Abstract: The present invention relates to a formulation for preparing an optical metal oxide layer.

Abstract: The present invention relates to a formulation for preparing an optical metal oxide layer, the formulation comprising polyoxometalates (POMs) complexed to metal oxide nanoparticles (NPs); a method for preparing an optical metal oxide layer using said formulation; and an optical device comprising said optical metal oxide layer.

Abstract: A formulation for preparing an optical layer, preferably a particle-free optical layer, preferably to be used for nanoimprint lithography, more preferably to be used for direct UV nanoimprint lithography comprises compound A and a metal oxide precursor. Compound A is represented by the formula: X (NO2?)n, wherein X and n are defined herein. The formulation may exhibit at least one of properties as an advanced material or as a high performance material. The formulation may be used in the nanotechnology process to make semiconductor device/display device application, for example semiconductor chip, or a liquid crystal, quantum dot, OLED display fabricated on a substrate controlled by semiconductors.

Abstract: A method for preparing a composite comprising at least the following steps (a) to (c): (a) providing a formulation onto a surface of a substrate by a wet deposition process to obtain a partly or fully dried formulation; (b) applying a post bake to the formulation provided on the surface of the substrate to obtain a 1st composite; and (c) applying a post-treatment to the 1st composite to obtain a final composite or applying a post-treatment to the partly or fully dried formulation obtained in step (a).