Abstract: An optical inspection system for inspection of a mask or a wafer, the system including an objective for collecting light coming from an object being inspected, a relay component placed on an optical path between the objective and an imaging component, for collecting light from the objective, and relaying the collected light to the imaging component, wherein the optical inspection system further includes a mirror placed on the optical path between the objective and the relay module, for changing a direction of the optical path at an angle away from an optical axis of the objective and into an optical axis of the relay component, the relay component includes reflecting surfaces arranged such that the collected light passes back and forth within the relay component three times. Related apparatus and methods are also described.

Abstract: Methods and apparatus may permit the mounting of bicycle components (16) such as seats, handlebars, and the like, to bicycles. A bicycle component mount (3) may be isolated from the structure of a bicycle. Forces generated at various points on the bicycle's structure may be substantially impeded or eliminated from transmission through an isolated bicycle component mount (3). Multidimensional motion of a bicycle component mount (3) may include rotational, translational, and rototranslational motion with progressive elastomeric resistance in multiple directions. A bicycle component mount (3) may exhibit movement about its own center of mass (12). Motions of a rider on a bicycle may be biomechanically compensated for by a bicycle component mount (3) to facilitate rider comfort, promote efficient transfer of rider motion to the operation of a bicycle, and decrease wear on bicycle components (16).

Abstract: Methods and apparatus may permit the mounting of bicycle components (16) such as seats, handlebars, and the like, to bicycles. A bicycle component mount (3) may be isolated from the structure of a bicycle. Forces generated at various points on the bicycle's structure may be substantially impeded or eliminated from transmission through an isolated bicycle component mount (3). Multidimensional motion of a bicycle component mount (3) may include rotational, translational, and rototranslational motion with progressive elastomeric resistance in multiple directions. A bicycle component mount (3) may exhibit movement about its own center of mass (12). Motions of a rider on a bicycle may be biomechanically compensated for by a bicycle component mount (3) to facilitate rider comfort, promote efficient transfer of rider motion to the operation of a bicycle, and decrease wear on bicycle components (16).

Abstract: Methods and apparatus may permit the mounting of bicycle components (16) such as seats, handlebars, and the like, to bicycles. A bicycle component mount (3) may be isolated from the structure of a bicycle. Forces generated at various points on the bicycle's structure may be substantially impeded or eliminated from transmission through an isolated bicycle component mount (3). Multidimensional motion of a bicycle component mount (3) may include rotational, translational, and rototranslational motion with progressive elastomeric resistance in multiple directions. A bicycle component mount (3) may exhibit movement about its own center of mass (12). Motions of a rider on a bicycle may be biomechanically compensated for by a bicycle component mount (3) to facilitate rider comfort, promote efficient transfer of rider motion to the operation of a bicycle, and decrease wear on bicycle components (16).

Abstract: A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system. The lithographic projection apparatus is further provided with immersion system for providing a fluid between the lens and the substrate.

Abstract: An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.

Abstract: A projection lithographic system that operates within the deep ultraviolet to vacuum ultraviolet region of the spectrum and uses an all-reflective optical arrangement to project a reduced image of a lithographic mask onto a semiconductor wafer. The all-reflective optical arrangement includes from six to eight reflective surfaces wherein each of the reflective surfaces is aspheric, The reflective surfaces are disposed along a common optical axis and are arranged not to interfere with the path of light as the light travel from the lithographic mask to the semiconductor wafer.