Abstract: The present disclosure provides an apparatus and method which uses a field splitter or a beam splitter for the purpose combining two different views of a materials testing sample under materials testing into a single image. This allows for three-dimensional strain measurement in the context of material/compound testing. In particular, the time and stress dependent change in gauge length can be tracked and calculated in order to calculate the time and stress dependent strain. The method and apparatus allows imaging on a single image sensor for the three-dimensional strain calculation.

Abstract: This disclosure presents a method of measuring the strain response of a test material remotely by optical devices using a thin multi-layer assembly, called an optical strain gauge, which is attached directly to the test specimen by pair of adhesive patches built into the assembly. The optical strain gauge assembly attaches quickly and easily by just pressing it onto the specimen by virtue of the two pressure-activated adhesive patches. There is typically no surface preparation necessary for the test specimen. The spatial separation between the two patches adhered to the specimen surface serves to establish an initial gauge length for calculating strain by measuring the stress induced changes to this separation when a load is applied to the test specimen.

Abstract: The present disclosure provides an apparatus and method which uses a field splitter or a beam splitter for the purpose combining two different views of a materials testing sample under materials testing into a single image. This allows for three-dimensional strain measurement in the context of material/compound testing. In particular, the time and stress dependent change in gauge length can be tracked and calculated in order to calculate the time and stress dependent strain. The method and apparatus allows imaging on a single image sensor for the three-dimensional strain calculation.

Abstract: This disclosure presents a method of measuring the strain response of a test material remotely by optical devices using a thin multi-layer assembly, called an optical strain gauge, which is attached directly to the test specimen by pair of adhesive patches built into the assembly. The optical strain gauge assembly attaches quickly and easily by just pressing it onto the specimen by virtue of the two pressure-activated adhesive patches. There is typically no surface preparation necessary for the test specimen. The spatial separation between the two patches adhered to the specimen surface serves to establish an initial gauge length for calculating strain by measuring the stress induced changes to this separation when a load is applied to the test specimen.

Abstract: The disclosure relates to a remote displacement sensor, such as an optical strain gauge, which uses an optical amplifier implemented by patterns, such as, moiré patterns, to calculate changes in position. In a strain gauge with moiré patterns, two foil layers are provided, a lower foil layer with a reference or static moiré pattern generated by the overlaying of a first pattern with parallel lines at a first fundamental frequency and a second pattern with parallel lines at a second fundamental frequency. The lower foil layer further includes a first section with a first pattern with parallel lines at the first fundamental frequency while the upper layer provides a second section with a second pattern with parallel lines at the second fundamental frequency. The overlaying of the foils causes an overlying of the first and second sections thereby causing a moiré pattern of the same wavelength as the reference pattern.

Abstract: The disclosure relates to a remote displacement sensor, such as an optical strain gauge, which uses an optical amplifier implemented by patterns, such as, but not limited to, moiré patterns, to calculate changes in position or gauge length. In the embodiment implemented as a strain gauge with moiré patterns, two foil layers are provided, a lower foil layer with a reference or static moiré pattern generated by the overlaying of a first pattern with parallel lines at a first fundamental frequency and a second pattern with parallel lines at a second fundamental frequency. The lower foil layer further includes a first section with a first pattern with parallel lines at the first fundamental frequency while the upper layer provides a second section with a second pattern with parallel lines at the second fundamental frequency. The overlaying of the foils causes an overlying of the first and second sections thereby causing a moiré pattern of the same wavelength as the reference pattern.

Abstract: Described is an interferometric surface contour measurement system for projecting structured light patterns onto an object. The measurement system includes an interferometric projector, an imager, and a processor. The imager is rigidly coupled to the projector to maintain a stable relationship to the projected, structured light pattern. The imager receives the structured light pattern and together with the processor, determines whether the projected image includes a positional error. In some embodiments, the projector is a multi-channel projector, each channel having an optical axis spatially separated from the others, one of the channels including the imager and dedicated for determining positional error. In other embodiments, the projector is a single-channel projector projecting a structured light pattern onto the object, a portion of the structured light pattern being tapped-off for determining positional error.

Abstract: Described is an interferometric surface contour measurement system for projecting structured light patterns onto an object. The measurement system includes an interferometric projector, an imager, and a processor. The imager is rigidly coupled to the projector to maintain a stable relationship to the projected, structured light pattern. The imager receives the structured light pattern and together with the processor, determines whether the projected image includes a positional error. In some embodiments, the projector is a multi-channel projector, each channel having an optical axis spatially separated from the others, one of the channels including the imager and dedicated for determining positional error. In other embodiments, the projector is a single-channel projector projecting a structured light pattern onto the object, a portion of the structured light pattern being tapped-off for determining positional error.

Abstract: A visual sensor includes a reference portion comprising an image independent of banding and a banding test portion adjacent to the reference portion comprising an image sensitive to banding. In one embodiment, the visual sensor also includes a process check portion adjacent to the banding portion for indicating whether a predetermined imaging parameter is within designated limits.

Abstract: A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum and a carriage, including a light source and a spatial light modulator for selectively exposing the media that is held against the drum. The invention can be applied to internal or external drum systems. The calibration system comprises a calibration sensor that is scanned relative to the spatial light modulator. The controller then analyzes the response of the calibration sensor to generate calibration information that is used to configure the spatial light modulator. The use of this calibration sensor allows for job-to-job calibration of the spatial light modulator, in one example, that ensures; the generation of a high quality images, without banding, for example, on the media. This calibration system is also used to detect a best focus position for projection optics by measuring a contrast ratio between exposure and dark levels for various focus settings.

Abstract: A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum and a carriage, including a light source and a spatial light modulator for selectively exposing the media that is held against the drum. The invention can be applied to internal or external drum systems. The calibration system comprises a calibration sensor that is scanned relative to the spatial light modulator. The controller then analyzes the response of the calibration sensor to generate calibration information that is used to configure the spatial light modulator. The use of this calibration sensor allows for job-to-job calibration of the spatial light modulator, in one example, that ensures the generation of a high quality images, without banding, for example, on the media. This calibration system is also used to detect a best focus position for projection optics by measuring a contrast ratio between exposure and dark levels for various focus settings.

Abstract: A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum and a carriage, including a light source and a spatial light modulator for selectively exposing the media that is held against the drum. The invention can be applied to internal or external drum systems. The calibration system comprises a calibration sensor that is scanned relative to the spatial light modulator. The controller then analyzes the response of the calibration sensor to generate calibration information that is used to configure the spatial light modulator. The use of this calibration sensor allows for job-to-job calibration of the spatial light modulator, in one example, that ensures the generation of a high quality images, without banding, for example, on the media. This calibration system is also used to detect a best focus position for projection optics by measuring a contrast ratio between exposure and OFF light levels for various focus settings.

Abstract: A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum and a carriage, including a light source and a spatial light modulator for selectively exposing the media that is held against the drum. The invention can be applied to internal or external drum systems. The calibration system comprises a calibration sensor that is scanned relative to the spatial light modulator. The controller then analyzes the response of the calibration sensor to generate calibration information that is used to configure the spatial light modulator. The use of this calibration sensor allows for job-to-job calibration of the spatial light modulator, in one example, that ensures the generation of a high quality images, without banding, for example, on the media. This calibration system is also used to detect a best focus position for projection optics by measuring a contrast ratio between exposure and OFF light levels for various focus settings.

Abstract: A visual sensor has a first portion and a second portion. The sensor is able to detect the state of one or more imaging parameters such as exposure setting, pulse width modulation, focus, balance, spot ellipticity, sidelobe size, shape, and intensity, media gamma, edge sharpness, dot gain, uniformity, ink receptivity, physical changes in the media, pattern dependent effects such as dot gain or tone resolution compared to the type of halftone used, and sensitivity to calibrated position or exposure errors. The first image portion has a first imaging characteristic, and the second image portion has a second imaging characteristic. Imaging characteristics are characteristics of an image, including, but not limited to apparent density level, tint, color, reflectivity, absorption, granularity or microstructure, size, shape, distribution, degree of randomness, structure, edge sharpness, and depth or dimension.

Abstract: A system and method for detecting imaging parameters includes forming a first image generated with pseudorandom noise and a second image generated with the same pseudorandom noise that serve as an imaging parameter sensor when the first and second images are superimposed. The sensor is useful for visually detecting such imaging parameters such as geometric errors. In one embodiment, the first and second patterns are generated with pseudorandom noise by modulating a repetitive pattern with pseudorandom noise. In another embodiment, the first and second patterns are generated with pseudorandom noise by forming a pseudorandom image and the reverse of the image, and phase shifting one or both of the images.

Abstract: A beam scanning system for scanning an imaging surface includes a phase shifter for issuing phase signals, a radiation emitter for emitting a beam of radiation and a deflection element, such as an acousto-optic modulator or translating lens, for deflecting the radiation beam. Depending on the implementation, the emitter can be configured to phase shift the radiation beam and/or the deflection element can be configured to deflect the radiation beam in accordance with the issued phase signals. By emitting and/or deflecting the radiation beam in accordance with the phase signals, the length of the scan line formed on the imaging surface can be controlled. A deflector, such as a spin mirror or rotatable prism, is provided to direct the radiation beam to form a scan line on the imaging surface.

Abstract: A method for detecting image position errors, includes forming a first pattern with a symbol embedded therein and a second pattern which, when superpositioned on the first pattern, exposes the symbol if the misalignment between the first and second patterns exceeds a position error tolerance. The symbol is perceivable with the unaided eye even if the misalignment is imperceivable to the unaided eye.

Abstract: A multi-beam scanning system for scanning a curved imaging surface includes at least one radiation emitter which emits first and second beams of radiation. A spin deflector, rotatable about a spin axis, directs the first beam to form a first scan line and the second beam to form a second scan line on the imaging surface. A deflection element, disposed in the path of the first beam and upstream of the spin deflector, operates to deflect the first beam with respect to the rotation of the spin deflector. The spin deflector is impinged by beams of radiation only at a distance, other than zero, from the spin axis.

Abstract: A multibeam scanning system for scanning an imaging surface, includes at least one radiation emitter configured to emit a first beam of radiation and a second beam of radiation. A spin deflector, rotatable about a spin axis, is provided to direct the first beam to form a first scan line and the second beam to form a second scan line on the imaging surface. At least one moving element, such as a translating lens, disposed upstream of said spin deflector, operates to deflect at least one of the beams with respect to the spin axis of the spin deflector.

Abstract: A method for detecting image position errors, includes forming a first pattern with a symbol embedded therein and a second pattern which, when superpositioned on the first pattern, exposes the symbol if the misalignment between the first and second patterns exceeds a position error tolerance. The symbol is perceivable with the unaided eye even if the misalignment is imperceivable to the unaided eye.