the problems of low wavelength precision and poor coherence of separate light sources.

Abstract: An exposure light beam phase measurement method for laser interference photolithography comprises: separating a measurement light from an exposure light beam and inputting light into a laser phase measurement interferometer to carry out phase measurement on the exposure light beam; inputting a reference light beam homologous with the exposure light beam into the laser phase measurement interferometer; processing the reference light beam to form an interference measurement optical signal; calculating to obtain the phase of the exposure light beam. A laser interference photolithography system using the method comprises a laser phase measurement interferometer, a controller and phase modulators, the laser phase measurement interferometer measures whether the phase of an exposure light beam drifts, the controller controls phase modulators to carry out phase modulation, to achieve locking of exposure stripe phase drift and manufacturing of a high-precision variable-period optical grating.

Abstract: A laser interference photolithography system, comprising a laser device, a first reflector, a grating beam-splitter, a second reflector, a first universal reflector, a first lens, a second universal reflector, a second lens, a beam splitting prism, a control module, an angle measurement module, a third lens and a substrate. The control module comprises a signal processing terminal, a controller, and a driver. The signal processing terminal is connected to the angle measurement module, the controller is connected to both the signal processing terminal and the driver, and the driver is connected to both the first universal reflector and the second universal reflector. The laser emits a laser light that is split into two beams of light by the system, and the two beams of light are focused on the substrate for exposure.

Abstract: Disclosed is a heterodyne grating interferometry system based on secondary diffraction, including a single-frequency laser, an input optical fiber, an acousto-optic modulator, a reading head, and a measurement grating, an output optical fiber, a photoelectric conversion unit and an electronic signal processing unit, wherein the single-frequency laser emits a single-frequency laser, which enters the acousto-optic modulator through the input optical fiber, and is divided into a reference light and measurement light to be input to the reading head, wherein the reading head and the measurement grating convert the reference light and measurement light into a reference interference optical signal and a measurement interference optical signal and send them to the photoelectric conversion unit through the output optical fiber and wherein the photoelectric conversion unit converts the measurement interference optical signal and the reference interference optical signal into a measurement interference electrical signal

Abstract: Disclosed are a vertical motion protection method and device based on a dual-stage motion system of a photolithography machine. The method comprises: according to a distance between measured points and reference points of the eddy current sensor and coordinates of the reference points of the eddy current sensor, calculating coordinates of the measured points on a lower surface of the micro-motion stage respectively; calculating a point normal form equation of the micro-motion stage at the current time using measured coordinates of the measured points on the micro-motion stage, then substituting X and Y coordinates of the measured points on the translated micro-motion stage to determine a maximum height of the micro-motion stage at the current time; and comparing the maximum height with a height threshold, if the maximum height exceeds the height threshold, shutting down for protection, or else continuing to operate the system.

Abstract: A device and a method for regulating and controlling an incident angle of a light beam in a laser interference lithography process are disclosed. The device comprises: a beam splitter prism between a first lens and a second lens, a first position detector, a first decoupling lens between the first position detector and the beam splitter prism, a feedback control system connected to the first position detector and a first universal reflecting mirror. The beam splitter prism reflects first incident light passing through the first universal reflecting mirror, the first decoupling lens enables a first reflected light enter into the first position detector, the first position detector measures the light beam position, the feedback control system outputs a control command according to the measurement result to regulate a mirror base of the first universal reflecting mirror, thereby regulating and controlling an incident angle of an exposure light beam.

Abstract: A five-degree-of-freedom heterodyne grating interferometry system comprises: a single-frequency laser for emitting single-frequency laser light, the single-frequency laser light can be split into a reference light beam and a measurement light beam; an interferometer lens set and a measurement grating for converting the reference light and the measurement light into a reference interference signal and a measurement interference signal; and multiple optical fiber bundles respectively receiving the measurement interference signal and the reference interference signal, wherein each optical fiber bundle has multiple multi-mode optical fibers respectively receiving interference signals at different positions on the same plane. The system is not over-sensitive to the environment, is small and light, and is easy to arrange.

Abstract: Embodiments of the present disclosure relate to a method and apparatus for determining a text color. The method may include: determining, in response to detecting a text frame on canvas, a subimage corresponding to the text frame from the canvas; acquiring color values of pixels in the subimage, to determine an average color value of the subimage; determining an average luminance value of the subimage based on the average color value of the subimage; and determining a color of text to be inputted into the text frame based on the average luminance value of the subimage.

Abstract: Disclosed is a plane grating calibration system, comprising an optical subsystem, a frame , first vibration isolator, a vacuum chuck, a workpiece stage, second vibration isolator, a base platform and a controller; the optical subsystem is mounted on the frame, and the frame is isolated from vibration by the first vibration isolator; the vacuum chuck is rotatably mounted on the workpiece stage, the workpiece stage is positioned on the base platform, and the base platform is isolated from vibration by the second vibration isolator. A displacement interferometer is integrated into the optical subsystem, the entire optical subsystem adopts a method of sharing a light source, thereby avoiding the problems of low wavelength precision and poor coherence of separate light sources.

Abstract: A high-resolution phase detection method and system based on a plane grating laser interferometer. The method uses a dual-frequency interferometer to measure the displacement, and the measurement signal processing comprises an integral part and a decimal portion, a phase equation set of a displacement measurement signal is constructed according to a measurement optical path principle of a heterodyne plane grating laser interferometer; a non-linear equation set for which the unknowns are instantaneous phase, interval phase and signal amplitude is established; and the equation sets above are solved by using the least squares method, so as to realize phase discrimination, thereby realizing precise displacement measurement. The method can solve the problems in the traditional time measurement-based phase detection technology, such as low measurement accuracy, and failing to satisfy small measuring range measurement.

Abstract: A two-degree-of-freedom heterodyne grating interferometry measurement system, comprising: a single-frequency laser device for emitting a single-frequency laser, and the single-frequency laser can be split into a beam of reference light and a beam of measurement light; an interferometer mirror group and a measurement grating for forming a reference interference signal and a measurement interference signal from the reference light and the measurement light; and a receiving optical fiber for receiving the reference interference signal and the measurement interference signal, wherein a core diameter of the receiving optical fiber is smaller than a width of an interference fringe of the reference interference signal and the measurement interference signal, so that the receiving optical fiber receives a part of the reference interference signal and the measurement interference signal.

Abstract: The present disclosure relates to a sealing technology, and in particular relates to a high-vacuum or ultrahigh-vacuum seal gasket (301) for a flat plate structure and a sealing structure. The seal gasket (301) comprises a seal ring (302) and multiple metal wires (303) extending outwards from the seal ring (302). The flat plate sealing structure comprises two flat plates (401, 404), the seal gasket (301) is fixed to one flat plate (401) via the multiple extending metal wires (303) so as to accurately position the seal ring (302). Accurate positioning can be achieved by virtue of an extern force without structure improvement on flat plate workpieces, thereby ensuring that no malposition occurs after the installation of the seal gasket (301).

Abstract: A method and apparatus for generating a customized visualization component are provided.