Patents by Inventor Rong Shan

Rong Shan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11971802
    Abstract: Embodiments of the present disclosure provide a method, an electronic device, and a computer program product for code defect detection. The method described here includes determining log information associated with a defect based on the defect reported during testing of a software product. The method further includes determining a nature of the defect based on the log information. The method further includes determining, based on the nature, the log information, and a memory image file generated when the defect is reported, target code in code of the software product that causes the defect, in response to the nature indicating that the defect is caused by the code of the software product and needs to be repaired. By using the solution of the present application, different analysis strategies for defects may be adopted based on natures of the defects, thereby improving the efficiency of detecting code defects.
    Type: Grant
    Filed: December 3, 2021
    Date of Patent: April 30, 2024
    Assignee: EMC IP Holding Company LLC
    Inventors: Jiacheng Ni, Rong Sheng, Ke Shan
  • Publication number: 20240130022
    Abstract: This application relates to the field of lighting, and discloses an LED filament. The LED filament includes an LED chip unit, a light conversion layer, and an electrode. The light conversion layer covers the LED chip unit and part of the electrode, and a color of a light emitted by the LED filament after lighting is different from a color of the light conversion layer. This application has the characteristics of uniform light emission and good heat dissipation effect.
    Type: Application
    Filed: September 18, 2022
    Publication date: April 18, 2024
    Inventors: Tao Jiang, Lin Zhou, Ming-Bin Wang, Chih-Shan Yu, Rong-Huan Yang, Ji-Feng Xu, Heng Zhao, Jian Lu, Qi Wu
  • Patent number: 8575674
    Abstract: Disclosed is a ferromagnetic tunnel junction structure which is characterized by having a tunnel barrier layer that comprises a non-magnetic material having a spinel structure. The ferromagnetic tunnel junction structure is also characterized in that the non-magnetic material is substantially MgAl2O4. The ferromagnetic tunnel junction is also characterized in that at least one of the ferromagnetic layers comprises a Co-based full Heusler alloy having an L21 or B2 structure. The ferromagnetic tunnel junction structure is also characterized in that the Co-based full Heusler alloy comprises a substance represented by the following formula: Co2FeAlxSi1-x (0?x?1). Also disclosed are a magnetoresistive element and a spintronics device, each of which utilizes the ferromagnetic tunnel junction structure and can achieve a high TMR value, that cannot be achieved by employing conventional tunnel barrier layers other than a MgO barrier.
    Type: Grant
    Filed: April 15, 2010
    Date of Patent: November 5, 2013
    Assignee: National Institute for Materials Science
    Inventors: Hiroaki Sukegawa, Koichiro Inomata, Rong Shan, Masaya Kodzuka, Kazuhiro Hono, Takao Furubayashi, Wenhong Wang
  • Publication number: 20120091548
    Abstract: Disclosed is a ferromagnetic tunnel junction structure which is characterized by having a tunnel barrier layer that comprises a non-magnetic material having a spinel structure. The ferromagnetic tunnel junction structure is also characterized in that the non-magnetic material is substantially MgAl2O4. The ferromagnetic tunnel junction is also characterized in that at least one of the ferromagnetic layers comprises a Co-based full Heusler alloy having an L21 or B2 structure. The ferromagnetic tunnel junction structure is also characterized in that the Co-based full Heusler alloy comprises a substance represented by the following formula: Co2FeAlxSi1-x (0?x?1). Also disclosed are a magnetoresistive element and a spintronics device, each of which utilizes the ferromagnetic tunnel junction structure and can achieve a high TMR value, that cannot be achieved by employing conventional tunnel barrier layers other than a MgO barrier.
    Type: Application
    Filed: April 15, 2010
    Publication date: April 19, 2012
    Inventors: Hiroaki Sukegawa, Koichiro Inomata, Rong Shan, Masaya Kodzuka, Kazuhiro Hono, Takao Furubayashi, Wenhong Wang