Patents by Inventor Roxana REZVANI NARAGHI

Roxana REZVANI NARAGHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS, METROLOGY SYSTEM, AND INTENSITY IMBALANCE MEASUREMENT FOR ERROR CORRECTION
    Publication number: 20230324817
    Abstract: A metrology system includes a beam splitter and first and second sensors. The beam splitter splits scattered radiation scattered by a target into first and second portions of radiation. The first sensor receives the first portion. The second sensor receives the second portion after the second portion propagates along a path that includes a wedge system comprising a first wedge configured to diverge the second portion.
    Type: Application
    Filed: July 24, 2021
    Publication date: October 12, 2023
    Applicant: ASML Holding N.V.
    Inventors: Earl William EBERT, Roxana REZVANI NARAGHI
  • Variable diffraction grating
    Patent number: 11703771
    Abstract: A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.
    Type: Grant
    Filed: October 12, 2020
    Date of Patent: July 18, 2023
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Ali Alsaqqa, Fadi El-Ghussein, Lambertus Gerardus Maria Kessels, Roxana Rezvani Naraghi, Krishanu Shome, Timothy Allan Brunner, Sergei Sokolov
  • VARIABLE DIFFRACTION GRATING
    Publication number: 20220390861
    Abstract: A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.
    Type: Application
    Filed: October 12, 2020
    Publication date: December 8, 2022
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Ali ALSAQQA, Fadi EL-GHUSSEIN, Lambertus Gerardus Maria KESSELS, Roxana REZVANI NARAGHI, Krishanu SHOME, Timothy Allan BRUNNER, Sergei SOKOLOV