Patents by Inventor Rong Xiong

Rong Xiong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Processes for the preparation of benzotriazole UV absorbers
    Publication number: 20030130524
    Abstract: Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, for example a trifluoromethyl group, which involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.
    Type: Application
    Filed: December 10, 2002
    Publication date: July 10, 2003
    Inventors: Mervin G. Wood, Deborah DeHessa, Joseph Suhadolnik, Andrew B. Naughton, Jerome Sanders, Jacqueline Lau, Rong Xiong, Joseph Babiarz
  • Processes for the preparation of benzotriazole UV absorbers
    Publication number: 20030120083
    Abstract: Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, for example a trifluoromethyl group, which involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.
    Type: Application
    Filed: December 10, 2002
    Publication date: June 26, 2003
    Inventors: Mervin G. Wood, Deborah DeHessa, Joseph Suhadolnik, Andrew B. Naughton, Jerome Sanders, Jacqueline Lau, Rong Xiong, Joseph Babiarz
  • Processes for the preparation of benzotriazole UV absorbers
    Patent number: 6566507
    Abstract: Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, for example a trifluoromethyl group, which involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.
    Type: Grant
    Filed: May 31, 2001
    Date of Patent: May 20, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Mervin G. Wood, Deborah DeHessa, Joseph Suhadolnik, Andrew B. Naughton, Jerome Sanders, Jacqueline Lau, Rong Xiong, Joseph Babiarz
  • Photostable, silylated benzotriazole UV absorbers and compositions stabilized therewith
    Publication number: 20020115753
    Abstract: Photostable, silylated benzotriazole compounds of formula (I) or (II) 1
    Type: Application
    Filed: August 1, 2001
    Publication date: August 22, 2002
    Inventors: Ramanathan Ravichandran, Joseph Suhadolnik, Mervin Wood, Rong Xiong
  • Processes for the preparation of benzotriazole UV absorbers
    Publication number: 20020035175
    Abstract: Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, for example a trifluoromethyl group, which involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.
    Type: Application
    Filed: May 31, 2001
    Publication date: March 21, 2002
    Inventors: Mervin G. Wood, Deborah DeHessa, Joseph Suhadolnik, Andrew B. Naughton, Jerome Sanders, Jacqueline Lau, Rong Xiong, Joseph Babiarz
  • Process for the preparation of 5-perfluoroalkyl substituted benzotriazole UV absorbers
    Patent number: 6353113
    Abstract: A process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, preferably a trifluoromethyl group, involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or preferably nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means.
    Type: Grant
    Filed: August 3, 2000
    Date of Patent: March 5, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Mervin G. Wood, Deborah DeHessa, Andrew B. Naughton, Jerome Sanders, Jacqueline Lau, Rong Xiong, Joseph Babiarz