Patents by Inventor Rongbai Tong

Rongbai Tong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11827781
    Abstract: The present disclosure discloses a photosensitive resin composition and a use the same. The resin composition of the present disclosure includes 40-70 parts by weight of an alkali-soluble resin, 20-50 parts by weight of a photopolymerizable monomer, 0.5-10.0 parts by weight of a photoinitiator, and 0.1-10.0 parts by weight of additives. The photopolymerizable monomer includes 0.5-15.0 parts by weight of a monomer containing carbonate structure. The photosensitive resin composition is used as a dry film resist.
    Type: Grant
    Filed: July 10, 2020
    Date of Patent: November 28, 2023
    Assignee: Zhejiang First Advanced Material R&D Institute Co., Ltd.
    Inventors: Gaohua Zhu, Weijie Li, Rongbai Tong, Weiqiang Qian, Guangda Zhou, Jianhua Lin
  • Publication number: 20220308450
    Abstract: A resin composition and a use thereof are provided. The resin composition includes, in parts by weight, 100 parts of an alkali-soluble resin, 5-30 parts of acrylate monomers, 0.1-10 parts of photoinitiator, 10-30 parts of a first epoxy resin and 0-15 parts of a second epoxy resin. The first epoxy resin is a low-dielectric epoxy resin with a dielectric constant of <3.5 and the second epoxy resin is different from the first epoxy resin. With the addition of the low epoxy resin with the dielectric constant of >3.5, and by adjusting the ratio of the components, the resin composition significantly reduces the dielectric constant and dielectric loss, the dielectric constant is reduced to 3.0 or less, and the dielectric loss is reduced to 0.008 or less.
    Type: Application
    Filed: July 8, 2020
    Publication date: September 29, 2022
    Inventors: Xiaoying LIN, Rongbai TONG, Weijie LI, Weiqiang QIAN, Guangda ZHOU, Jianhua LIN
  • Publication number: 20220145072
    Abstract: The present disclosure discloses a photosensitive resin composition and a use the same. The resin composition of the present disclosure includes 40-70 parts by weight of an alkali-soluble resin, 20-50 parts by weight of a photopolymerizable monomer, 0.5-10.0 parts by weight of a photoinitiator, and 0.1-10.0 parts by weight of additives. The photopolymerizable monomer includes 0.5-15.0 parts by weight of a monomer containing carbonate structure. The photosensitive resin composition is used as a dry film resist. It has characteristics such as easy breakage of film strip, smaller film strip fragments, faster film strip speed, excellent flexibility, and good circuit resolution and adhesion, thereby effectively improving production efficiency and product yield.
    Type: Application
    Filed: July 10, 2020
    Publication date: May 12, 2022
    Inventors: Gaohua Zhu, Weijie Li, Rongbai Tong, Weiqiang Qian, Guangda Zhou, Jianhua Lin