Abstract: An apparatus includes: a sprinkler configured for spraying liquid; a conduit with a nano-particle coated surface; a sensor associated with the conduit, wherein the sensor is configured to detect a signal corresponding to a film deposition on the nano-particle coated surface; and a controller coupled with the sensor and the sprinkler, wherein the controller is configured to regulate liquid spraying of the sprinkler over the nano-particle coated surface.

Abstract: An apparatus includes: a sprinkler configured for spraying liquid; a conduit with a nano-particle coated surface; a sensor associated with the conduit, wherein the sensor is configured to detect a signal corresponding to a film deposition on the nano-particle coated surface; and a controller coupled with the sensor and the sprinkler, wherein the controller is configured to regulate liquid spraying of the sprinkler over the nano-particle coated surface.

Abstract: An apparatus includes: a sprinkler configured for spraying liquid; a conduit with a nano-particle coated surface; a sensor associated with the conduit, wherein the sensor is configured to detect a signal corresponding to a film deposition on the nano-particle coated surface; and a controller coupled with the sensor and the sprinkler, wherein the controller is configured to regulate liquid spraying of the sprinkler over the nano-particle coated surface.

Abstract: An apparatus includes: a sprinkler configured for spraying liquid; a conduit with a nano-particle coated surface; a sensor associated with the conduit, wherein the sensor is configured to detect a signal corresponding to a film deposition on the nano-particle coated surface; and a controller coupled with the sensor and the sprinkler, wherein the controller is configured to regulate liquid spraying of the sprinkler over the nano-particle coated surface.

Abstract: Some embodiments of the present disclosure provide a method of dissipating process exhaust from a chamber. The method includes conveying the process exhaust from the chamber through an inner tube of a pipeline to abatement. The process exhaust has a first temperature while exiting the chamber, and a second temperature while exiting the pipeline. The method maintains an outer tube of the pipeline at a vacuum state by a pump such that the inner tube is substantially thermal isolated from the atmosphere outside the pipeline. The second temperature is negative offset from the first temperature within a predetermined value.

Abstract: An apparatus includes a sprinkler configured for spraying liquid and a member with a nano-coating surface. The nano-coating surface is configured to receive liquid sprayed from the sprinkler. The apparatus further includes a sensor associated with the member and the sensor is configured to detect a signal directly or indirectly corresponding to a film deposition on the nano-coating surface. Moreover, the apparatus has a controller coupled with the sensor and the sprinkler, wherein the signal detected by the sensor is transmitted to the controller and the controller is configured to command the sprinkler spraying liquid on the nano-coating surface while a value of the signal reaches a threshold value.

Abstract: Some embodiments of the present disclosure provide a method of dissipating process exhaust from a chamber. The method includes conveying the process exhaust from the chamber through an inner tube of a pipeline to abatement. The process exhaust has a first temperature while exiting the chamber, and a second temperature while exiting the pipeline. The method maintains an outer tube of the pipeline at a vacuum state by a pump such that the inner tube is substantially thermal isolated from the atmosphere outside the pipeline. The second temperature is negative offset from the first temperature within a predetermined value.

Abstract: A method and an apparatus for recycling waste sulfuric acid solution are provided. The method includes providing a reaction tank and introducing a waste sulfuric acid (H2SO4) solution into the reaction tank, and the waste sulfuric acid solution includes hydrogen peroxide (H2O2). The method also includes supplying a compound containing chlorine into the reaction tank. The method further includes mixing the compound containing chlorine with the waste sulfuric acid solution to promote a chemical reaction that decomposes the hydrogen peroxide (H2O2).

Abstract: A method and an apparatus for recycling waste sulfuric acid solution are provided. The method includes providing a reaction tank and introducing a waste sulfuric acid (H2SO4) solution into the reaction tank, and the waste sulfuric acid solution includes hydrogen peroxide (H2O2). The method also includes supplying a compound containing chlorine into the reaction tank. The method further includes mixing the compound containing chlorine with the waste sulfuric acid solution to promote a chemical reaction that decomposes the hydrogen peroxide (H2O2).

Abstract: An apparatus includes a sprinkler configured for spraying liquid and a member with a nano-coating surface. The nano-coating surface is configured to receive liquid sprayed from the sprinkler. The apparatus further includes a sensor associated with the member and the sensor is configured to detect a signal directly or indirectly corresponding to a film deposition on the nano-coating surface. Moreover, the apparatus has a controller coupled with the sensor and the sprinkler, wherein the signal detected by the sensor is transmitted to the controller and the controller is configured to command the sprinkler spraying liquid on the nano-coating surface while a value of the signal reaches a threshold value.

Abstract: An improved water purification system including a high-efficiency reverse osmosis (HERO) system and a base dosing system for rapidly raising the pH of wastewater treated in the system. The invention includes an ion exchange unit for initially removing positive and negative ions from the wastewater. A high-efficiency reverse osmosis (HERO) system is provided downstream of the ion exchange unit for further removing ions from the wastewater. A base dosing system is provided between the ion exchange unit and the HERO system for dosing a base into and rapidly raising the pH of the wastewater as the wastewater flows from the ion exchange unit into the HERO system.