Patents by Inventor Ronnie Northrup

Ronnie Northrup has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5212537
    Abstract: A photometer having a plurality of input fibers to its optical entrance, at least one of which is for transmission of calibration light and at least one of which is for transmission of sample light. The exit ends of these fibers are aligned into a linear array, thereby producing an effective entrance slit for the optical entrance of the photometer. The fiber(s) for calibration light are positioned at the center of the linear array to avoid miscalibration due to photometer astigmatism.
    Type: Grant
    Filed: July 12, 1990
    Date of Patent: May 18, 1993
    Assignee: Applied Materials, Inc.
    Inventors: Monoocher Birang, Kien Chuc, Ronnie Northrup, Bruno Strul
  • Patent number: 5059784
    Abstract: A mask for reducing a semiperiodic variation of an output signal produced in response to a semiperiodic temporal variation of a distribution of radiation incident on the input of a detector. The mask can have a transmitance that changes abruptly at an outer profile of an opaque region or can have a varation in transmittance that varies continuously.
    Type: Grant
    Filed: March 30, 1990
    Date of Patent: October 22, 1991
    Assignee: Applied Materials, Inc.
    Inventor: Ronnie Northrup
  • Patent number: 4698834
    Abstract: An x-ray mask membrane reflection compensator includes an x-ray chamber having a transmitting gaseous media therein chamber through which x-rays are directed to a mask membrane that is positioned in close spaced proximity to a resist-coated wafer. A controlled environment of processing gas is provided within a gap between the mask membrane and wafer surfaces. The processing gas and gaseous media pressures variously cause bulging of the membrane resulting in a descrepancy in the gap distance across the field of view. A laser source provides an incident beam of light which is directed at an incident angle to the mask membrane and the wafer surface such that return beams are reflected and interference fringe patterns, due to slight nonparallelism of the mask membrane and the wafer are displayed on a monitor.
    Type: Grant
    Filed: February 12, 1986
    Date of Patent: October 6, 1987
    Assignee: Micronix Corporation
    Inventors: Ronnie Northrup, Bernard Fay