Patents by Inventor Rowin MEIJERINK

Rowin MEIJERINK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250021017
    Abstract: A method of reducing effects of heating and/or cooling a reticle in a lithographic process includes conditioning the reticle to adjust an initial temperature of the reticle to a predetermined temperature, reducing stress in the reticle to reduce parasitic thermal effects, calibrating a reticle heating model by exposing the reticle and a non-production substrate to a dose of radiation, and processing a production substrate by exposing the reticle and a production substrate to a dose of radiation based on the reticle heating model. The method can increase calibration accuracy and speed of the reticle heating model, reduce conditioning times of the reticle, reduce stress in the reticle, avoid rework of production substrates, and increase throughput, yield, and accuracy.
    Type: Application
    Filed: October 12, 2022
    Publication date: January 16, 2025
    Applicant: ASML Netherlands B.V.
    Inventors: Raaja Ganapathy SUBRAMANIAN, Bearrach MOEST, Alexander Alexandrovich DANILIN, Rowin MEIJERINK, Tim Izaak Johannes GOOSSEN, Stanislav Markovich SHUMIACHER
  • Publication number: 20230288817
    Abstract: A method for controlling a lithographic apparatus configured to pattern an exposure field on a substrate including at least a sub-field, the method including: obtaining an initial spatial profile associated with a spatial variation of a performance parameter associated with a layer on the substrate across at least the sub-field of the exposure field; and decomposing the initial spatial profile into at least a first component spatial profile for controlling a lithographic apparatus at a first spatial scale and a second component spatial profile for controlling the lithographic apparatus at a second spatial scale associated with a size of the sub-field, wherein the decomposing includes co-optimizing the first and second component spatial profiles based on correcting the spatial variation of the performance parameter across the sub-field.
    Type: Application
    Filed: May 12, 2023
    Publication date: September 14, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rowin MEIJERINK, Putra SAPUTRA, Pieter Gerardus Jacobus SMORENBERG, Theo Wilhelmus Maria THIJSSEN, Khalid ELBATTAY, Ma Su Su HLAING, Paul DERWIN, Bo ZHONG, Masaya KOMATSU
  • Patent number: 11662666
    Abstract: A method for controlling a lithographic apparatus configured to pattern an exposure field on a substrate including at least a sub-field, the method including: obtaining an initial spatial profile associated with a spatial variation of a performance parameter associated with a layer on the substrate across at least the sub-field of the exposure field; and decomposing the initial spatial profile into at least a first component spatial profile for controlling a lithographic apparatus at a first spatial scale and a second component spatial profile for controlling the lithographic apparatus at a second spatial scale associated with a size of the sub-field, wherein the decomposing includes co-optimizing the first and second component spatial profiles based on correcting the spatial variation of the performance parameter across the sub-field.
    Type: Grant
    Filed: March 5, 2020
    Date of Patent: May 30, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Rowin Meijerink, Putra Saputra, Pieter Gerardus Jacobus Smorenberg, Theo Wilhelmus Maria Thijssen, Khalid Elbattay, Ma Su Su Hlaing, Paul Derwin, Bo Zhong, Masaya Komatsu
  • Patent number: 11644755
    Abstract: A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.
    Type: Grant
    Filed: September 11, 2019
    Date of Patent: May 9, 2023
    Assignee: ASML NETHERLAND B.V.
    Inventors: Bearrach Moest, Rowin Meijerink, Thijs Schenkelaars, Norbertus Josephus Martinus Van Den Nieuwelaar, Laurentius Johannes Adrianus Van Bokhoven
  • Publication number: 20220171295
    Abstract: A method for controlling a lithographic apparatus configured to pattern an exposure field on a substrate including at least a sub-field, the method including: obtaining an initial spatial profile associated with a spatial variation of a performance parameter associated with a layer on the substrate across at least the sub-field of the exposure field; and decomposing the initial spatial profile into at least a first component spatial profile for controlling a lithographic apparatus at a first spatial scale and a second component spatial profile for controlling the lithographic apparatus at a second spatial scale associated with a size of the sub-field, wherein the decomposing includes co-optimizing the first and second component spatial profiles based on correcting the spatial variation of the performance parameter across the sub-field.
    Type: Application
    Filed: March 5, 2020
    Publication date: June 2, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rowin MEIJERINK, Putra SAPUTRA, Pieter Gerardus Jacobus SMORENBERG, Theo Wilhelmus Maria THIJSSEN, Khalid ELBATTAY, Ma Su Su HLAING, Paul DERWIN, BO ZHONG, Masaya KOMATSU
  • Publication number: 20210389676
    Abstract: A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.
    Type: Application
    Filed: September 11, 2019
    Publication date: December 16, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bearrach MOEST, Rowin MEIJERINK, Thijs SCHENKELAARS, Norbertus Josephus Martinus VAN DEN NIEUWELAAR, Laurentius Johannes Adrianus VAN BOKHOVEN