Patents by Inventor Rong Huang

Rong Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040071181
    Abstract: Described are optical devices called retro-reflective etalon filter and wide tunable semiconductor lasers using the retro-reflective etalon filter. The reflection optical spectrum of the retro-reflective etalon has the double-pass transmission characteristic of the etalon used within the retro-reflective etalon. The retro-reflective etalon(s) can be used as the reflective end mirror(s) of the wide tunable semiconductor laser. The retro-reflective etalon also can act as the wavelength locker of the laser. The proposed retro-reflective etalon is easy to be manufactured and the wide tunable semiconductor lasers are easy to be implemented by using the retro-reflective etalon.
    Type: Application
    Filed: June 24, 2003
    Publication date: April 15, 2004
    Inventor: Rong Huang
  • Publication number: 20040070768
    Abstract: Wavelength reference apparatus for use in calibrating a tunable Fabry-Perot filter or a tunable VCSEL, whereby the device may be tuned to a precise, known wavelength, the wavelength reference apparatus comprising an LED, where the LED is chosen so as to have an emission profile which varies with wavelength; an etalon, where the etalon is chosen so as to have a transmission profile which comprises a comb of transmission peaks, with each transmission peak occurring at a precise, known wavelength; and a detector for detecting the light emitted by the LED and passing through the etalon; whereby when a tunable Fabry-Perot filter or tunable VCSEL is positioned between the etalon and the detector, and the device is swept through its tuning range by varying the tuning voltage applied to the device, the known transmission wavelengths established by the LED and the etalon can be correlated to counterpart tuning voltages of the device, whereby to calibrate the device.
    Type: Application
    Filed: December 28, 2000
    Publication date: April 15, 2004
    Inventors: Donald L. McDaniel, Rong Huang, Parviz Tayebati, Reich L. Watterson
  • Patent number: 6694201
    Abstract: A supervisory parallel switching device is designed for use with a CIM system including a host computer unit connected via an extended computer integrated unit to at least one equipment unit through an SECS-compliant (Semiconductor Equipment Communication Standard) serial communication link, for the purpose of allowing the equipment unit to be continuously under computer control even in the event of an unanticipated shutdown to the extended computer integrated unit.
    Type: Grant
    Filed: August 17, 2000
    Date of Patent: February 17, 2004
    Assignee: Industrial Technology Research Institute
    Inventors: Wen-Yo Lee, Chun-Hung Liu, Chien-Rong Huang, Shao-Kung Chang, Jou Chyn
  • Publication number: 20030219978
    Abstract: The present invention provides an apparatus for liquid phase deposition, comprising: a saturation reaction system, including a mixture trough, at least two supply devices for raw materials, a stirrer device, a filter device, and valve control devices; a steady-flow over-saturation loop reaction system, including an over-saturation reaction trough, at least one liquid level control trough, at least two supply devices for raw materials, a stirrer device, a filter device, and valve control devices; an automatic solution concentration monitoring system, for controlling the reactant concentrations; and a waste liquid recycling system, comprising at least two storage troughs, a recycled waste liquid level sensor, a recycled waste liquid sensor, and valve control devices.
    Type: Application
    Filed: December 23, 2002
    Publication date: November 27, 2003
    Applicant: Industrial Technology Research Institute
    Inventors: Muh-Wang Liang, Pang-Min Chiang, Chen Max, Jen-Rong Huang, Ching-Fa Yeh
  • Patent number: 6653245
    Abstract: A method for liquid phase deposition, including the steps of providing at least two raw materials from at least two supply devices of a saturation reaction system into a mixture trough and stirring until saturation occurs, filtering out unnecessary solid-state particles, and providing saturated and filtered liquid into an over-saturation reaction trough of a steady-flow over-saturation loop reaction system and stopping the saturated and filtered liquid when the over-saturation reaction trough is filled and the saturated and filtered liquid over-flows into a liquid level control trough to a pre-determined level. The method also includes the steps of providing a substrate in the over-saturation reaction trough, providing reactants from at least two supply devices into the over-saturation reaction trough, and depositing a thin film onto the substrate when the saturated liquid becomes over-saturated.
    Type: Grant
    Filed: June 6, 2001
    Date of Patent: November 25, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Muh-Wang Liang, Pang-Min Chiang, Chen Max, Jen-Rong Huang, Ching-Fa Yeh
  • Patent number: 6639922
    Abstract: Apparatus for use in tuning a tunable optical device to a target wavelength, the apparatus comprising: a beam splitter for tapping a portion of the light emerging from the tunable optical device; a walk-off reflector for dividing the portion of the light emerging from the beam splitter into a plurality of beams; a multiple etalon for tailoring the light from at least two of the plurality of beams provided by the walk-off reflector; a multiple detector for detecting light from the multiple etalon and the walk-off reflector, the multiple detector providing a plurality of output signals; and a control unit for controlling the tunable optical device by providing a control signal to the tunable optical device according to the output signals provided by the multiple detector.
    Type: Grant
    Filed: December 13, 2001
    Date of Patent: October 28, 2003
    Assignee: CoreTek, Inc.
    Inventors: Daryoosh Vakhshoori, Masud Azimi, Bartley C. Johnson, Rong Huang
  • Publication number: 20030179529
    Abstract: A circuit protection device includes an overheat protecting circuit connected to a main circuit and capable of being activated so as to shut down the main circuit when operating temperature of the main circuit reaches a predetermined value, and a current limiting circuit connected to the main circuit for preventing current through the main circuit from exceeding a predetermined threshold value. The current limiting circuit is further connected to the overheat protecting circuit and controls activation of the overheat protecting circuit when the current through the main circuit reaches the predetermined threshold value. Therefore, erroneous operation of the circuit protection device due to a shift in component characteristics of the overheat protecting circuit attributed to limitations in fabrication can be avoided.
    Type: Application
    Filed: October 29, 2002
    Publication date: September 25, 2003
    Inventors: Jian-Rong Huang, Liang-Pin Tai, Jing-Meng Liu
  • Patent number: 6622883
    Abstract: A Modified door for wafer container, includes a rotatable cammed member, two first links coupled to the rotatable cammed member and vertically aligned and moved in and out of respective first latch holes on the wafer transport module upon rotary motion of the rotatable cammed member, and two second links respectively coupled to the first links and horizontally moved in and out of respective second latch holes on the wafer transport module upon movement of the first links. The links each have a slope adapted to be moved with the respective link over a respective bearing means of the door body to force the door body inwards against the wafer transport module, keeping the wafer transport module well sealed.
    Type: Grant
    Filed: August 24, 2000
    Date of Patent: September 23, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Tzong-Ming Wu, Jen-Rong Huang, Muh-Wang Liang
  • Patent number: 6616034
    Abstract: An identification system for tracking wafer carriers within a manufacturing facility. The system uses smart card technology in which an identification card is placed on each wafer carrier. The smart cards have memory for storing information about the wafer carrier. Power is transmitted to the card along with data so that the smart card does not require a separate power source. The devices for communicating with the smart cards can be stationary or they can be portable hand-carried devices. A network connects the readers to a central database.
    Type: Grant
    Filed: December 10, 2001
    Date of Patent: September 9, 2003
    Assignee: Fortrend Taiwan Scientific Corporation
    Inventors: Kung Chris Wu, Chen Wu, Chien-Rong Huang, Jui-Hung Hsu
  • Publication number: 20030146274
    Abstract: A system for bin management includes an input of bin quantity, a database of customer-specific data, and a controller. The controller is operatively connected to the database and arranged to obtain the customer-specific data and the input of bin quantity, to use the customer specific data and the input of bin quantity to determine a segmentation of a multiplicity of bins, to create a representation identifying the segmentation of the multiplicity of bins and has a memory for storing the representation. The system additionally has an output of the representation which identifies the segmentation of the multiplicity of bins. Processes for calculating the segmentation of the multiplicity of bins and for storing and retrieving items based on segmentation data are also provided.
    Type: Application
    Filed: February 1, 2002
    Publication date: August 7, 2003
    Inventors: Rachel H. Pfutzenreuter, Dejan Kozic, Charles L. Goodall, Rong Huang
  • Publication number: 20030112837
    Abstract: Apparatus for use in tuning a tunable optical device to a target wavelength, the apparatus comprising: a beam splitter for tapping a portion of the light emerging from the tunable optical device; a walk-off reflector for dividing the portion of the light emerging from the beam splitter into a plurality of beams; a multiple etalon for tailoring the light from at least two of the plurality of beams provided by the walk-off reflector; a multiple detector for detecting light from the multiple etalon and the walk-off reflector, the multiple detector providing a plurality of output signals; and a control unit for controlling the tunable optical device by providing a control signal to the tunable optical device according to the output signals provided by the multiple detector.
    Type: Application
    Filed: December 13, 2001
    Publication date: June 19, 2003
    Inventors: Daryoosh Vakhshoori, Masud Azimi, Bartley C. Johnson, Rong Huang
  • Publication number: 20030106931
    Abstract: An identification system for tracking wafer carriers within a manufacturing facility. The system uses smart card technology in which an identification card is placed on each wafer carrier. The smart cards have memory for storing information about the wafer carrier. Power is transmitted to the card along with data so that the smart card does not require a separate power source. The devices for communicating with the smart cards can be stationary or they can be portable hand-carried devices. A network connects the readers to a central database.
    Type: Application
    Filed: December 10, 2001
    Publication date: June 12, 2003
    Inventors: Kung Chris Wu, Chen Wu, Chien-rong Huang, Jui-Hung Hsu
  • Patent number: 6555277
    Abstract: In accordance with the objectives of the invention a new method is provided for repairing photolithographic exposure masks. The invention uses an etch function of a conventional mask repair tool. The invention addresses defects that occur in a pattern of opaque material (such as chrome) created over the surface of an exposure mask whereby an (undesired) opening exists in the opaque material. The invention uses a focused E-beam exposure of the surface of the exposure mask to purposely “damage” this surface over the area where the opaque material is required to be present. Repair accuracy is in this manner easy to control, the conventional problem of peeling of the opaque or light sensitive material is eliminated.
    Type: Grant
    Filed: April 26, 2002
    Date of Patent: April 29, 2003
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Same-Ting Chen, Tzy-Ying Lin, Wen-Rong Huang
  • Patent number: 6520652
    Abstract: A method for reducing reflection of undesirable light in an opto-electronic package includes the coating of the interior surfaces of the package with light absorbing materials. Accordingly, when stray or scattered light is incident on package surfaces, reflections are minimized and therefore the optical noise, interference and feedback are reduced.
    Type: Grant
    Filed: November 14, 2001
    Date of Patent: February 18, 2003
    Assignee: Nortel Networks Limited
    Inventors: Rong Huang, Brian Cranton, Masud Azimi
  • Publication number: 20030008027
    Abstract: Mold cleaning apparatus (1) includes a manifold (5) adapted to be coupled to a suction device. A first conduit (6) extends from the manifold (5) and has a first opening (8) remote from the manifold. A second conduit (7) extends from the manifold (5) and has a second opening (11) remote from the manifold (5). The first and the second openings (8, 11) being directed in opposite directions, and the first conduit (6) having a section (10) with a cross-sectional area which is less than cross-sectional area at any point along the length of the second conduit (7).
    Type: Application
    Filed: July 9, 2001
    Publication date: January 9, 2003
    Applicant: ASM Technology Singapore Pte Ltd.
    Inventors: Jie Liu, Zhen Rong Huang, Shu Chuen Ho, Chin Guan Ong, Teng Hock Kuah
  • Publication number: 20020173170
    Abstract: The present invention provides an apparatus for liquid phase deposition, comprising: a saturation reaction system, including a mixture trough, at least two supply devices for raw materials, a stirrer device, a filter device, and valve control devices; a steady-flow over-saturation loop reaction system, including an over-saturation reaction trough, at least one liquid level control trough, at least two supply devices for raw materials, a stirrer device, a filter device, and valve control devices; an automatic solution concentration monitoring system, for controlling the reactant concentrations; and a waste liquid recycling system, comprising at least two storage troughs, a recycled waste liquid level sensor, a recycled waste liquid sensor, and valve control devices.
    Type: Application
    Filed: June 6, 2001
    Publication date: November 21, 2002
    Applicant: Industrial Technology Research Institute
    Inventors: Muh-Wang Liang, Pang-Min Chiang, Chen Max, Jen-Rong Huang, Ching-Fa Yeh
  • Patent number: 6452201
    Abstract: This invention uses the pattern-based signal to accelerate the evaluation process as a means to replace complicated computing procedures. This invention is constructed through implementing absolute coordinates to produce pattern-based signals by position and two optical sensor signals, and through conducting the feature extraction process. This process produces feature signals of sidelong and overlapped issues. Furthermore, through transforming signals, feature signals can be handled by the digital data processor. Thus, this invention can achieve the three main objectives of wafer mapping.
    Type: Grant
    Filed: July 19, 2000
    Date of Patent: September 17, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Yu-Sheng Wang, Chien-Rong Huang, Kuan-Chou Chen, Ping-Yu Hu, Tzong-Ming Wu
  • Publication number: 20020066806
    Abstract: The present invention relates to a nozzle and adjust module of chemicals when wafers are processed during the IC manufacturing process. After wafers are loaded on a chuck of a reaction chamber, five chemicals required for the manufacturing process are transported into the passages, and are sprayed on the surfaces of rotating wafers via different nozzles. The centrifugal effect due to the rotation of a main motor is exploited to coat the chemicals on the whole wafer quickly and uniformly. The present invention can apply to both closed and open reaction chambers. The spray head of the present invention has a specially designed angle, and has level adjusting and height adjusting functions so that high flexibility in the manufacturing process can be obtained.
    Type: Application
    Filed: December 4, 2000
    Publication date: June 6, 2002
    Inventors: Fu-Ching Tung, Chia-Ming Chen, Jen-Rong Huang, Jonathan Wang, Peter L. Mahneke
  • Patent number: 6398033
    Abstract: A wafer container is constructed to include a shell, a holder frame, two retaining blocks, and a handle. The shell has a coupling unit at the periphery. The retaining blocks are fastened to the holder frame, forming first pivot structure. The handle is provided with second pivot structure adapted for coupling to the first pivot structure for enabling the handle to be turned relative to the holder frame through an angle between the operative position convenient for carrying by hand, and the collapsed, non-operative position to minimize space occupation.
    Type: Grant
    Filed: August 24, 2000
    Date of Patent: June 4, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Tzong-Ming Wu, Tien-Lu Ho, Jen-Rong Huang
  • Patent number: 6390394
    Abstract: The present invention relates to a nozzle and adjust module of chemicals when wafers are processed during the IC manufacturing process. After wafers are loaded on a chuck of a reaction chamber, five chemicals required for the manufacturing process are transported into the passages, and are sprayed on the surfaces of rotating wafers via different nozzles. The centrifugal effect due to the rotation of a main motor is exploited to coat the chemicals on the whole wafer quickly and uniformly. The present invention can apply to both closed and open reaction chambers. The spray head of the present invention has a specially designed angle, and has level adjusting and height adjusting functions so that high flexibility in the manufacturing process can be obtained.
    Type: Grant
    Filed: December 4, 2000
    Date of Patent: May 21, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Fu-Ching Tung, Chia-Ming Chen, Jen-Rong Huang, Jonathan Wang, Peter L. Mahneke