Patents by Inventor Roy Shiloh

Roy Shiloh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10497537
    Abstract: A method of manipulating an electron beam is disclosed. The method comprises transmitting the beam through a phase mask selected to spatially modulate a phase of the beam over a cross-section thereof.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: December 3, 2019
    Assignee: Ramot at Tel-Aviv University Ltd.
    Inventors: Roy Shiloh, Yossi Lereah, Ady Arie
  • Publication number: 20180211814
    Abstract: A method of manipulating an electron beam is disclosed. The method comprises transmitting the beam through a phase mask selected to spatially modulate a phase of the beam over a cross-section thereof.
    Type: Application
    Filed: March 20, 2018
    Publication date: July 26, 2018
    Applicant: Ramot at Tel-Aviv University Ltd.
    Inventors: Roy SHILOH, Yossi LEREAH, Ady ARIE
  • Patent number: 9953802
    Abstract: A method of manipulating an electron beam is disclosed. The method comprises transmitting the beam through a phase mask selected to spatially modulate a phase of the beam over a cross-section thereof.
    Type: Grant
    Filed: January 21, 2015
    Date of Patent: April 24, 2018
    Assignee: Ramot at Tel-Aviv University Ltd.
    Inventors: Roy Shiloh, Yossi Lereah, Ady Arie
  • Publication number: 20160343536
    Abstract: A method of manipulating an electron beam is disclosed. The method comprises transmitting the beam through a phase mask selected to spatially modulate a phase of the beam over a cross-section thereof.
    Type: Application
    Filed: January 21, 2015
    Publication date: November 24, 2016
    Applicant: Ramot at Tel-Aviv University Ltd.
    Inventors: Roy SHILOH, Yossi LEREAH, Ady ARIE
  • Publication number: 20160189916
    Abstract: A scanning charged particle beam apparatus is described. The scanning charged particle beam apparatus includes a charged particle beam source configured for generating a primary charged particle beam; an objective lens configured for forming a probe on a specimen; a scanning deflection assembly configured for scanning the probe over a surface of the specimen; and an aberration correction aperture, wherein the aberration correction aperture includes an aperture body having a transparent aperture portion configured for having the primary charged particle beam pass through the transparent aperture portion; and a membrane portion including a solid material, wherein the membrane portion is provided at the transparent aperture portion and wherein the membrane portion is configured for having the primary charged particle beam pass through the solid material, wherein the membrane portion has a varying thickness.
    Type: Application
    Filed: December 17, 2015
    Publication date: June 30, 2016
    Inventors: Jürgen Frosien, Stefan Lanio, Ady Arie, Roy Shiloh, Roei Remez