Patents by Inventor Roy W. Chapel, Jr.

Roy W. Chapel, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4907341
    Abstract: This invention relates to a proces of manufacturing and adjusting a compound resistor. The compound resistor is formed of a resistive material forming a predominant portion of the resistance and having a small negative temperature coefficient of resistance coupled with an adjustment material having an extremely low resistance and a very high positive temperature coefficient of resistance. After forming the resistive and adjustment portions, a portion of the adjustment material is removed to adjust the composite TCR of the compound resistor substantially to zero without significantly affecting resistance.
    Type: Grant
    Filed: December 31, 1987
    Date of Patent: March 13, 1990
    Assignee: John Fluke Mfg. Co., Inc.
    Inventors: Roy W. Chapel, Jr., David N. Duperon
  • Patent number: 4901052
    Abstract: A resistive network formed on a substrate includes film resistors formed of resistive elements, each element having a plurality of portions symmetrically disposed relative to two axes of symmetry. The biaxially symmetric arrangement provides uniform resistance characteristics for the various film resistors, thus improving stability of resistance ratios among resistors of the network. TCR tracking for the film resistors, i.e., the TCR of a ratio of the resistors, is similarly improved. Where the elements of different resistors of the network are interleaved, the temperature of the different resistors is also made more uniform.
    Type: Grant
    Filed: July 8, 1988
    Date of Patent: February 13, 1990
    Assignee: John Fluke Mfg. Co., Inc.
    Inventors: Roy W. Chapel, Jr., Robert W. Hammond
  • Patent number: 4803457
    Abstract: A compound resistor is formed of a resistive material making up a predominant portion of the resistance and having a small negative TCR coupled with an adjustment material having an extremely low resistance and a very high positive temperature coefficient of resistance. After the manufacturing process, a portion of the adjustment material is removed to adjust the composite TCR of the compound resistor substantially to zero without significantly affecting the resistance.
    Type: Grant
    Filed: February 27, 1987
    Date of Patent: February 7, 1989
    Inventors: Roy W. Chapel, Jr., David N. Duperon, Joseph E. Meadows
  • Patent number: 4346291
    Abstract: A process for producing thermally isolated semiconductor die and die produced by the process, plus improved apparatus using the die are disclosed. The process generally comprises the steps of: forming a desired semiconductor component or circuit in a semiconductor wafer (preferably a silicon wafer of <100> crystal orientation) having a protective layer (SiO.sub.
    Type: Grant
    Filed: September 2, 1980
    Date of Patent: August 24, 1982
    Assignee: John Fluke Mfg. Co., Inc.
    Inventors: Roy W. Chapel, Jr., I. Macit Gurol
  • Patent number: 4257061
    Abstract: A process for producing thermally isolated monolithic semiconductor die and die produced by the process, plus improved apparatus using the die are disclosed. The process generally comprises the steps of: forming a desired semiconductor component or circuit in a semiconductor wafer (preferably a silicon wafer of <100> crystal orientation) having a protective layer (SiO.sub.
    Type: Grant
    Filed: October 17, 1977
    Date of Patent: March 17, 1981
    Assignee: John Fluke Mfg. Co., Inc.
    Inventors: Roy W. Chapel, Jr., I. Macit Gurol