Patents by Inventor Roy Ramon VEENSTRA

Roy Ramon VEENSTRA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230304949
    Abstract: A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising: an objective lens array assembly comprising a plurality of objective lenses, each configured to project one of a plurality of charged-particle beams onto a sample; a detector array associated with the objective lens array assembly and configured to detect charged-particles emitted from the sample; and a circuit comprising an amplifier in data communication with the detector array; wherein the amplifier is configured to be tunable in order to tune amplification of signals from the detector array.
    Type: Application
    Filed: May 24, 2023
    Publication date: September 28, 2023
    Applicant: ASML Netherlands B.V.
    Inventor: Roy Ramon VEENSTRA
  • Publication number: 20230298850
    Abstract: Disclosed herein is an inspection tool and a method for identifying defects in a sample. The method includes steps of scanning a first area of a sample with a first detector-beam and scanning a second area of the sample with a second detector-beam, then receiving first and second signals that are derived from the first and second detector-beams. The first and second signals are compared to determine whether a defect is present in the sample.
    Type: Application
    Filed: May 18, 2023
    Publication date: September 21, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Marijke SCOTUZZI, Roy Ramon VEENSTRA, Antoine Gaston Marie KIERS
  • Publication number: 20230238211
    Abstract: A detector substrate (or detector array) for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for beam paths of respective charged particle beams of a multi-beam. The detector substrate includes a sensor unit array. A sensor unit of the sensor unit array is adjacent to a corresponding aperture of the aperture array. The sensor unit is configured to capture charged particles from the sample. The detector array may include an amplification circuit associated with each sensor unit in the sensor unit array and proximate to the corresponding aperture in the aperture array. The amplification circuit may include a Trans Impedance Amplifier and/or an analogue to digital converter.
    Type: Application
    Filed: July 5, 2021
    Publication date: July 27, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Jan-Jaco WIELAND, Stoyan NIHTIANOV, Roy Ramon VEENSTRA, Hui JIANG