Abstract: A filter cartridge having a tubular, self-supporting, tunable, asymmetric, fluoropolymer alloy filter membrane is provided. Within a sealed cartridge assembly, the tubular filter membrane is connected at opposite ends to inlet and outlet tubes which pass through opposite ends of the cartridge assembly. A guide attached to the end of the inlet tube within the sealed cartridge assembly plugs the end of the inlet tube within the sealed cartridge assembly and provides a filter medium passage from the inside of the inlet tube to the outside of the tubular filter membrane. The outlet tube provides a filter medium passage from the inside of the tubular filter membrane. The input and output tubes are slideably disposed in the ends of the cartridge assembly such that the axial length and therefore the porosity of tubular filter membrane can be adjusted over a range.

Abstract: A longitudinally extending cross-flow liner within a longitudinally extending cylindrical reaction vessel cooperates with at least one longitudinally extending gas injector within the cross-flow liner to provide transversely flowing gas across the surfaces of vertically oriented semiconductor wafers in such a way as to substantially eliminate both depletion phenomenon and downstream wafer pollution caused from particulates, unreacted reactant gas, and other contaminants and to provide uniformly coated wafers in a batch and repeatability batch to batch.